Patent US2010897A successfully refreshed from Google Patents.
EP0338749A2
Expired / Lapsed
EP
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Structure of X-ray mask
Assignee: Canon Inc
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Filing: 1989-04-17
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Granted: —
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Expires: 2009-04-17
Abstract
Abstract An X-ray mask structure usable in X-ray lithography is disclosed. The mask structure includes an X-ray absorptive material formed into a desired pattern, a supporting film for supporting the absorptive material pattern and a holding frame for holding the supporting film. In order to attain a desired flatness of the supporting film with good efficiency and good precision, a topmost flat end face of the supporting frame is finished to a flatness t (micron) which, where an inner radius of the holding frame denoted by ℓ (mm), an inner radius of an absorptive material pattern region is denoted by r (mm) and a flatness required in the pattern region is denoted by α (micron), satisfies a relationship: α < t ≦ ℓ/r x α. In another aspect, the holding frame is provided with an inclined portion at its peripheral end portion as well as a groove formed in the inclined portion. The supporting film is adhered to the holding frame by using the groove.
Inventors
- 👤 Yasuaki Fukuda
- 👤 Yumiko Suzuki
- 👤 Hirofumi Shibata
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 02:42
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
112 words
An X-ray mask for use in X-ray lithography, comprising: a supporting film for supporting, in a region thereof having a radius r mm, a pattern made of an X-ray absorptive material; and a holding frame member having an inner diameter ℓ mm, for holding said supporting film, said holding frame member having a topmost flat end face to which said supporting film is press-contacted; wherein, where a flatness required for said region of the supporting film is denoted by α (micron), the topmost flat end face of said holding frame has been finished to a flatness t (micron) for which the following relation is satisfied: α < t ≦ ℓ/r x α
Claim 2
Dependent Claim
112 words
An X-ray mask for use in X-ray lithography, comprising: a supporting film for supporting, in a region thereof having a radius r mm, a pattern made of an X-ray absorptive material; and a holding frame member having an inner diameter ℓ mm, for holding said supporting film, said holding frame member having a topmost flat end face to which said supporting film is press-contacted; wherein, where a flatness required for said region of the supporting film is denoted by α (micron), the topmost flat end face of said holding frame has been finished to a flatness t (micron) for which the following relation is satisfied: α < t ≦ ℓ/r x α
Claim 3
Dependent Claim
25 words
An X-ray mask according to Claim 1, wherein the topmost flat end face has been finished to a surface roughness not greater than 0.5 µm.Ra.
Claim 4
Dependent Claim
35 words
An X-ray mask according to Claim 1, wherein said supporting film is adhered to said holding frame member, while a tension in a range of 10⁷ - 10⁹ dyne/cm² is applied to the supporting film.
Claim 5
Dependent Claim
15 words
An X-ray mask according to Claim 1, wherein said supporting film comprises an organic film.
Claim 6
Dependent Claim
85 words
An X-ray mask for use in X-ray lithography, comprising: a holding frame member including (i) an inclined portion defined in a region of a circumferential edge portion of said holding frame member and being inclined radially outwardly and (ii) a groove formed in a part of said inclined portion; and a supporting film for bearing a pattern and being stretched and adhered to said holding frame member, said supporting film being adhered to said holding frame member by using said inclined portion and said groove.
Claim 7
Dependent Claim
85 words
An X-ray mask for use in X-ray lithography, comprising: a holding frame member including (i) an inclined portion defined in a region of a circumferential edge portion of said holding frame member and being inclined radially outwardly and (ii) a groove formed in a part of said inclined portion; and a supporting film for bearing a pattern and being stretched and adhered to said holding frame member, said supporting film being adhered to said holding frame member by using said inclined portion and said groove.
Claim 8
Dependent Claim
35 words
An X-ray mask according to Claim 5, wherein said supporting film has a portion which is inserted into said groove and wherein said portion of said supporting film is covered and fixed by an adhesive.
Claim 9
Dependent Claim
15 words
An X-ray mask according to Claim 6, wherein said supporting film comprises an organic film.
Claim 10
Independent Claim
74 words
A method of manufacture of an X-ray mask for use in X-ray lithography, comprising the steps of: providing a holding frame member having an inner diameter ℓ ; providing a film for supporting an X-ray absorptive pattern in a region having a radius r; determining a required flatness a of said region; finishing the frame member to a flatness t where a < t ≦ aℓ/r; and securing the film to the frame member.
Claim 11
Independent Claim
74 words
A method of manufacture of an X-ray mask for use in X-ray lithography, comprising the steps of: providing a holding frame member having an inner diameter ℓ ; providing a film for supporting an X-ray absorptive pattern in a region having a radius r; determining a required flatness a of said region; finishing the frame member to a flatness t where a < t ≦ aℓ/r; and securing the film to the frame member.
References Cited (Backward Citations)
No citation records indexed.
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