Moated substrate holding pedestal
Abstract
Abstract In an RF sputtering system, an electrode has pedestals for holding silicon wafers upon which the sputtered material is to be deposited. The pedestals are formed in a large conductive block with heating, cooling and temperature monitoring means, thereby to control the temperature of the wafers during the sputtering process. The disclosed improvement comprises an annular moat near the extremity of the wafer-mounting surface of the pedestal, which traps material, such as vacuum grease or gallium, used to thermally secure the wafer to the pedestal, which tends to erupt or spatter during the vacuum deposition process; the trapping of the material prevents its lodging on the surfaces of wafers when being processed.
Inventors
- 👤 H Glick
- 👤 D Grantham
Bibliographic Details
Claims Analysis
Total Claims: 0References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-10-08 | 1977-04-09 | 1977-10-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-10-08 | 1981-04-09 | 1981-10-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-10-08 | 1985-04-09 | 1985-10-09 | $7700.00 | Window Closed / Lapsed |