Solid-state imaging device and method of manufacturing the same

Abstract

Abstract In the solid-state imaging device and its manufacturing method according to the invention, an etching resistant material layer is formed on a filter layer formed on a solid-state imaging device substrate, and a transparent material layer is formed thereon, and this transparent material layer is etched to form a thin film, then microlenses are formed on corresponding light sensing parts after flattening. Hence, the distance from the microlenses to the light sensing parts is shorter than in the prior art. As a result, even if microlenses of a smaller radius or curvature than conventional microlenses are formed, the focus of the focused light can be adjusted to the light sensing parts. Besides, the light of high focusing density enters the light sensing parts, the light sensitivity may be enhanced. In other solid-state imaging device and its manufacturing method according to the invention, a transparent material layer and a photosensitive material layer are laminated at corresponding positions of the light sensing parts on a color filter layer, and microlenses are formed continuously in a substantial hemisphere shape, so as to contact the lower periphery with each other. Accordingly, the light can be focused efficiently on the light sensing parts of the solid-state imaging device substrate, and by using the transparent material layer of the lower layer as a part of the microlenses, the microlenses are present continuously by eliminating the spaces, and hence ineffective light is reduced and the light sensitivity is enhanced. Besides, because of light focusing, the solid-state imaging device free from light scattering or mixture among adjacent light sensing parts may be realized.

Inventors

• 👤 Toru Nomura

Bibliographic Details