Vacuum arc vapor deposition device

Abstract

Abstract PURPOSE:To improve the cleanliness of a substrate for vapor deposition and to form a vapor deposited film having excellent adhesiveness and density by disposing an intermediate electrode between a cathode and the substrate of a vacuum deposition device and supplying electric power for heating or high-frequency discharge thereto. CONSTITUTION:The coil-shaped intermediate electrode 18 is disposed between the cathode 8 consisting of a vapor deposition material in a vacuum vessel 2 of the vacuum deposition device and a holder 10 of the substrate 12 for vapor deposition. The inside of vacuum vessel is evacuated to a vacuum by an evacuation system 4 and an inert gas G such as Ar or N2 is introduced from a gas introducing port 6 into the vacuum vessel. A DC voltage is impressed by a DC power source 18 to the substrate 12 to generate a glow discharge near the substrate; at the same time, AC, DC or high-frequency power is applied by a power source 20 to the intermediate electrode 18 to heat the same by which thermions are released and the glow discharge is maintained in a relatively low vacuum degree. The substrate 12 is sputtered by the ionized gas such as Ar and is thereby thoroughly cleaned. The vapor deposited film consisting of the dense cathode material having the high adhesive power is in succession formed on the surface of the substrate 12 by vacuum deposition.

Inventors

• 👤 Koji Okamoto
• 👤 康治 岡本
• 👤 Eiji Kamijo
• 👤 栄治 上條

Bibliographic Details