Plasma apparatus

Abstract

Abstract PURPOSE:To make plasma density on the surface of a sample uniform and to form a film having a uniform thickness or to uniformly etch it by providing magnetic field generators which can be independently set so that the magnetic flux density at the peripheral edge of the sample is higher than that at its center. CONSTITUTION:Large and small cylindrical magnets 6, 7 which construct magnetic field generators are arranged under a sample base 5 in a reaction chamber 3. Leads are wound on the outer peripheries of the magnets 6, 7, and the magnets 6, 7 are so slightly elevationally displaced concentrically that the magnet 6 inside is high and the magnet 7 outside is low. The magnet 7 is so set as to form lines of magnetic force of the same direction as those formed by an exciting coil 4, and the magnet 6 is so set as to form lines of magnetic force of opposite direction thereto, and a DC current is supplied so that the magnetic field of the magnet 7 is larger than that of the magnet 6. The magnetic flux density of the magnetic flux formed by the magnets 6, 7 may be set so as to make a plasma distribution uniform on the surface of a sample S.

Inventors

• 👤 Seiichi Nakamura
• 👤 Satoru Nakayama

Bibliographic Details