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EP0121391B1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Method for peel development

Assignee: Nitto Denko Corp
•
Filing: 1984-03-26
•
Granted: 1989-08-02
•
Expires: 2004-03-26
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Abstract

No abstract record available.

Inventors

  • 👤 Yutaka Nitto Electric Ind. Co. Ltd. Yamamura
  • 👤 Shunichi Nitto Electric Ind. Co. Ltd. Hayashi
  • 👤 Tomomichi Nitto Electric Ind. Co. Ltd. Kaneko

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-02 20:14
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/34; G03F7/343; B; B29; B29C; B29C63/00; B29C63/0004; B29C63/0013; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0079; H05K2201/00; H05K2201/01; H05K2201/0104; H05K2201/0108; H05K2203/00; H05K2203/05; H05K2203/0502; H05K2203/0537

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 120 words
A method of peel development comprising: (a) laminating an image-forming material comprising a transparent support and a photopolymerizable composition layer on the surface of a substrate on which an image is formed; (b) imagewise exposing the image-forming material; and then (c) peeling away the support and the unexposed areas of the photopolymerizable composition layer from the substrate to retain the exposed areas thereof on the substrate, wherein the cohesive strength of the photopolymerizable composition layer is set such that the force required to separate the unexposed areas from the exposed areas is at least 1.0 kg/mm 2 and the peeling operation is performed while maintaining a peel angle (a) of the support to the substrate within the range of 0°<aZ90°.
Claim 2
Independent Claim 120 words
A method of peel development comprising: (a) laminating an image-forming material comprising a transparent support and a photopolymerizable composition layer on the surface of a substrate on which an image is formed; (b) imagewise exposing the image-forming material; and then (c) peeling away the support and the unexposed areas of the photopolymerizable composition layer from the substrate to retain the exposed areas thereof on the substrate, wherein the cohesive strength of the photopolymerizable composition layer is set such that the force required to separate the unexposed areas from the exposed areas is at least 1.0 kg/mm 2 and the peeling operation is performed while maintaining a peel angle (a) of the support to the substrate within the range of 0°<aZ90°.
Claim 3
Dependent Claim 16 words
The method of Claim 1, wherein the peel angle (a) is within the range of 60°≦α≦90°.
Claim 4
Dependent Claim 18 words
The method of Claim 1 or Claim 2, wherein the force is 1.0 to 2.0 kg/mm 2 .

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