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JPH0321901A Expired / Lapsed JP ⏱️ 0.0 years remaining

Production of lens array

Assignee: Seiko Epson Corp
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Filing: 1989-06-19
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Granted: —
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Expires: 2009-06-19
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Abstract

Abstract PURPOSE:To increase the degree of freedom in the selection of a heat deformable resin so as to allow the dealing with lens arrays of various specifications by using a producing means which etches the patterns of the heat deformable resin by using a mask. CONSTITUTION:The patterns of the heat deformable resin are obtd. by masking the heat deformable resin 102 and etching the resin in the process for production of the lens array by heating the previously formed patterns of the heat deformable resin to deform the patterns of the heat deformable resin to produce individual microlenses. The mask is obtd. by patterning of a thin metallic film 103. The heat deformable resin 102 is not required to have photosensitivity in this way and, therefore, an optically transparent material is selectable for the same. Since the patterns are not produced by utilizing photoreaction, the accurate patterns are produced even if the film thickness is increased.

Inventors

  • 👤 Shoichi Uchiyama
  • 👤 正一 内山
  • 👤 Yoshitaka Ito
  • 👤 嘉高 伊藤

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-02 22:57
CPC Classifications
—

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