Method for modifying the surface of finely divided silica
Abstract
Abstract In the present invention, finely divided silica is treated with two types of organosilicon compounds, (i) organosilicon compound having the general formula wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group, and (ii) organosilicon compound having the general formula (R₃Si) a -Z wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a equals 1, Z is a hydrogen atom, halogen atom. hydroxyl group, alkoxy group, -NR¹₂, -ONR¹₂, or -OCOR¹; when a equals 2, Z is -O- or -NR¹-; and R¹ is the hydrogen atom or an alkyl group. The present invention characteristically affords a finely divided silica which has a high degree of surface treatment, which provides an elevated thixotropy when mixed with organopolysiloxane, and which provides stability in long-term storage.
Inventors
- 👤 Hideki Kobayashi
- 👤 Masayuki Ohnishi
Bibliographic Details
Claims Analysis
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