US3604331A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Machine for developing resist images
Assignee: EIDP Inc
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Filing: 1967-07-26
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Granted: 1971-09-14
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Expires: 1987-07-26
Abstract
Abstract A machine for developing resist images having an initial spray chamber where an exposed photosensitive element is suspended, sprays in said chamber adapted to apply developer solution to said element, a final spray chamber where the developed element is suspended, and sprays in said final spray chamber adapted to apply a washing solution to the developed element. The machine has a mechanism for recycling the developer solution and metering device for supplying the washing solution. The machine is useful for developing and washing exposed photopolymerizable plates, e.g., those used for printed circuits.
Inventors
- 👤 John Barron Carberry
- 👤 Abraham Bernard Cohen
- 👤 Robert Bernard Heiart
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 04:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/3085; G03D; G03D13/00; G03D3/00; G03D3/02
Claims Analysis
Total Claims: 1
Claim 1
Independent Claim
18 words
A machine according to claim 1 wherein the chamber is provided with heating means for evaporating solvent therein.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-09-13 | 1975-03-15 | 1975-09-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-09-13 | 1979-03-15 | 1979-09-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-09-13 | 1983-03-15 | 1983-09-14 | $7700.00 | Window Closed / Lapsed |