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US3637383A Expired / Lapsed US ⏱️ 0.0 years remaining

Radiation-sensitive elements and etch processes using the same

Assignee: Teeg Research Inc
•
Filing: 1969-07-14
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Granted: 1972-01-25
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Expires: 1989-07-14
📄 Original PDF 🌐 Google Patents

Abstract

Abstract Radiation-sensitive elements comprising a pair of layers of dissimilar inorganic materials capable of interreacting when subjected to impinging electromagnetic actinic radiation with the formation of an interreaction product or products corresponding to the areas exposed to such radiation, and further comprising at least one underlying layer of a third material which is sought to be discretely and selectively etched according to a pattern or image projected upon the sensitive element. The portions of the radiation-sensitive element which have not been exposed to actinic radiation act as a resist material during etching of underlying layers, such that a relief representation of the original image projected upon the sensitive element is obtained by a simple process consisting principally of exposure to actinic radiation followed by a one-step or two-step etch operation.

Inventors

  • 👤 Robert W Hallman
  • 👤 Gary W Kurtz

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 06:41
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; C; C23; C23F; C23F1/00; C23F1/02; C25; C25D; C25D5/00; C25D5/02; G; G03; G03C; G03C1/00; G03C1/705; G03F; G03F7/00; G03F7/12; H01; H01C; H01C17/00; H01C17/22; H10; H10N; H10N97/00

Claims Analysis

Total Claims: 23
Claim 1
Independent Claim 10 words
The method of claim 1 further comprising removing said overlayer.
Claim 2
Dependent Claim 47 words
The method of claim 1 further comprising: re-exposing said radiation-sensitive element uniformly to electromagnetic actinic radiation for forming an interreaction product between the unreacted portions of said second layer and said overlayer for decreasing the adhesion between said second layer and said overlayer, and removing said overlayer.
Claim 3
Independent Claim 234 words
A method for preparing a plate element provided with a relief image comprising: projecting an actinic radiation image upon an electromagnetic radiation-sensitive element having a first layer of a material capable of entering in solution in an etchant, a second layer having substantial resistance to The action of said etchant and which is selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, and an overlayer of an inorganic material substantially transmissive of said radiation capable when exposed to electromagnetic actinic radiation to interreact with said second layer such as to cause a discrete radiation-induced complete etching in depth of said layer for adequate amount of electromagnetic radiation impinging thereupon, wherein said inorganic material is different from the material of said second layer and is selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium and tellurium, removing said interreaction product so as to bare portions of said first layer, removing said overlayer and etching the first layer where thus bared in said etchant.
Claim 4
Independent Claim 264 words
A method for preparing a plate element provided with a relief image comprising: projecting an actinic radiation image upon an electromagnetic radiation-sensitive element having a first layer of a material capable of entering in solution in an etchant, a second layer having substantial resistance to the action of said etchant and which is selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, and an overlayer of an inorganic material substantially transmissive of said radiation and capable of entering in solution in said etchant and capable when exposed to electromagnetic actinic radiation to interreact with said second layer such that the formation of interreaction product at the boundary between said second layer and said overlayer causes a discrete radiation-induced complete etching in depth of said second layer for adequate amount of electromagnetic radiation impinging thereupon, wherein said inorganic material is different from the material of said second layer and is selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium and tellurium, removing said interreaction product so as to bare portions of said first layer, and etching the first layer where thus bared in said etchant whilst simultaneously dissolving said overlayer in said etchant.
Claim 5
Independent Claim 278 words
A method for making a relief image by means of electromagnetic radiation-sensitive element comprising three dissimilar superimposed layers substantially adhering to each other, the first of said layers being selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, the second of said layers being an inorganic material different from that of said first layer and capable when exposed to electromagnetic actinic radiation to form an interreaction product with said first layer, wherein said inorganic material is selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium and tellurium, and the third of said layers being a material incapable of interreacting with said second layer, wherein said first layer is substantially transmissive of said radiation and wherein said interreaction product and said second and third layers are soluble in a first solvent and said first layer is soluble in a second solvent, said method comprising the steps of: impinging an actinic radiation-defined image upon said first transmissive layer for causing selectively and discretely the formation of said interreaction product at the boundary between said first and second layers selectively and discretely consuming portions of said first layer, and selectively and discretely dissolving in said first solvent said interreaction product and corresponding portions of said second and third layers.
Claim 6
Dependent Claim 30 words
The method of claim 6, wherein the formation of said interreaction product causes an etching of the first layer which extends in depth all the way through said first layer.
Claim 7
Dependent Claim 21 words
The method of claim 6, further comprising the step of: dissolving in said second solvent the remaining of said first layer.
Claim 8
Independent Claim 283 words
A method for making a relief image by means of an electromagnetic radiation-sensitive element comprising three dissimilar superimposed layers substantially adhering to each other, the first of said layers being selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, the second of said layers being an inorganic material different from that of said first layer and capable when exposed to electromagnetic actinic radiation to form an interreaction product with said first layer, wherein said inorganic material is selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium and tellurium, and the third of said layers being a material incapable if interreacting with said second layer, wherein said first layer is substantially transmissive of said radiation and wherein said interreaction product and said second layers are soluble in a first solvent and said third layer is soluble in a second solvent, said method comprising the steps of: impinging an actinic radiation-defined image upon said first layer for causing selectively and discretely the formation of said interreaction product at the boundary between said first and second layers selectively and discretely consuming portions of said first layer, and selectively and discretely dissolving in said first solvent said interreaction product and corresponding portions of said second layer so as to bare portions of said third layer.
Claim 9
Dependent Claim 31 words
The method of claim 9, wherein the formation of said interreaction product causes a selective etching of the first layer which extends in depth all the way through said first layer.
Claim 10
Dependent Claim 22 words
The method of claim 9 further comprising the step of: dissolving in said second solvent the exposed portions of said third layer.
Claim 11
Dependent Claim 27 words
The method of claim 11, wherein the remaining of said first layer is dissolved in said second solvent simultaneously with said exposed portions of said third layer.
Claim 12
Independent Claim 282 words
A method for making a relief image by means of an electromagnetic radiation-sensitive element comprising four dissimilar superimposed layers substantially adhering to each other, the second of said layers being selecteD from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, the first and third of said layers being an inorganic material different from that of said second layer and capable when exposed to electromagnetic actinic radiation to form an interreaction product with said second layer, wherein said inorganic material is selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium, and tellurium, and the fourth of said layers being a material incapable of interreacting with said third layer, wherein said first layer is substantially transmissive of said radiation and wherein said first, third and fourth layers and said interreaction product are soluble in a first solvent and said second layer is soluble in a second solvent, said method comprising the steps of: impinging an actinic radiation-defined image upon said first layer for causing selectively and discretely the formation of said interreaction product at the boundary between said first and second layers selectively and discretely consuming portions of said second layer, and selectively and discretely dissolving in said first solvent said interreaction product and corresponding portions of said first, third and fourth layers.
Claim 13
Dependent Claim 31 words
The method of claim 13, wherein the formation of said interreaction product causes a selective etching of the second layer which extends in depth all the way through said second layer.
Claim 14
Dependent Claim 21 words
The method of claim 13, further comprising the step of: dissolving in said second solvent the remaining of said second layer.
Claim 15
Independent Claim 289 words
A method for making a relief image by means of an electromagnetic radiation-sensitive element comprising four dissimilar superimposed layers substantially adhering to each other, the second of said layers being selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, the first and the third of said layers being an inorganic material different from that of said second layer and capable when exposed to electromagnetic radiation to form an interreaction product with said second layer, wherein said inorganic material is selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium and tellurium, and the fourth of said layers being a material incapable of interreacting with said third layer, wherein said first layer is substantially transmissive of said radiation and wherein said first and third layers and said interreaction product are soluble in a first solvent and said fourth layer is soluble in a second solvent, said method comprising the steps of: impinging an actinic radiation-defined image upon said first layer for causing selectively and discretely the formation of said interreaction product at the boundary between said first and second layers selectively and discretely consuming portions of said second layer, and selectively and discretely dissolving in said first solvent said interreaction product and corresponding portions of said first and third layers so as to bare portionS of said fourth layer.
Claim 16
Dependent Claim 31 words
The method of claim 16, wherein the formation of said interreaction product causes a selective etching of the second layer which extends in depth all the way through said second layer.
Claim 17
Dependent Claim 21 words
The method of claim 16, further comprising the step of: dissolving in said solvent the bared portions of said fourth layer.
Claim 18
Dependent Claim 27 words
The method of claim 16, wherein the remaining of said second layer is dissolved in said second solvent simultaneously with said bared portions of said fourth layer.
Claim 19
Independent Claim 284 words
A method for making a relief image by means of an electromagnetic radiation-sensitive element comprising three dissimilar superimposed layers substantially adhering to each other, the first of said layers being an inorganic material capable when exposed to electromagnetic actinic radiation to form an interreaction product with the second of said layers, said inorganic material being selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, and X and Y are selected from the group consisting of halogen, sulfur, selenium and tellurium, the second of said layers is a material different from that of said first layer and is selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium, and vanadium, and the third of said layers being a material incapable of interreacting with said second layer, wherein said first layer is substantially transmissive of said radiation and wherein said interreaction product and said first layers are soluble in a first solvent and said third layer is soluble in a second solvent, said method comprising the steps of: impinging an actinic radiation-defined image upon said first layer for causing selectively and discretely the formation of an interreaction product at the boundary between said first and second layers selectively and discretely consuming portions of said second layer, and selectively and discretely dissolving in said first solvent said interreaction product and said first layer so as to bare portions of said third layer.
Claim 20
Dependent Claim 31 words
The method of claim 20 wherein the formation of said interreaction product causes a selective etching of the second layer which extends in depth all the way through said second layer.
Claim 21
Dependent Claim 22 words
The method of claim 20, further comprising the step of: dissolving in said second solvent the bared portions of said third layer.
Claim 22
Independent Claim 264 words
A method for making a relief image by means of an electromagnetic radiation-sensitive element comprising three dissimilar superimposed layers substantially adhering to each other, the first of said layers being an inorganic material capable when exposed to electromagnetic actinic radiation to form an interreaction product with the second of said layers, said inorganic material being selected from the group consisting of sulfur, selenium, M-X compounds and mixtures and M-X-Y compounds and mixtures, wherein M is a metal selected from the group consisting of arsenic, antimony, bismuth, selenium, tellurium, copper, zinc, cadmium, mercury, lead, chromium, gallium, indium, thallium, germanium, tin, iron, cobalt, nickel and silver, the second of said layers is a material different from that of said first layer and is selected from the group consisting of silver, copper, lead, cadmium, zinc, iron, tin, arsenic, bismuth, cobalt, germanium, indium, manganese, mercury, nickel, selenium, silicon, tellurium, thallium and vanadium, and the third of said layers being a material incapable of interreacting with said second layer, wherein said first layer is substantially transmissive of said radiaTion and wherein said interreaction product and said first and third layers are soluble in a solvent, said method comprising the steps of: impinging an actinic radiation-defined image upon said first layer for causing selectively and discretely the formation of an interreaction product at the boundary between said first and second layers selectively and discretely consuming portions of said second layer, and selectively and discretely dissolving in said solvent said first layer and said interreaction product and portions of said third layer corresponding to the consumed portions of said second layer.
Claim 23
Dependent Claim 31 words
The method of claim 23, wherein the formation of said interreaction products causes a selective etching of the second layer which extends in depth all the way through said second layer.

References Cited (Backward Citations)

GB344354A Cited
GB968141A Cited
US3122463A Cited
US3271180A Cited
US3346384A Cited
US3386823A Cited
US3377169A Cited
GB1151310A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-01-24 1975-07-26 1976-01-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-01-24 1979-07-26 1980-01-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-01-24 1983-07-26 1984-01-25 $7700.00 Window Closed / Lapsed

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