Vacuum device

Abstract

Abstract PURPOSE:To prevent the corrosion of the contact surface of a cooling plate in common use for supporting and cooling a target with a vacuum sealing material and to prevent leakage of water into a vacuum atmosphere with a vacuum device in which a sputtering phenomenon is applied by providing a corrosion resistant film to the contact surface of said cooling plate with the vacuum sealing material. CONSTITUTION:A Cr film 12 having about 30-50mu film thickness is formed by a plating method onto the sealing surface 11A, including contact surface 11B with an O-ring, of the cooling plate 11 made of steel which supports the target and contacts an electrode via the O-ring for vacuum sealing of the vacuum device which is used for growing or etching of a thin film and in which the sputtering phenomenon is applied. Since the corrosion of the Cr film 12 on the sealing surface 11A by the cooling water is thereby obviated, the change of the surface roughness thereof is obviated and the sealing effect of the O-ring is maintained.

Inventors

• 👤 Yoshio Takahashi
• 👤 良夫 高橋
• 👤 Kunio Hata
• 👤 畑　邦夫

Bibliographic Details