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EP0109148A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Substrate shield for preventing the deposition of nonhomogeneous films

Assignee: Energy Conversion Devices Inc
•
Filing: 1983-09-12
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Granted: —
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Expires: 2003-09-12
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Abstract

Abstract Apparatus (60) for preventing the deposition of nonhomogeneous semiconductor films onto substrates (11) in a glow discharge deposition system which includes at least one deposition chamber (28) into which process gases are introduced and disassociated by electrodynamic fields created between a cathode (34) and the substrate (11). The shielding apparatus (60) of the present invention comprises a pair of relatively narrow, elongated shielding plates (60) spacedly disposed in the deposition chamber (28) so as to lie substantially parallel to the plane of the substrate (11), one each disposed adjacent each of the ends of the cathode (34) to block nonhomogeneous films induced by the varied electrodynamic fields (B) which occur at the ends of the cathode (34) from being deposited. In this way, only homogeneous semiconductor films formed by uniform electrodynamic fields (A) produced adjacent the central portion of the cathode (34) are deposited onto the substrate (11). The shielding plates (60) are preferably coated with a polymer film (61) to prevent discharge in the area between the shielding plates (60) and the substrate (11).

Inventors

  • 👤 Prem Nath
  • 👤 Kevin Richard Hoffman

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-24 05:17
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; H01J37/32733; H01J37/32752; H01J37/32761; H01J37/3277

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 131 words
In glow discharge deposition apparatus wherein semiconductor layers are deposited onto a substrate, the deposition apparatus having at least one dedicated deposition chamber which includes a substrate, at least one cathode spaced from the substrate, means for introducing process gases between the substrate and the cathode and means for energizing the at least one cathode to develop an electrodynamic field in which the process gases are disassociated into plasma, the field having a central substantially uniform region separating a pair of nonuniform regions; the improvement characterized by, in combination: means (60) adapted to substantially prevent nonhomogeneous semiconductor films formed by the nonuniform electrodynamic fields from being deposited onto the substrate (11), such that only the substantially homogeneous semiconductor film formed by the central uniform electrodynamic field is deposited onto the substrate.
Claim 2
Dependent Claim 131 words
In glow discharge deposition apparatus wherein semiconductor layers are deposited onto a substrate, the deposition apparatus having at least one dedicated deposition chamber which includes a substrate, at least one cathode spaced from the substrate, means for introducing process gases between the substrate and the cathode and means for energizing the at least one cathode to develop an electrodynamic field in which the process gases are disassociated into plasma, the field having a central substantially uniform region separating a pair of nonuniform regions; the improvement characterized by, in combination: means (60) adapted to substantially prevent nonhomogeneous semiconductor films formed by the nonuniform electrodynamic fields from being deposited onto the substrate (11), such that only the substantially homogeneous semiconductor film formed by the central uniform electrodynamic field is deposited onto the substrate.
Claim 3
Dependent Claim 31 words
An apparatus according to Claim 1, further characterized by the deposition prevention means including a pair of shielding plates (60) operatively associated with each of the at least one cathode (34).
Claim 4
Dependent Claim 53 words
An apparatus according to Claim 2, further characterized by each one of the pair of shielding plates (60) are operatively secured adjacent the substrate (11) in the region of nonuniform electrodynamic fields (B), so that the nonhomogeneous semiconductor films are deposited onto the surface of the shielding plates rather than onto the substrate.
Claim 5
Independent Claim 37 words
An apparatus according to any one of Claims 2 or 3, further characterized by the shielding plates (60) being covered with a polymer coating (61) to prevent glow discharge between the shielding plates and the substrate (11).
Claim 6
Independent Claim 25 words
An apparatus according to any one of Claims 2 to 4, further characterized by the shielding plates (60) being covered with a polyimide coating (61).
Claim 7
Independent Claim 36 words
An apparatus according to any one of Claims 1 to 5, further characterized by the nonuniform electrodynamic fields (B) being developed adjacent the leading and trailing ends of each of the at least one cathode (34).
Claim 8
Independent Claim 56 words
An apparatus according to any one of Claims 2 to 6, further characterized by the shielding plates (60) are approximately 40 cm long, 5 cm wide and are operatively secured to the deposition apparatus (26) so as to substantially blanket the portions of the substrate (11) overlying the leading and trailing ends of the cathode (34).

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