Semiconductor device

Abstract

Abstract PURPOSE:To improve the utilization rate of the area of a semiconductor element by arranging a pattern for positioning used for a check for the state of the positioning and exposure of a photo-resist process and the displacement of a photo-resist pattern and the like between the semiconductor elements on the check. CONSTITUTION:When the patterns 2-10 for positioning used for the positioning and exposure processes of the photo-resist process are set up in semiconductor element pieces 1, they are not set up in the element pieces 1 and arranged on the scribing lines 11 existing among the element pieces 1. Accordingly, the absolutely indispensable positioning patterns 2-10 for making sure the result of the resist pattern are not set up on the element pieces, but positioned among these element pieces, and the lowering of utilization rates in the element pieces 1 is avoided.

Inventors

• 👤 Kazutaka Ikeyama
• 👤 池山　一孝

Bibliographic Details