EP0547550A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method of manufacturing a chemically adsorbed film
Assignee: Panasonic Holdings Corp
•
Filing: 1992-12-14
•
Granted: —
•
Expires: 2012-12-14
Abstract
Abstract This invention aims to form uniformly and effectively an ultra thin chemical adsorbing film having an excellent water repellent property, oil repellent property, and contamination-proof property on the surface of a substrate by chemically adsorbing in a gas phase atmosphere. A chemically adsorbed film can be formed on any type of substrate and in a short time by chemically adsorbing a chlorosilane based surface-active agent on the surface of a substrate having active hydrogen groups. Further, a chemically adsorbed monomolecular film, or a polymer film, can be formed on any type of substrate and in a short time by forming a siloxane based monomolecular film or a polysiloxane adsorbed film in a gas atmosphere having a chlorosilane based surface-active agent having plurality of chlorosilyl groups.
Inventors
- 👤 Kazufumi Ogawa
- 👤 Norihisa Mino
- 👤 Mamoru Soga
- 👤 Hidetaka Higashino
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 14:56
CPC Classifications
B; B01; B01J; B01J20/00; B01J20/22; B01J20/26; C; C09; C09D; C09D4/00; B05; B05D; B05D1/00; B05D1/18; B05D1/185; B82; B82Y; B82Y30/00; B82Y40/00; B82Y5/00; B05D1/60; B05D3/00; B05D3/14; B05D3/141; B05D3/142; B05D3/144
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
53 words
A method of forming a chemically adsorbed film in a gas phase on a surface of a substrate containing active hydrogen groups comprising contacting a silane based surface adsorbent having a reactive silyl group at one end with a surface of said substrate and initiating a condensation reaction in a gas phase atmosphere.
Claim 2
Dependent Claim
46 words
The method of forming a chemically adsorbed film according to claim 1, where in a chlorosilane based adsorbent or an alkoxyl silane based adsorbent is used as the silane based surface adsorbent and a dehydrochlorination reaction or a de-alcohol reaction is carried out as condensation reaction.
Claim 3
Dependent Claim
45 words
The method of forming a chemically adsorbed film according to claim 2, wherein after dehydrochlorination reaction, unreacted chlorosilane based adsorbent on the surface of the substrate is washed and removed with a non-aqueous organic solution to form a monomolecular adsorbed film and reacted with water.
Claim 4
Dependent Claim
40 words
The method of forming a chemically adsorbed film according to claim 2, wherein after the dehydrochlorination reaction, a compound containing a straight chain molecule as the chlorosilane based adsorbent is reacted with water to form a chemically adsorbed polymer film.
Claim 5
Independent Claim
45 words
The method of forming a chemically adsorbed film according to claims 2, 3 or 4, wherein the chlorosilane based surface adsorbent contains a straight fluorocarbon chain molecule or a portion of straight hydrocarbon chain molecule substituted by a -CF₂- group or a fluorocarbon based group.
Claim 6
Independent Claim
95 words
The method of forming a chemically adsorbed film according to claims 2, 3 or 4, wherein the chlorosilane based adsorbent is CF₃-(CF₂) n -(R) m -SiX p Cl 3-p and wherein n represents 0 or an integer, R represents an alkyl group, a vinyl group, an ethynyl group or a substituted group containing a silicon atom or an oxygen atom, m represents 0 or 1, X represents H, an alkyl group, an alkoxyl group, an alkyl substituted group containing fluorine or an alkoxyl substituted group containing fluorine, and p represents 0, 1, 2 or 3.
Claim 7
Independent Claim
41 words
The method of forming a chemically adsorbed film according to one of claims 1 to 4, wherein the substrate is selected from the group consisting of metal, ceramics, glass, plastic, a semiconductor, an inorganic shaped solid and an organic shaped solid.
Claim 8
Independent Claim
35 words
The method of forming a chemically adsorbed film according to one of claims 1 to 4, wherein the substrate surface is plastic is hydrolized by treating with plasma containing oxygen or in a corona atmosphere.
Claim 9
Dependent Claim
40 words
The method of forming a chemically adsorbed film according to claim 1, wherein the surface of the substrate is contacted with an alkoxyl silane based surface adsorbent is heated to at least about 50 °C to initiate the condensation reaction.
Claim 10
Dependent Claim
135 words
The method of forming a chemically adsorbed film according to claim 1, wherein initiating a dehydrochlorination reaction between a substrate surface containing active hydrogen groups and an adsorbent gas of a material containing a plurality of chlorosilyl groups, washing and removing unreacted adsorbent with a non-aqueous organic solvent, forming a siloxane based monomolecular inner layer film containing a plurality of silanol groups on the surface of the substrate by reacting the inner layer with water, initiating a dehydrochlorination reaction between the inner layer film and an adsorbent gas of a material containing a straight chain group and a chlorosilane group at one end, washing and removing the unreacted adsorbent from the outer layer film with a non-aqueous organic solvent to form a laminated a monomolecular outer layer film, and stabilizing the outer layer with water.
Claim 11
Dependent Claim
138 words
The method of forming a chemically adsorbed film according to claim 1, wherein initiating a dehydrochlorination reaction between a surface of a substrate containing active hydrogen groups and an adsorbent gas to form an inner layer film by using an adsorbent gas of a material containing a plurality of chlorosilyl groups, forming a siloxane based polymer inner layer film containing a plurality of silanol groups on a surface of the substrate by reacting with water, initiating a dehydrochlorination reaction between an active hydrogen atom of the surface of the inner layer film and an adsorbent gas of a material containing a straight chain group and a chlorosilane group at one end, washing and removing unreacted adsorbent from the outer layer film with a non-aqueous organic solvent to form an outer layer film, stabilizing the outer layer with water.
Claim 12
Dependent Claim
141 words
The method of forming a chemically adsorbed film according to claim 1, wherein contacting an adsorbent gas of a material containing a plurality of chlorosilyl groups with a surface of a substrate containing active hydrogen groups to initiate a dehydrochlorination reaction between said active hydrogen groups and said adsorbent gas to form an inner monomolecular layer film, washing unadsorbed adsorbent with a non-aqueous organic solvent, reacting the inner layer with water to form a siloxane based monomolecular inner layer film containing a plurality of silanol groups on the surface of the substrate, contacting an adsorbent gas of a material containing a straight chain group and a chlorosilane group at one end with the surface of the inner layer film, and reacting the outer layer with water to form a laminated polymer outer layer film, and stbilizing the outer layer with water.
Claim 13
Dependent Claim
114 words
The method of forming a chemically adsorbed film according to claim 1, wherein contacting an adsorbent gas of a material containing a plurality of chlorosilyl groups with a surface of a substrate containing active hydrogen groups by bringing about a dehydrochlorination reaction between said active hydrogen groups and said adsorbent gas to form an inner layer film, reacting said inner layer with water to form a polysiloxane inner layer film containing a plurality of silanol groups, contacting an adsorbent gas of a material containing straight chain molecules having chlorosilane groups at one end with said inner layer film to form a laminated polymer outer layer film, and reacting stabilizing the outer layer with water.
Claim 14
Independent Claim
48 words
The method of forming a chemically adsorbed film according to claims 10, 11, 12 or 13, wherein the adsorbent comprising a plurality of chlorosilyl groups is at least one compound selected from the group consisting of SiCl₄, SiHCl₃, SiH₂Cl₂ or Cl-(SiCl₂O) n -SiCl₃ wherein n represents an integer.
Claim 15
Independent Claim
81 words
The method of forming a chemically adsorbed film according to one of claims 1 to 4, wherein the chemically adsorbed film is formed on a surface of a substrate having active hydrogen groups comprising placing said substrate in a vacuum vessel at decreased pressure or in a dry atmosphere and contacting a silane based surface adsorbent having a reactive silyl group at one end and in a gas phase with said surface of said substrate to bring about a dehydrochlorination reaction.
Claim 16
Dependent Claim
54 words
The method of forming a chemically adsorbed film according to claim 15, wherein the gas phase of the surface adsorbent is produced by heating the silane based surface adsorbent or bubbling the silane based surface adsorbent or the adsorbent solution containing a silane based adsorbent by using a dry inert gas as a carrier.
Claim 17
Dependent Claim
27 words
The method of forming a chemically adsorbed film according to claim 15, wherein the vacuum vessel is at a decreased pressure lower than at least 10⁻⁵ Torr.
Claim 18
Dependent Claim
26 words
The method of forming a chemically adsorbed film according to claim 15, wherein an active gas is contacted with the substrate after a step of exhaust.
Claim 19
Dependent Claim
23 words
The method of forming a chemically adsorbed film according to claim 15, wherein moisture in the air is used as a reactive gas.
Claim 20
Dependent Claim
87 words
The method of forming a chemically adsorbed film according to claim 15, wherein the silane based surface adsorbent is CF₃-(CF₂) p -(R) m -SiCl n X 3-n , wherein p represents 0 or an integer, m represents 0 or 1, R represents a hydrocarbon group containing a methylene group, vinylene group (-CH=CH-), an ethynylene group (-C≡C-), a silicon group (-Si), or an oxygen atom (-0-), X represents a hydrogen atom, a lower alkyl group or a lower alkoxyl group, n represents an integer from 0 to 3.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.