EP0077445A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
A method of forming an electronic circuit structure
Assignee: International Business Machines Corp
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Filing: 1982-08-13
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Granted: —
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Expires: 2002-08-13
Abstract
Abstract This invention discloses double sided lithography for fabricating ultra-small multilayer microcircuit structures without need for any intermediate realignment and without need for any intermediate layer deposition involving reestablishment of surface planarity. Microcircuit patterns (96, 98) are defined on opposite sides of a thin substrate (50) by an exposure tool without intermediate removal of the substrate (50) from the exposure tool, the microcircuit pattern (96) on one side being defined by incident patterning radiation and the microcircuit pattern (98) on the other side being defined by patterning radiation which has passed through the thin substrate.
Inventors
- 👤 Alec Nigel Broers
- 👤 Robert Benjamin Laibowitz
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 13:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/004; G03F7/09; G03F7/095; G03F7/0957; G03F7/20; G03F7/2022; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0082; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2045; H05K2201/00; H05K2201/01; H05K2201/0104; H05K2201/0108; H05K2203/00; H05K2203/15; H05K2203/1572; H05K3/02; H05K3/04; H05K3/046; H05K3/048; H05K3/06; H05K3/061; H05K3/064
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
101 words
A method of forming a microcircuit structure, characterised in that the method comprises the steps of defining a first microcircuit pattern (96) on one side of a thin film substrate (50) with radiation incident upon said one side and defining a second microcircuit pattern (98) on the opposite side of said thin film substrate (50) with radiation which is incident also upon said one side but which passes through said thin film substrate to define said second microcircuit pattern on said opposite side, said microcircuit patterns (96, 98) both being defined without any intermediate realignment of said thin film substrate (50).
Claim 2
Independent Claim
101 words
A method of forming a microcircuit structure, characterised in that the method comprises the steps of defining a first microcircuit pattern (96) on one side of a thin film substrate (50) with radiation incident upon said one side and defining a second microcircuit pattern (98) on the opposite side of said thin film substrate (50) with radiation which is incident also upon said one side but which passes through said thin film substrate to define said second microcircuit pattern on said opposite side, said microcircuit patterns (96, 98) both being defined without any intermediate realignment of said thin film substrate (50).
Claim 3
Dependent Claim
32 words
A method as claimed in claim 1, wherein said radiation defining said first microcircuit pattern and said radiation defining said second microcircuit pattern are simultaneously incident upon said thin film one side.
Claim 4
Dependent Claim
29 words
A method as claimed in claim 1 or 2, wherein said radiation defining said first microcircuit pattern and said radiation defining said second microcircuit pattern comprise the same radiation.
Claim 5
Independent Claim
22 words
A method as claimed in any one of claims 1 to 3, wherein said first and second microcircuit patterns are substantially identical.
Claim 6
Independent Claim
22 words
A method as claimed in any one of claims 1 to 3, wherein said first and second microcircuit patterns are substantially complementary.
Claim 7
Independent Claim
82 words
A method as claimed in any one of the preceding claims, wherein a first resist layer is deposited on said one side of said thin film and a second resist layer is deposited on said opposite side of said thin film, said first resist layer being patterned by the radiation of said first radiation pattern to define said first microcircuit pattern and said second resist layer being patterned by the radiation of said second radiation pattern to define said second microcircuit pattern.
Claim 8
Dependent Claim
31 words
A method as claimed in claim 6, wherein one of said microcircuit patterns comprises contamination resist, the radiation pattern defining said one microcircuit pattern being a pattern of electron beam radiation.
Claim 9
Dependent Claim
31 words
A method as claimed in claim 6, wherein said first and second microcircuit patterns both comprise contamination resist, said first and". second radiation patterns both being patterns of electron beam radiation.
Claim 10
Dependent Claim
47 words
A method as claimed in claim 8, wherein said first microcircuit pattern is formed by establishing a suitable atmosphere for deposition of contamination resist on said one side of said thin film during irradiation of said one side with said first radiation pattern of electron beam radiation.
Claim 11
Dependent Claim
56 words
A method as claimed in claim 9, wherein said second microcircuit pattern is simultaneously formed on said opposite side of said thin film by establishing a suitable atmosphere for deposition of contamination resist also on said opposite side of said thin film, said second radiation pattern being synonomous with and consisting of said first radiation pattern.
Claim 12
Dependent Claim
121 words
A method as claimed in claim 9, wherein the atmosphere on said opposite side is controlled so as to be unsuitable for deposition of contamination resist during irradiation with said first radiation pattern, said first radiation pattern of electron beam radiation thereby producing no contamination resist pattern on said opposite side of said thin film, and wherein said second microcircuit pattern is formed by establishing a suitable atmosphere for deposition of contamination resist on said opposite side of said thin film, but not on said one, during irradiation of said one side with said second radiation pattern of electron beam radiation, said second radiation pattern passing through said thin film and causing deposition of contamination resist only on said opposite side.
Claim 13
Independent Claim
50 words
A method as claimed in any one of the preceding claims, wherein the radiation defining said first microcircuit pattern and the radiation defining said second microcircuit pattern have a different energy characteristic, said different energy characteristic being obtained by interposing a filter between a radiation source and said thin film.
Claim 14
Independent Claim
31 words
A method as claimed in any one of the preceding claims, wherein at least one of said first or second radiation patterns is formed through use of a pattern forming mask.
References Cited (Backward Citations)
No citation records indexed.
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