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US3635767A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of implanting impurity ions into the surface of a semiconductor

Assignee: Hitachi Ltd
•
Filing: 1969-09-24
•
Granted: 1972-01-18
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Expires: 1989-09-24
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Abstract

Abstract Disclosed is a method of implanting impurity ions wherein such ions are implanted into the surface of a semiconductor partially exposed by a hole in two layers, one being made of silicon oxide and the other being made of a metal such as aluminum.

Inventors

  • 👤 Takashi Tsuchimoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 22:34
CPC Classifications
H; H10; H10P; H10P30/00; H10P30/20; H10P30/21; H10P30/202; H10P30/204; H10P76/00; H10P76/40; H10P95/00; Y; Y10; Y10S; Y10S148/00; Y10S148/106

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 27 words
A method according to claim 1, wherein said first and second insulating layer are selected from the group consisting of silicon oxide, aluminum oxide and silicon nitride.
Claim 2
Dependent Claim 25 words
A method according to claim 1, wherein said first and second metal layer are selected from the group consisting of aluminum, molybdenum, tantalum and chromium.
Claim 3
Dependent Claim 26 words
A method according to claim 3, wherein the thickness of said first and second metal layers are enough to prevent the impurity ions from passing therethrough.
Claim 4
Dependent Claim 24 words
A method according to claim 1, wherein the conductivity type of the first ion implanted region is opposite to that of the semiconductor substrate.
Claim 5
Dependent Claim 34 words
A method according to claim 1, wherein the conductivity type of the second ion implanted region is opposite to that of the first ion implanted region and same to that of the semiconductor substrate.
Claim 6
Dependent Claim 23 words
A method according to claim 1, wherein the thickness of said first insulating layer is different from that of said second insulating layer.

References Cited (Backward Citations)

US3341754A Cited
US3481030A Cited
US3431150A Cited
US3523042A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-01-17 1975-07-19 1976-01-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-01-17 1979-07-19 1980-01-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-01-17 1983-07-19 1984-01-18 $7700.00 Window Closed / Lapsed

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