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EP0097764A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

X-ray lithographic mask

Assignee: International Business Machines Corp
•
Filing: 1983-02-23
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Granted: —
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Expires: 2003-02-23
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Abstract

Abstract An improved X-ray lithography mask has been fabricated by forming an X-ray absorbing lithography pattern on a supporting foil of hydrogenated amorphous carbon. The substrate foil is formed by depositing a carbon film in the presence of hydrogen onto a surface having a temperature below 375°C. The hydrogen concentration is maintained sufficiently high that the resulting film has at least one atom percent of hydrogen. A film having about 20 atom percent of hydrogen is preferred. While impurities are permitted, impurities must be maintained at a level such that the optical bandgap of the resulting film is at least one electron volt. A film with an optical bandgap of about 2 electron volts is preferred.

Inventors

  • 👤 Michael John Brady
  • 👤 Bernard Steele Meyerson
  • 👤 John Michael Warlaumont

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-07 03:05
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22; Y; Y10; Y10S; Y10S430/00; Y10S430/167; Y10S430/168; Y10T; Y10T428/00; Y10T428/30

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 39 words
An X-ray mask comprising a substantially X-ray absorbing patterned layer supported by a substantially X-ray transparent substrate film, characterised in that said substrate film comprises hydrogenated amorphous carbon and having an optical bandgap of at least one electron volt.
Claim 2
Dependent Claim 39 words
An X-ray mask comprising a substantially X-ray absorbing patterned layer supported by a substantially X-ray transparent substrate film, characterised in that said substrate film comprises hydrogenated amorphous carbon and having an optical bandgap of at least one electron volt.
Claim 3
Dependent Claim 20 words
An X-ray mask substrate as claimed in claim 1, wherein said film has at least 1 atom percent of hydrogen.
Claim 4
Dependent Claim 24 words
An X-ray mask substrate as claimed in claim 1 or 2, wherein said film has an optical bandgap of at least 1.6 electron volts.
Claim 5
Dependent Claim 19 words
An X-ray mask substrate as claimed in claim 3, wherein said film has about 20 atom percent of hydrogen.
Claim 6
Dependent Claim 21 words
An X-ray mask substrate as claimed in claim 1, wherein said film has an optical bandgap of about 2 electron volts.
Claim 7
Dependent Claim 35 words
An X-ray mask substrate as claimed in claimed in any one of the preceding claims, wherein said film has been formed by depositing carbon and hydrogen onto a surface having a temperature less than 375°C.
Claim 8
Dependent Claim 34 words
An X-ray mask substrate as claimed in any one of claims 1 to 5, wherein said film has been formed by depositing carbon and hydrogen onto a surface having a temperature less than 300°C.
Claim 9
Dependent Claim 34 words
An X-ray mask substrate as claimed in any one of claims 1 to 5, wherein said film has been formed by depositing carbon and hydrogen onto a surface having a temperature of about 200°C.
Claim 10
Dependent Claim 36 words
9 . An X -ray mask substrate as claimed in any of the preceding claims, wherein said depositing of carbon and hydrogen has been done by glow discharge of a gaseous medium containing carbon and hydrogen.
Claim 11
Dependent Claim 17 words
An X -ray mask substrate as claimed in claim 9, wherein said gaseous medium comprises acetylene gas.
Claim 12
Dependent Claim 37 words
An X-ray mask substrate as claimed in any one of claims 1 to 8, wherein said depositing of carbon and hydrogen has been done by sputtering a carbon target in an inert gaseous medium containing hydrogen gas.
Claim 13
Dependent Claim 25 words
An X-ray mask as claimed in any one of the preceding claims, comprising a frame supporting said X-ray transparent substrate film, said frame comprising silicon.

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