High-energy chemical laser system
Abstract
Abstract A high-energy chemical laser system wherein explosive gaseous mixtures of a reducing agent providing hydrogen isotopes and nitrogen-fluorine compounds are uniformly ignited by means of flash-photolysis or an electron beam. The resulting chemical explosion pumps a lasing chemical species, hydrogen, deuterium or tritium fluoride which is formed in the chemical reaction. The generated lasing pulse has light frequencies in the 3-micron range. Suitable nitrogen-fluorine gaseous compounds include tetrafluorohydrazine (N2F4), nitrogen-trifluoride (NF3) difluorodiazine (N2F2), and suitable reducing agents including hydrogen (H2) deuterium (D2), tritium (T2) diforane (B2H6) pentaborane (B5H9) and methane (CH4), as well as combinations of the gaseous compound and/or molecular mixtures of the reducing agent.
Inventors
- 👤 David W Gregg
- 👤 Richard K Pearson
Bibliographic Details
Claims Analysis
Total Claims: 9References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-11-22 | 1975-05-24 | 1975-11-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-11-22 | 1979-05-24 | 1979-11-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-11-22 | 1983-05-24 | 1983-11-23 | $7700.00 | Window Closed / Lapsed |