Production of thin film magnetic head

Abstract

Abstract PURPOSE:To facilitate an easy production of a thin film magnetic head of a planar structure, by using a thin film forming technique and a fine working technique. CONSTITUTION:The 1st insulated layer 2 is formed on a ferromagnetic substrate 1 which serves as a magnetic core, and the 1st conductor layer 3 is formed on the layer 1 respectively by a sputtering process, etc. The layer 3 is etched into a micro pattern form of a multi-turn type, and the 2nd insulated layer 4 is formed on the layer 3 by sputtering with a thickness larger than that of the layer 3. An organic material 5 such as the resist, polyimide, etc. of an OZ or OMR group is coated evenly on the surface of the layer 4. Then a part of the material 5 and the layer 4 is etched and flattened by an etching process having no selecting properties. The 2nd conductor layer 5 is formed on the material 5 by sputtering or the like process and then etched into a micro pattern form of a multi-turn type. Then the 3rd insulated layer 6 is formed, and an organic material is coated on the layer 6 and etched evenly. Thus a ferromagnetic magnetic layer 7.

Inventors

• 👤 Toru Kira
• 👤 吉良　徹
• 👤 Koji Otsuka
• 👤 光司 大塚
• 👤 Mitsuhiko Yoshikawa
• 👤 吉川　光彦

Bibliographic Details