EP0874281A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Chemically amplified resist
Assignee: Infineon Technologies AG
•
Filing: 1998-04-09
•
Granted: —
•
Expires: 2018-04-09
Abstract
Abstract Chemically enhanced resist contains (a) a polymer (I) with carboxylic anhydride and tert.-butyl ester, tert.-butoxycarbonyloxy, tetrahydrofuranyl or tetrahydropyranyl groups, (b) a photo-acid (II), which releases a sulphonic acid (IIA) with a pKa value > 0.5 on exposure to light or electrons, (c) a buffer (III) undergoing a reversible chemical reaction with (IIA) and (d) a solvent (IV).
Inventors
- 👤 Rainer Dr. Leuschner
- 👤 Ewald Dr. Günther
- 👤 Klaus Dr. Elian
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 03:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/022; G03F7/038; G03F7/0382; G03F7/039; G03F7/0392; G03F7/0395; G03F7/0397; G03F7/26; G03F7/265; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/111; Y10S430/114; Y10S430/116; Y10S430/127
Claims Analysis
Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.