Ion implantation device

Abstract

Abstract PURPOSE:To make it possible to evaluate the uniformity of ion implantation in a short time by rotating a disk, on which small holes are provided each at different distances from its center and at a certain interval of angle, in front of a Faraday cup. CONSTITUTION:When a disk 2 is rotated clockwise, the light rays pass through a slit 3 and a standard pulse signal 8a goes into a control section 10; then a control signal 10a(1) is outputted to turn on a switch 111, and a voltage signal 6a generated by an ion beam 1a which has passed through a small hole 41 is led to an integrator 121, indicating an integrated output at its output terminal (1). When the disk 2 is rotated, the ion beam 1a passes through small holes 42 to 4n successively, and the integrated outputs corresponding to this ion beam 1a are each indicated at the output terminals (2)-(n). Because the small holes 41 to 4n are set at different distances from the center of the disk 2, the radiant distribution of ions radiated on the disk 2 can be obtained from the outputs indicated on the output terminals (1)-(n).

Inventors

• 👤 Kinji Tsunenari
• 👤 欣嗣 恒成

Bibliographic Details