Production of color filter

Abstract

Abstract PURPOSE:To reduce processing stages in the state of dyeing the 3rd dye region on the dye resin layer on the substrate of a solid state image sensing element by dyeing said region without forming any photoresist pattern. CONSTITUTION:The patterns of a metallic layer 3 and the 1st photoresist 4 are formed on the dye resin layer 2 on the substrate 1 of a solid state image sensing element, and by making use of these as a mask, the 1st dye region 5 is dyed, whereafter the 1st dyeing mask layer 10 is formed, then the resist 4 is removed over the entire surface and the mask layer 10 is partially removed. The pattern of the 2nd photoresist 6 is formed and by making use of the layer 3, the layer 10 and the photoresist 6 as a mask, the 2nd dyeing region 7 is dyed, whereafter the 2nd dyeing mask layer 11 is formed and the resist 6 is removed over the entire surface; at the same time, the layer 11 is partially removed. The 3rd dyeing region 9 is dyed with the layer 3 and the layers 10, 11 as a mask.

Inventors

• 👤 Toshiyuki Oota
• 👤 敏行 太田

Bibliographic Details