Photofabrication system using developed negative and positive images in combination with negative-working and positive-working photoresist compositions to produce resists on opposite sides of a workpiece

Claim 2

A process of claim 1, wherein said first and second image layers are carried on transparent supports.

Claim 3

A process of claim 1, wherein said first, positive image layer is placed in contact with said positive-working photoresist composition and said second, negative image layer is placed in contact with said negative-working photoresist composition.

Claim 4

A process of claim 1 wherein the positive and negative image layers, are prepared substantially simultaneously by a process which comprises intimately contacting an exposed negative silver halide emulsion layer with a water-permeable hydrophilic organic colloid processing element separable from said emulsion layer and having dispersed therein a silver precipitating agent, said processing element containing an amount of processing solution sufficient to develop said exposed silver halide to metallic silver and to dissolve substantially all undeveloped silver halide from said exposed emulsion layer, maintaining said processing element and said emulsion layer in intimate contact until development of a latent image and until substantially all of the undeveloped silver halide has been cleared from said emulsion layer and precipitated in said processing element, providing registration holes in said silver halide emulsion layer and said processing element while said layer and said element are still in intimate contact, and separating said emulsion layer containing a negative silver image from said processing element containing a positive silver image.

Claim 5

A process of claim 1, wherein said negative-working resist is a cinnamic acid ester of a hydroxy-containing polymer.

Claim 6

A process of claim 1, wherein said negative-working resist is an azide sensitized rubber material.

Claim 7

A process of claim 1, wherein said negative-working resist is a poly(vinyl cinnamate).

Claim 8

A process of claim 1, wherein the positive-working resist is a mixture of an azonia diazo ketone and a phenolic resin.

Claim 9

A process of claim 1, wherein the positive-working resist is a polymeric quinone diazide.

Claim 10

A process of claim 1, wherein the workpiece is a metal plate.

Claim 11

A process of claim 1, wherein the workpiece is a copper plate.