US3940211A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Step-and-repeat projection alignment and exposure system
Assignee: Kasper Instruments Inc
•
Filing: 1973-09-12
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Granted: 1976-02-24
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Expires: 1993-09-12
Abstract
Abstract A wafer-bearing chuck, an annular reference plate, a copy lens system, and a mask-bearing holder are mounted on a floating unit so that the copy lens system produces an image of a pattern-bearing surface of the mask at a plane positioned between the annular reference plate and the wafer chuck and produces an image of a selected pattern-bearing region of a photosensitive-film-bearing surface of the wafer at the pattern-bearing surface of the mask. The wafer chuck is movably mounted for positioning the photosensitive-film-bearing surface of the wafer in abutment with the annular reference plate in a plane parallel to the image plane of the pattern-bearing surface of the mask and for subsequently positioning the selected pattern-bearing surface region of the wafer in the image plane of the pattern-bearing surface of the mask. A stop mechanism may be employed to automatically stop the wafer chuck when the selected pattern-bearing surface region of the wafer is substantially positioned in the image plane of the pattern-bearing surface of the mask. Alternatively, the wafer chuck may be manually adjusted, while viewing the pattern-bearing surface of the mask and the image of the selected pattern-bearing surface region of the wafer through a microscope of an optical unit, to precisely position the selected pattern-bearing surface region of the wafer in the image plane of the pattern-bearing surface of the mask. The mask holder is movably mounted for thereafter aligning the pattern of the mask with the image of pattern of the selected surface region of the wafer while they are viewed through the microscope. The floating unit is floatingly supported within a base unit on three balls and coupled to the base unit by a parallelogram linkage so that the floating unit may be scanned relative to the microscope without rotating relative to the base unit to facilitate and verify alignment of all portions of the pattern of the mask with the image of the pattern of the selected surface region of the wafer. A vacuum clamping mechanism may be employed to clamp the floating unit in any position to which it may be scanned, whereupon the mask holder may be moved to further align the pattern of the mask with the image of the pattern of the selected surface region of the wafer. Upon completion of the pattern alignment operation, the floating unit is unclamped and a centering mechanism employed to automatically return the floating unit to a central position at which an exposure lens system of the optical unit may be employed for exposing the photosensitive film on the selected surface region of the wafer in accordance with the pattern of the mask. A loading arm is mounted on a movable stage secured to the floating unit and is rotated in a plane orthogonally intersecting the first optical axis to move the wafer between a loading station and the wafer chuck. The movable stage is stepped to a plurality of different positions arranged in orthogonal rows and columns so that the loading arm may be employed to move the wafer to a corresponding plurality of different positions on the wafer chuck. This permits a corresponding plurality of different regions of the photosensitive-film-bearing surface of the wafer to be aligned and exposed in accordance with the pattern of the mask.
Inventors
- 👤 Karl-Heinz Johannsmeier
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 16:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03B; G03B27/00; G03B27/32; G03B27/42
Claims Analysis
Total Claims: 69
Claim 1
Independent Claim
246 words
A projection alignment and exposure system comprising: a base unit; a floating unit floatingly supported on the base unit; a wafer chuck, a reference member, a projection lens system, and a mask holder mounted on the floating unit so that the projection lens system is operable for producing an image of a selected region of a photosensitive-film-bearing surface of a wafer supported on the wafer chuck at a pattern-bearing surface of a mask supported on the mask holder and for producing an image of the pattern-bearing surface of the mask in an image plane positioned between the reference member and the wafer chuck and oriented parallel to a reference surface of the reference member; said wafer chuck being movably mounted for positioning the photosensitive-film-bearing surface of the wafer in abutment with the reference surface of the reference member and for thereafter positioning the selected region of the photosensitive-film-bearing surface of the wafer at the image plane of the pattern-bearing surface of the mask; said mask holder being movable mounted for aligning the patternbearing surface of the mask with the selected region of the photosensitive-film-bearing surface of the wafer; and an optical unit mounted on the base unit above the mask holder for providing a magnified view of the pattern-bearing surface of the mask and the image of the selected region of the photosensitive-film-bearing surface of the wafer while they are being aligned and for thereafter exposing the selected region of the photosensitive-film-bearing surface of the wafer.
Claim 2
Dependent Claim
246 words
A projection alignment and exposure system comprising: a base unit; a floating unit floatingly supported on the base unit; a wafer chuck, a reference member, a projection lens system, and a mask holder mounted on the floating unit so that the projection lens system is operable for producing an image of a selected region of a photosensitive-film-bearing surface of a wafer supported on the wafer chuck at a pattern-bearing surface of a mask supported on the mask holder and for producing an image of the pattern-bearing surface of the mask in an image plane positioned between the reference member and the wafer chuck and oriented parallel to a reference surface of the reference member; said wafer chuck being movably mounted for positioning the photosensitive-film-bearing surface of the wafer in abutment with the reference surface of the reference member and for thereafter positioning the selected region of the photosensitive-film-bearing surface of the wafer at the image plane of the pattern-bearing surface of the mask; said mask holder being movable mounted for aligning the patternbearing surface of the mask with the selected region of the photosensitive-film-bearing surface of the wafer; and an optical unit mounted on the base unit above the mask holder for providing a magnified view of the pattern-bearing surface of the mask and the image of the selected region of the photosensitive-film-bearing surface of the wafer while they are being aligned and for thereafter exposing the selected region of the photosensitive-film-bearing surface of the wafer.
Claim 3
Dependent Claim
25 words
A projection alignment and exposure system as in claim 1 including means for stepping the wafer relative to the mask holder and the optical unit.
Claim 4
Dependent Claim
54 words
A projection alignment and exposure system as in claim 1 wherein: said wafer chuck, reference member, and projection lens system are mounted along a horizontal optical axis; and said mask holder is mounted along a vertical optical axis orthogonally intersecting the horizontal optical axis at an inclined mirror also mounted on the floating unit.
Claim 5
Dependent Claim
33 words
A projection alignment and exposure system as in claim 1 wherein said floating unit is floatingly supported on the base unit by three balls mounted at three spaced positions on the base unit.
Claim 6
Dependent Claim
37 words
A projection alignment and exposure system as in claim 4 including control means coupled to the base unit and to the floating unit for scanning the floating unit relative to the base unit and the optical unit.
Claim 7
Dependent Claim
53 words
A projection alignment and exposure system as in claim 5 wherein said control means comprises: a control handle; and a shaft pivotally secured toward one end thereof to the base unit, pivotally secured toward the other end thereof to the control handle, and pivotally secured intermediate the ends thereof to the floating unit.
Claim 8
Dependent Claim
55 words
A projection alignment and exposure system as in claim 5 including a parallelogram linkage for coupling the floating unit to the base unit to prevent the floating unit from rotating relative to the base unit and the optical unit while the floating unit is being scanned relative to the base unit and the optical unit.
Claim 9
Dependent Claim
123 words
A projection alignment and exposure system as in claim 7 wherein said parallelogram linkage comprises: a common link; a first pair of shorter links each pivotally secured at one end thereof to one end of the common link; and a second pair of shorter links each pivotally secured at one end thereof to the other end of the common link; one of said first pair of shorter links and one of said second pair of shorter links each being pivotally secured at the other end thereof to the base unit; and the other of said first pair of shorter links and the other of said second pair of shorter links each being pivotally secured at the other end thereof to the floating unit.
Claim 10
Dependent Claim
45 words
A projection alignment and exposure system as in claim 7 including clamping means for clamping the floating unit to the base unit to hold the floating unit in any position to which it may be scanned relative to the base unit and the optical unit.
Claim 11
Dependent Claim
106 words
A projection alignment and exposure system as in claim 9 wherein said clamping means comprises: a spring member fixedly secured to one of the base unit and the floating unit; at least one vacuum clamping member fixedly secured to the spring member and disposed in slidable engagement with the other of the base unit and the floating unit; and means coupled to each vacuum clamping member for connecting it to a source of vacuum to vacuum clamp the floating unit to the base unit and for subsequently disconnecting each vacuum clamping member from the source of vacuum to unclamp the floating unit from the base unit.
Claim 12
Dependent Claim
50 words
A projection alignment and exposure system as in claim 10 wherein: said spring member comprises a leaf spring fixedly secured to the base unit; and a pair of vacuum clamping members is fixedly secured toward opposite ends of the leaf spring and disposed in slidable engagement with the floating unit.
Claim 13
Dependent Claim
58 words
A projection alignment and exposure system as in claim 9 including centering means for automatically moving the floating unit to a central position at which an optical axis passing through the mask supported on the mask holder is aligned with an exposure lens system of the optical unit when the exposure lens system is in its operative position.
Claim 14
Dependent Claim
145 words
A projection alignment and exposure system as in claim 12 wherein said centering means comprises: a plurality of roller members pivotally mounted on one of the base unit and the floating unit and disposed within an aperture in the other of the base unit and the floating unit for movement between a clustered inoperative position out of engagement with said other of the base unit and the floating unit to permit scanning of the floating unit from the central position and an extended operative position in engagement with said other of the base unit and the floating unit to return the floating unit to the central position when the floating unit is not clamped to the base unit by the clamping means; and drive means coupled to the roller members for driving the roller members between their clustered inoperative position and their extended operative position.
Claim 15
Dependent Claim
153 words
A projection alignment and exposure system as in claim 13 wherein said drive means comprises: a plurality of shafts rotatably mounted on the base unit at symmetrically spaced positions adjacent to a circular aperture in the floating unit; a plurality of levers each fixedly secured to an associated different one of said plurality of shafts, said plurality of roller members each being rotatably mounted on an associated different one of the levers for movement between the clustered inoperative position out of engagement with the floating unit and the extended operative position in engagement with the floating unit; a plurality of gears each fixedly secured to an associated different one of said plurality of shafts; and means, including another gear rotatably mounted on the base unit in engagement with said plurality of gears, for rotating said plurality of gears to drive the roller members between their clustered inoperative position and their extended operative position.
Claim 16
Dependent Claim
69 words
A projection alignment and exposure system as in claim 14 wherein: said plurality of roller members comprises three roller bearings; said plurality of shafts comprises three cylindrical shafts; said plurality of levers comprises three levers; said plurality of gears comprises three gears; and said last-mentioned means further includes an outwardly extending portion of one of the levers coupled to a drive mechanism for selectively rotating said plurality of gears.
Claim 17
Dependent Claim
88 words
A projection alignment and exposure system as in claim 1 wherein: said wafer chuck is mounted for translational movement only along an optical axis of the wafer chuck and the reference member; and said mask holder is mounted for translational movement along at least two orthogonal axes lying in a plane orthogonally intersecting an optical axis of the mask holder and the optical unit to permit alignment of the pattern-bearing surface of the mask with the image of the selected region of the photosensitive-film-bearing surface of the wafer.
Claim 18
Dependent Claim
173 words
A projection alignment and exposure system as in claim 16 including: a guide member fixedly mounted on the floating unit and coaxially disposed along the optical axis of the wafer chuck and the reference member; a piston member coaxially and slidably supported by the guide member for translational movement only along the optical axis of the wafer chuck and the reference member, said wafer chuck being mounted on the piston member for pivotal movement about the optical axis of the wafer chuck and the reference member; clamping means coupled to the wafer chuck for clamping the wafer chuck to the piston member in whatever position the wafer chuck may be pivoted to by abutment of the photosensitivefilm-bearing surface of the wafer with the reference surface of the reference member; and drive means coupled to the piston member for driving the wafer chuck along the optical axis of the wafer chuck and the reference member between the image plane of the pattern-bearing surface of the mask and the reference surface of the reference member.
Claim 19
Dependent Claim
45 words
A projection alignment and exposure system as in claim 17 including micrometer adjustment means mounted in the guide member and disposed for abutment with the piston member to stop the translational movement of the wafer chuck away from the reference member at a selected position.
Claim 20
Dependent Claim
69 words
A projection alignment and exposure system as in claim 18 wherein said piston member is spring biased against the micrometer adjustment means when they are brought into abutment so that the micrometer adjustment means may be employed to precisely adjust the position of the wafer chuck to locate the selected region of the photosensitive-film-bearing surface of the wafer at the image plane of the pattern-bearing surface of the mask.
Claim 21
Dependent Claim
55 words
A projection alignment and exposure system as in claim 19 including stop means for automatically stopping the translational movement of the wafer chuck away from the reference member when the selected region of the photosensitive-filmbearing surface of the wafer is located in the region of the image plane of the pattern-bearing surface of the mask.
Claim 22
Dependent Claim
250 words
A projection alignment and exposure system as in claim 20 wherein said stop means comprises: a first member slidably supported on the floating unit; a second member fixedly secured to the piston member and disposed between a pair of spaced opposite end portions of the first member for abutment upon one end portion of the first member when the wafer chuck is moved to a first position at which the photosensitive-film-bearing surface of the wafer is brought into abutment with the reference surface of the reference member and for abutment upon the other end portion of the first member when the wafer chuck is moved to a second position spaced away from the reference member; an adjustment screw mounted in said other end portion of the first member for abutment with the adjacent end of the second member to adjust the spacing between the other end of the second member and said one end portion of the first member to equal the spacing between the reference surface of the reference member and the image plane of the pattern-bearing surface of the mask; and clamping means coupled to the first member for clamping the first member to the floating unit when the wafer chuck is moved to the first position so that subsequent translational movement of the wafer chuck away from the reference member is automatically stopped when the selected region of the photosensitive-film-bearing surface of the wafer is positioned in the image plane of the pattern-bearing surface of the mask.
Claim 23
Dependent Claim
46 words
A projection alignment and exposure system as in claim 16 including stepping means for selectively moving the wafer to different positions on the wafer chuck to permit alignment of the pattern-bearing surface of the mask with different selected regions of the photosensitive-film-bearing surface of the wafer.
Claim 24
Dependent Claim
115 words
A projection alignment and exposure system as in claim 22 wherein said stepping means comprises: an X-Y stage mounted on the floating unit adjacent to the wafer chuck, said X-Y stage having a plurality of different detent positions; a wafer loading arm rotatably mounted on the X-Y stage for transferring the wafer between the wafer chuck and a wafer loading station when the X-Y stage is in one of tis detent positions and for moving the wafer to different positions on the wafer chuck when the X-Y stage is moved to different ones of its detent positions; and means coupled to the X-Y stage for selectively moving it to different ones of its detent positions.
Claim 25
Dependent Claim
37 words
A projection alignment and exposure system as in claim 16 including: an X-Y stage mounted on the floating unit; and a rotational stage mounted on the X-Y stage, said mask holder being mounted on the rotational stage.
Claim 26
Dependent Claim
61 words
A projection alignment and exposure system as in claim 22 wherein said projection lens system includes an alignment lens pivotally mounted at one end of the projection lens system for movement between an operative position to adjust the projection lens system for use with illuminating light and an inoperative position to adjust the projection lens system for use with exposure light.
Claim 27
Dependent Claim
113 words
A projection alignment and exposure system as in claim 25 wherein said optical unit includes: an ocular lens system fixedly mounted on the optical unit; a plurality of objective lens systems rotatably mounted on the optical unit at different positions, each of said objective lens systems being aligned with the ocular lens system when rotated to an operative position; a source of illumination light for the objective lens systems; an exposure lens system rotatably mounted on the optical unit at a still different position; and a source of exposure light for the exposure lens system; said exposure lens system being aligned with the source of exposure light when rotated to the operative position.
Claim 28
Dependent Claim
29 words
A projection alignment and exposure system as in claim 22 wherein said projection lens system may comprise any one of a 10:1, 4:1, 2:1, and 1:1 copy lens system.
Claim 29
Dependent Claim
44 words
A projection alignment and exposure system as in claim 3 including: means for adjustably positioning the inclined mirror at forty-five degrees relative to both the horizontal and vertical optical axes; and means for holding the inclined mirror in place once it is so positioned.
Claim 30
Dependent Claim
40 words
A projection alignment and exposure system as in claim 26 including means coupled to the source of illumination light for transmitting it in a plurality of spaced beams to the photosensitive-film-bearing surface of the wafer supported on the wafer chuck.
Claim 31
Dependent Claim
269 words
Alignment and exposure apparatus comprising: a housing; a workpiece chuck, a reference member, a projection lens system, and a mask holder mounted on the housing so that the projection lens system is operable for producing an image of a selected region of a photosensitive-filmbearing surface of a workpiece supported on the workpiece chuck at a pattern-bearing surface of a mask supported on the mask holder and for producing an image of the pattern-bearing surface of the mask in an image plane positioned between the reference member and the workpiece chuck and oriented parallel to a reference surface of the reference member; said workpiece chuck being mounted for translational movement only along an optical axis of the wafer chuck and the reference member to position the photosensitive-film-bearing surface of the workpiece in abutment with the reference surface of the reference member and for thereafter positioning the selected region of the photosensitive-film-bearing surface of the workpiece at the image plane of the pattern-bearing surface of the mask; said mask holder being movably mounted for translational movement along at least two orthogonal axes lying in a plane orthogonally intersecting an optical axis of the mask holder to align the pattern-bearing surface of the mask with the selected region of the photosensitive-film-bearing surface of the workpiece; and an optical unit mounted on the housing above the mask holder for providing a magnified view of the pattern-bearing surface of the mask and the image of the selected region of the photosensitive-film-bearing surface of the workpiece while they are being aligned and for thereafter exposing the selected region of the photosensitive-film-bearing surface of the workpiece.
Claim 32
Dependent Claim
269 words
Alignment and exposure apparatus comprising: a housing; a workpiece chuck, a reference member, a projection lens system, and a mask holder mounted on the housing so that the projection lens system is operable for producing an image of a selected region of a photosensitive-filmbearing surface of a workpiece supported on the workpiece chuck at a pattern-bearing surface of a mask supported on the mask holder and for producing an image of the pattern-bearing surface of the mask in an image plane positioned between the reference member and the workpiece chuck and oriented parallel to a reference surface of the reference member; said workpiece chuck being mounted for translational movement only along an optical axis of the wafer chuck and the reference member to position the photosensitive-film-bearing surface of the workpiece in abutment with the reference surface of the reference member and for thereafter positioning the selected region of the photosensitive-film-bearing surface of the workpiece at the image plane of the pattern-bearing surface of the mask; said mask holder being movably mounted for translational movement along at least two orthogonal axes lying in a plane orthogonally intersecting an optical axis of the mask holder to align the pattern-bearing surface of the mask with the selected region of the photosensitive-film-bearing surface of the workpiece; and an optical unit mounted on the housing above the mask holder for providing a magnified view of the pattern-bearing surface of the mask and the image of the selected region of the photosensitive-film-bearing surface of the workpiece while they are being aligned and for thereafter exposing the selected region of the photosensitive-film-bearing surface of the workpiece.
Claim 33
Dependent Claim
37 words
A projection alignment and exposure system as in claim 1 including control means coupled to the base unit and to the floating unit for scanning the floating unit relative to the base unit and the optical unit.
Claim 34
Dependent Claim
55 words
A projection alignment and exposure system as in claim 31 including a parallelogram linkage for coupling the floating unit to the base unit to prevent the floating unit from rotating relative to the base unit and the optical unit while the floating unit is being scanned relative to the base unit and the optical unit.
Claim 35
Dependent Claim
123 words
A projection alignment and exposure system as in claim 32 wherein said parallelogram linkage comprises: a common link; a first pair of shorter links each pivotally secured at one end thereof to one end of the common link; and a second pair of shorter links each pivotally secured at one end thereof to the other end of the common link; one of said first pair of shorter links and one of said second pair of shorter links each being pivotally secured at the other end thereof to the base unit; and the other of said first pair of shorter links and the other of said second pair of shorter links each being pivotally secured at the other end thereof to the floating unit.
Claim 36
Dependent Claim
45 words
A projection alignment and exposure system as in claim 31 including clamping means for clamping the floating unit to the base unit to hold the floating unit in any position to which it may be scanned relative to the base unit and the optical unit.
Claim 37
Dependent Claim
106 words
A projection alignment and exposure system as in claim 34 wherein said clamping means comprises: a spring member fixedly secured to one of the base unit and the floating unit; at least one vacuum clamping member fixedly secured to the spring member and disposed in slidable engagement with the other of the base unit and the floating unit; and means coupled to each vacuum clamping member for connecting it to a source of vacuum to vacuum clamp the floating unit to the base unit and for subsequently disconnecting each vacuum clamping member from the source of vacuum to unclamp the floating unit from the base unit.
Claim 38
Dependent Claim
58 words
A projection alignment and exposure system as in claim 31 including centering means for automatically moving the floating unit to a central position at which an optical axis passing through the mask supported on the mask holder is aligned with an exposure lens system of the optical unit when the exposure lens system is in its operative position.
Claim 39
Dependent Claim
130 words
A projection alignment and exposure system as in claim 36 wherein said centering means comprises: a plurality of roller members pivotally mounted on one of the base unit and the floating unit and disposed within an aperture in the other of the base unit and the floating unit for movement between a clustered inoperative position out of engagement with said other of the base unit and the floating unit to permit scanning of the floating unit from the central position and an extended operative position in engagement with said other of the base unit and the floating unit to return the floating unit to the central position; and drive means coupled to the roller members for driving the roller members between their clustered inoperative position and their extended operative position.
Claim 40
Dependent Claim
171 words
A projection alignment and exposure system as in claim 1 including: a guide member fixedly mounted on the floating unit and coaxially disposed along the optical axis of the wafer chuck and the reference member; a piston member coaxially and slidably supported by the guide member for translational movement along the optical axis of the wafer chuck and the reference member, said wafer chuck being mounted on the piston member for pivotal movement about the optical axis of the wafer chuck and the reference member; clamping means coupled to the wafer chuck for clamping the wafer chuck to the piston member in whatever position the wafer chuck may be pivoted to by abutment of the photosensitive-film-bearing surface of the wafer with reference surface of the reference member; and drive means coupled to the piston member for driving the wafer chuck along the optical axis of the wafer chuck and the reference member between the image plane of the pattern-bearing surface of the mask and the reference surface of the reference member.
Claim 41
Dependent Claim
45 words
A projection alignment and exposure system as in claim 38 including micrometer adjustment means mounted in the guide member and disposed for abutment with the piston member to stop the translational movement of the wafer chuck away from the reference member at a selected position.
Claim 42
Dependent Claim
69 words
A projection alignment and exposure system as in claim 39 wherein said piston member is spring biased against the micrometer adjustment means when they are brought into abutment so that the micrometer adjustment means may be employed to precisely adjust the position of the wafer chuck to locate the selected region of the photosensitive-film-bearing surface of the wafer at the image plane of the pattern-bearing surface of the mask.
Claim 43
Dependent Claim
55 words
A projection alignment and exposure system as in claim 38 including stop means for automatically stopping the translational movement of the wafer chuck away from the reference member when the selected region of the photosensitive-film-bearing surface of the wafer is located in the region of the image plane of the pattern-bearing surface of the mask.
Claim 44
Dependent Claim
250 words
A projection alignment and exposure system as in claim 41 wherein said stop means comprises: a first member slidably supported on the floating unit; a second member fixedly secured to the piston member and disposed between a pair of spaced opposite end portions of the first member for abutment upon one end portion of the first member when the wafer chuck is moved to a first position at which the photosensitive-film-bearing surface of the wafer is brought into abutment with the reference surface of the reference member and for abutment upon the other end portion of the first member when the wafer chuck is moved to a second position spaced away from the reference member; an adjustment screw mounted in said other end portion of the first member for abutment with the adjacent end of the second member to adjust the spacing between the other end of the second member and said one end portion of the first member to equal the spacing between the reference surface of the reference member and the image plane of the pattern-bearing surface of the mask; and clamping means coupled to the first member for clamping the first member to the floating unit when the wafer chuck is moved to the first position so that subsequent translational movement of the wafer chuck away from the reference member is automatically stopped when the selected region of the photosensitive-film-bearing surface of the wafer is positioned in the image plane of the pattern-bearing surface of the mask.
Claim 45
Dependent Claim
46 words
A projection alignment and exposure system as in claim 1 including stepping means for selectively moving the wafer to different positions on the wafer chuck to permit alignment of the patternbearing surface of the mask with different selected regions of the photosensitive-film-bearing surface of the wafer.
Claim 46
Dependent Claim
115 words
A projection alignment and exposure system as in claim 43 wherein said stepping means comprises: an X-Y stage mounted on the floating unit adjacent to the wafer chuck, said X-Y stage having a plurality of different detent positions; a wafer loading arm rotatably mounted on the X-Y stage for transferring the wafer between the wafer chuck and a wafer loading station when the X-Y stage is in one of its detent positions and for moving the wafer to different positions on the wafer chuck when the X-Y stage is moved to different ones of its detent positions; and means coupled to the X-Y stage for selectively moving it to different ones of its detent positions.
Claim 47
Dependent Claim
61 words
A projection alignment and exposure system as in claim 1 wherein said projection lens system includes an alignment lens pivotally mounted at one end of the projection lens system for movement between an operative position to adjust the projection lens system for use with illuminating light and an inoperative position to adjust the projection lens system for use with exposure light.
Claim 48
Dependent Claim
114 words
A projection alignment and exposure system as in claim 45 wherein said optical unit includes: an ocular lens system fixedly mounted on the optical unit; a plurality of objective lens systems rotatably mounted on the optical unit at different positions, each of said objective lens systems being aligned with the ocular lens system when rotated to an operative position; a source of illumination light for the objective lens systems; an exposure lens system rotatably mounted on the optical unit at a still different position; and a source of exposure light for the exposure lens system; said exposure lens system being aligned with the source of exposure light when the rotated to the operative position.
Claim 49
Dependent Claim
40 words
A projection alignment and exposure system as in claim 46 including means coupled to the source of illumination light for transmitting it in a plurality of spaced beams to the photosensitive-film-bearing surface of the wafer supported on the wafer chuck.
Claim 50
Dependent Claim
29 words
A projection alignment and exposure system as in claim 1 wherein said projection lens system may comprise any one of a 10:1, 4:1, 2:1, and 1:1 copy lens system.
Claim 51
Dependent Claim
25 words
A projection alignment and exposure system as in claim 30 including means for stepping the wafer relative to the mask holder and the optical unit.
Claim 52
Dependent Claim
53 words
A projection alignment and exposure system as in claim 30 wherein: said workpiece chuck, reference member, and projection lens system are mounted along a horizontal optical axis; and said mask holder is mounted along a vertical optical axis orthogonally intersecting the horizontal optical axis at an inclined mirror also mounted on the housing.
Claim 53
Dependent Claim
44 words
A projection alignment and exposure system as in claim 50 including: means for adjustably positioning the inclined mirror at fortyfive degrees relative to both the horizontal and vertical optical axes: and means for holding the inclined mirror in place once it is so positioned.
Claim 54
Dependent Claim
172 words
A projection alignment and exposure system as in claim 30 including: a guide member fixedly mounted on the housing and coaxially disposed along the optical axis of the workpiece chuck and the reference member; a piston member coaxially and slidably supported by the guide member for translational movement only along the optical axis of the workpiece chuck and the reference member, said workpiece chuck being mounted on the piston member for pivotal movement about the optical axis of the workpiece chuck aand the reference member; clamping means coupled to the workpiece chuck for clamping the workpiece chuck to the piston member in whatever position the workpiece chuck may be pivoted to by abutment of the photosensitive-film-bearing surface of the workpiece with the reference surface of the reference member; and drive means coupled to the piston member for driving the workpiece chuck along the optical axis of the workpiece chuck and the reference member between the image plane of the pattern-bearing surface of the mask and the reference surface of the reference member.
Claim 55
Dependent Claim
45 words
A projection alignment and exposure system as in claim 52 including micrometer adjustment means mounted in the guide member and disposed for abutment with the piston member to stop the translational movement of the workpiece chuck away from the reference member at a selected position.
Claim 56
Dependent Claim
69 words
A projection alignment and exposure system as in claim 53 wherein said piston member is spring biased against the micrometer adjustment means when they are brought into abutment so that the micrometer adjustment means may be employed to precisely adjust the position of the workpiece chuck to locate the selected region of the photosensitive-film-bearing surface of the workpiece at the image plane of the pattern-bearing surface of the mask.
Claim 57
Dependent Claim
55 words
A projection alignment and exposure system as in claim 52 including stop means for automatically stopping the translational movement of the workpiece chuck away from the reference member when the selected region of the photosensitive-film-bearing surface of the workpiece is located in the region of the image plane of the patternbearing surface of the mask.
Claim 58
Dependent Claim
248 words
A projection alignment and exposure system as in claim 55 wherein said stop means comprises: a first member slidably supported on the housing; a second member fixedly secured to the piston member and disposed between a pair of spaced opposite end portions of the first member for abutment upon one end portion of the first member when the workpiece chuck is moved to a first position at which the photosensitive-film-bearing surface of the workpiece is brought into abutment with the reference surface of the reference member and for abutment upon the other end portion of the first member when the workpiece chuck is moved to a second position spaced away from the reference member; an adjustment screw mounted in said other end portion of the first member for abutment with the adjacent end of the second member to adjust the spacing between the other end of the second member and said one end portion of the first member to equal the spacing between the reference surface of the reference member and the image plane of the pattern-bearing surface of the mask; and clamping means coupled to the first member for clamping the first member to the housing when the workpiece chuck is moved to the first position so that subsequent translational movement of the workpiece chuck away from the reference member is automatically stopped when the selected region of the photosensitive-film-bearing surface of the workpiece is positioned in the image plane of the pattern-bearing surface of the mask.
Claim 59
Dependent Claim
46 words
A projection alignment and exposure system as in claim 30 including stepping means for selectively moving the workpiece to different positions on the workpiece chuck to permit alignment of the pattern-bearing surface of the mask with different selected regions of the photosensitive-film-bearing surface of the workpiece.
Claim 60
Dependent Claim
114 words
A projection alignment and exposure system as in claim 57 wherein said stepping means comprises: an X-Y stage mounted on the housing adjacent to the workpiece chuck, said X-Y stage having a plurality of different detent positions; a workpiece loading arm rotatably mounted on the X-Y stage for transferring the workpiece between the workpiece chuck and a workpiece loading station when the X-Y stage is in one of its detent positions and for moving the workpiece to different positions on the workpiece chuck when the X-Y stage is moved to different ones of its detent positions; and means coupled to the X-Y stage for selectively moving it to different ones of its detent positions.
Claim 61
Dependent Claim
36 words
A projection alignment and exposure system as in claim 30 including: an X-Y stage mounted on the housing; and a rotational stage mounted on the X-Y stage, said mask holder being mounted on the rotational stage.
Claim 62
Dependent Claim
61 words
A projection alignment and exposure system as in claim 30 wherein said projection lens system includes an alignment lens pivotally mounted at one end of the projection lens system for movement between an operative position to adjust the projection lens system for use with illuminating light and an inoperative position to adjust the projection lens system for use with exposure light.
Claim 63
Dependent Claim
113 words
A projection alignment and exposure system as in claim 60 wherein said optical unit includes: an ocular lens system fixedly mounted on the optical unit; a plurality of objective lens systems rotatably mounted on the optical unit at different positions, each of said objective lens systems being aligned with the ocular lens system when rotated to an operative position; a source of illumination light for the objective lens systems; an exposure lens system rotatably mounted on the optical unit at a still different position; and a source of exposure light for the exposure lens system; said exposure lens system being aligned with the source of exposure light when rotated to the operative position.
Claim 64
Dependent Claim
40 words
A projection alignment and exposure system as in claim 61 including means coupled to the source of illumination light for transmitting it in a plurality of spaced beams to the photosensitivefilm-bearing surface of the workpiece supported on the workpiece chuck.
Claim 65
Dependent Claim
29 words
A projection alignment and exposure system as in claim 30 wherein said projection lens system may comprise any one of a 10:1, 4:1, 2:1, and 1:1 copy lens system.
Claim 66
Dependent Claim
250 words
A projection alignment and exposure system comprising: a base unit; a floating unit floatingly supported on the base unit; a wafer chuck, an annular reference plate, a copy lens system, and a mask holder mounted on the floating unit so that the copy lens system is operable for producing an image of a selected region of a photosensitive-film-bearing surface of a wafer supported on the wafer chuck at a pattern-bearing surface of a mask supported on the mask holder and for producing an image of the pattern-bearing surface of the mask in an image plane positioned between the annular reference plate and the wafer chuck and oriented parallel to a reference surface of the annular reference plate; said wafer chuck being movably mounted for positioning the photosensitive-film-bearing surface of the wafer in abutment with the reference surface of the annular reference plate and for thereafter positioning the selected region of the photosensitive-filmbearing surface of the wafer at the image plane of the patternbearing surface of the mask; said mask holder being movably mounted for aligning the patternbearing surface of the mask with the selected region of the photosensitive-film-bearing surface of the wafer; and an optical unit mounted on the base unit above the mask holder for providing a magnified view of the pattern-bearing surface of the mask and the image of the selected region of the photosensitive-film-bearing surface of the wafer while they are being aligned and for thereafter exposing the selected region of the photosensitive-film-bearing surface of the wafer.
Claim 67
Dependent Claim
250 words
A projection alignment and exposure system comprising: a base unit; a floating unit floatingly supported on the base unit; a wafer chuck, an annular reference plate, a copy lens system, and a mask holder mounted on the floating unit so that the copy lens system is operable for producing an image of a selected region of a photosensitive-film-bearing surface of a wafer supported on the wafer chuck at a pattern-bearing surface of a mask supported on the mask holder and for producing an image of the pattern-bearing surface of the mask in an image plane positioned between the annular reference plate and the wafer chuck and oriented parallel to a reference surface of the annular reference plate; said wafer chuck being movably mounted for positioning the photosensitive-film-bearing surface of the wafer in abutment with the reference surface of the annular reference plate and for thereafter positioning the selected region of the photosensitive-filmbearing surface of the wafer at the image plane of the patternbearing surface of the mask; said mask holder being movably mounted for aligning the patternbearing surface of the mask with the selected region of the photosensitive-film-bearing surface of the wafer; and an optical unit mounted on the base unit above the mask holder for providing a magnified view of the pattern-bearing surface of the mask and the image of the selected region of the photosensitive-film-bearing surface of the wafer while they are being aligned and for thereafter exposing the selected region of the photosensitive-film-bearing surface of the wafer.
Claim 68
Dependent Claim
25 words
A projection alignment and exposure system as in claim 64 including means for stepping the wafer relative to the mask holder and the optical unit.
Claim 69
Dependent Claim
55 words
A projection alignment and exposure system as in claim 64 wherein: said wafer chuck, annular reference plate, and copy lens system are mounted along a horizontal optical axis; and said mask holder is mounted along a vertical optical axis orthogonally intersecting the horizontal optical axis at an inclined mirror also mounted on the floating unit.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-02-23 | 1979-08-25 | 1980-02-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-02-23 | 1983-08-25 | 1984-02-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-02-23 | 1987-08-25 | 1988-02-24 | $7700.00 | Window Closed / Lapsed |