Laser excitation mass spectrometer

Abstract

Abstract PURPOSE:To realize comparative minituarization and low cost, and increase stability in addition, by making spattering deposition of constitutive atoms and molecules of material to be analyzed on a substrate of high purity, and irradiating the deposited film with middle or low output pulse laser beams. CONSTITUTION:A high speed atomic beam source or an ion source 21 and a substrate 24 of high purity and cleanliness are provided inside a vacuum vessel 8, and a middle or low output pulse laser generator 26 is arranged outside a laser incidence window 9 of the vacuum vessel 8. After exhausting the vacuum vessel 8 adequately with a vacuum pump 10, high speed atomic beams or ion beams are radiated from the high speed atomic beam source or the ion source 21 to bombard a sample 1. With this bombardment, constitutive atoms and molecues on the surface are spattered, and they are scattered as spattering atoms and molecules 23. The spattering atoms and molecules thus scattered accumulate on the surface of said substrate 24. The sedimentary layer of the substrate 24 is irradiated with a pulse laser beam 25 radiated from said pulse laser generator 26 through the laser incidence window 9.

Inventors

• 👤 Kazutoshi Nagai
• 👤 一敏 長井
• 👤 Yoshimitsu Asanuma
• 👤 浅沼　吉光
• 👤 Fusao Shimokawa
• 👤 房男 下川

Bibliographic Details