US3664948A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering system
Assignee: Texas Instruments Inc
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Filing: 1969-11-19
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Granted: 1972-05-23
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Expires: 1989-11-19
Abstract
Abstract A sputtering system includes a pair of spaced electrodes, one formed from titanium and the other formed from platinum. Substrates are rotated over both electrodes by a turntable that is actuated by a reversible drive mechanism. A mask alternately blocks each electrode. The mask is coupled to the turntable drive mechanism by a slip clutch and is moved between the two blocking positions when the direction of rotation of the turntable is reversed. In the use of the system, the electrodes are actuated in sequence. The mask is positioned to block each electrode during the initial portion of its operation. This deposits the material of the electrodes on the mask until the electrodes are clean.
Inventors
- 👤 Joseph Victor Graffeo Jr
- 👤 Bertran W Mason Jr
- 👤 Wells Wallace Ogden
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 07:19
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
39 words
The deposition system according to claim 1 further including means for receiving material sputtered from the first electrode while the mask is positioned in alignment therewith and for producing an output indicative of the cleanliness of the first electrode.
Claim 2
Dependent Claim
74 words
The deposition system according to claim 1 wherein the workpiece moving means alternately moves workpieces through the chamber in two directions and wherein the mask moving means is coupled to the workpieces moving means and moves the mask to one of its positions whenever the workpieces moving means moves workpieces in one direction and moves the mask to the other of its positions whenever the workpiece moving means moves workpieces in the other direction.
Claim 3
Dependent Claim
47 words
The deposition system according to claim 1 further including means for operating the electrodes in sequence and for coordinating the operation of the mask moving means with the operation of the electrodes so that the mask blocks each electrode during the initial portion of the operation thereof.
Claim 4
Dependent Claim
37 words
The deposition system according to claim 1 wherein the mask moving means includes a pair of stops each corresponding to one of the positions of the mask and means for alternately moving the mask between the stops.
Claim 5
Dependent Claim
57 words
The deposition system according to claim 1 wherein the workpiece moving means includes a workpiece supporting turntable and a mechanism for rotating the turntable through the chamber and wherein the mask positioning means includes a mechanism for rotating the mask through the chamber and a clutch for coupling the mask rotating mechanism to the turntable rotating mechanism.
Claim 6
Dependent Claim
108 words
The deposition system according to claim 1 further including means for operating a first of the electrodes for a first period of time and for subsequently operating the second electrode for a second period of time and including a mask positioNing means which positions the mask between the first electrode and the path during the initial portion of the first period, then positions the mask between the second electrode and the path during the terminal portion of the first period and during the initial portion of the second period, then positions the mask between the first electrode and the path during the terminal portion of the second period.
Claim 7
Dependent Claim
29 words
The deposition system according to claim 1 further including means for causing each electrode to sputter first onto the mask and then onto workpieces carried by the transporting means.
Claim 8
Dependent Claim
24 words
The deposition system according to claim 1 wherein the deposition chamber comprises housing means formed from a material having high thermal and electrical conductivity.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-05-23 | 1975-11-22 | 1976-05-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-05-23 | 1979-11-22 | 1980-05-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-05-23 | 1983-11-22 | 1984-05-23 | $7700.00 | Window Closed / Lapsed |