Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
63 words
An alkali-insoluble positive photoresist composition comprising a mixture of (a) an alkali-insoluble photoactive compound, capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali-insoluble before exposure to actinic radiation; and (b) a polymer comprising an amount of (̵CO-NH-CO)̵ groups sufficient to render the mixture alkali-soluble upon exposure to actinic radiation.
Claim 2
Dependent Claim
63 words
An alkali-insoluble positive photoresist composition comprising a mixture of (a) an alkali-insoluble photoactive compound, capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali-insoluble before exposure to actinic radiation; and (b) a polymer comprising an amount of (̵CO-NH-CO)̵ groups sufficient to render the mixture alkali-soluble upon exposure to actinic radiation.
Claim 3
Dependent Claim
20 words
The alkali-insoluble positive photoresist composition of claim 1 wherein the polymer comprises a copolymer containing an effective amount of residues
Claim 4
Dependent Claim
78 words
The alkali insoluble positive photoresist composition of claim 2 wherein the copolymer is formed from polymerization of a film-forming monomer selected from styrene, a-methylstyrene, 4-(C 1 -C 5 alkyl)styrene, 2-(C 1 -C 5 alk y l)styrene, 2,4-di(C 1 -C 5 alkyl)styrene or a monomer having the formula H 2 C=Cr a M and maleimide, wherein M is CN or C0 2 R b wherein R b is methyl or allyl and wherein R a is H or methyl.
Claim 5
Dependent Claim
68 words
A positive photoresist composition comprising a mixture of (a) about 65-99 weight percent of a copolymer prepared from and, optionally, an effective amount of wherein R 1 and R 4 are independently H or (C 1 -C 5 ) alkyl and wherein R 5 is (C 1 -C 5 ) alkyl; and (b) about 1-35 weight percent of a photoactive compound becoming alkali-soluble upon exposure to actinic radiation.
Claim 6
Dependent Claim
68 words
A positive photoresist composition comprising a mixture of (a) about 65-99 weight percent of a copolymer prepared from and, optionally, an effective amount of wherein R 1 and R 4 are independently H or (C 1 -C 5 ) alkyl and wherein R 5 is (C 1 -C 5 ) alkyl; and (b) about 1-35 weight percent of a photoactive compound becoming alkali-soluble upon exposure to actinic radiation.
Claim 7
Dependent Claim
25 words
The positive photoresist composition of claim 4 wherein the photoactive compound upon exposure to actinic radiation is converted into a compound containing carboxylic acid moieties.
Claim 8
Dependent Claim
33 words
The positive photoresist composition of claim 4 wherein the copolymer comprises about 40 mole % of maleimide, about 10 mole % of N-(C 1 -C 5 alkyl)maleimide, and the balance a styrene unit.
Claim 9
Dependent Claim
82 words
A photosensitive element comprising a substrate bearing a layer of a photoresist composition comprising a mixture of (a) about 65-99 percent of a copolymer prepared from and, optionally, an effective amount of: wherein R 1 to R 4 are independently H or (C 1 -C 5 alkyl) and wherein R 5 is (C 1 -C 5 alkyl) and (b) about 1-35 weight percent of a photoactive compound wherein the photoresist composition upon exposure to actinic radiation is rendered soluble in alkaline solution.
Claim 10
Dependent Claim
82 words
A photosensitive element comprising a substrate bearing a layer of a photoresist composition comprising a mixture of (a) about 65-99 percent of a copolymer prepared from and, optionally, an effective amount of: wherein R 1 to R 4 are independently H or (C 1 -C 5 alkyl) and wherein R 5 is (C 1 -C 5 alkyl) and (b) about 1-35 weight percent of a photoactive compound wherein the photoresist composition upon exposure to actinic radiation is rendered soluble in alkaline solution.
Claim 11
Dependent Claim
39 words
An alkali soluble composition comprising a copolymer formed by polymerization of at least about 10 mole % of maleimide and the balance being N-(C l -C 5 alkyl)maleimide and styrene, or a-methylstyrene, or 2,4-di(C l -C 5 alkyl) styrene.
Claim 12
Dependent Claim
39 words
An alkali soluble composition comprising a copolymer formed by polymerization of at least about 10 mole % of maleimide and the balance being N-(C l -C 5 alkyl)maleimide and styrene, or a-methylstyrene, or 2,4-di(C l -C 5 alkyl) styrene.
Claim 13
Dependent Claim
157 words
A method of preparing a photochemical image which comprises (a) depositing on a face of a substrate a solution of the positive photoresist composition of claim 8 and a suitable organic solvent under conditions and in an amount sufficient to produce a uniform deposit having a thickness on the order of about 0.1 micron to about 20 microns of the composition of claim 1 on a face of the substrate; (b) treating said deposit under conditions of temperature and pressure sufficient to remove substantially all the suitable organic solvent; (c) image wise exposing through a mask said film to actinic radiation in the range of about 200-700 nm for a time sufficient to render the exposed areas of the film soluble in alkaline solution; and (d) contacting the exposed film with a developer solution comprising an alkaline material having a pH greater than about 10 for a time sufficient to remove the exposed areas of the film.
Claim 14
Dependent Claim
19 words
The method of claim 9 which further comprises heating said developed film at a temperature of at about 250°C.