Exposing method

Abstract

Abstract PURPOSE:To expose a sample uniformly extending over the whole sample region by scanning the sample at speed inversely proportional approximately to the thickness of a photo-resist at positions, where ultraviolet rays are irradiated, of the sample. CONSTITUTION:A photo-mask, on which a pattern which must be transferred to the sample is drawn, and the sample, on the surface thereof the photo-resist is applied, are set to the lower surface of a glass plate or a plastic film having excellent ultraviolet transmittance under adhesive or adjacent conditions at the predetermined position of a region to which beams from an irradiating source are irradiated. On the other hand, the thickness of the photo-resist on the sample applied through a spin coating method is inclined to suddenly increase near outer circumferences A, A'. For form the uniform pattern to such a photo-resist with unequal thickness, the sample is scanned extending over the whole sample region at speed change inversely proportional approximately to the quantity of the variation of the thickness of the photo-resist toward the center of the sample from the end section A of the sample when the intensity of ultraviolet rays irradiated from the irradiating source is constant.

Inventors

• 👤 Taiji Hiraga
• 👤 平賀　泰司

Bibliographic Details