Phototropic compounds as acid catalyst in photopolymerizing process

Claim 2

A process of photopolymerizing a material polymerizable to higher molecular weights by cationic polymerization, comprising: forming a mixture of (1) a monomeric or prepolymeric epoxide material, selected from the group consisting of glycidyl ethers of bisphenol A, epoxy-cycloalkanes, epoxy-cycloalkenes, epoxy-alkanes, glycidyl alkyl ethers, epoxy-novolacs and allyl glycidyl ether-glycidyl methacrylate copolymer with (2) a phototropic aromatic compound containing at least one nitro radical in a position ortho to an alkyl substituent selected from compounds having the formula: ##STR7## wherein R 1 and R 2 are selected from the group consisting of hydrogen, alkyl, aryl, carbalkoxy, pyridyl, carbazolyl, N-oxidopyridyl, nitroalkyl, nitroaryl, dinitrophenyl, alkaryl, aralkyl, haloalkyl and haloaryl radicals and R 3 is selected from the group consisting of hydrogen, alkyl, aryl, nitroalkyl, nitroaryl, alkaryl, aralkyl, haloalkyl, haloaryl radicals and electron-withdrawing groups selected from --NO 2 , --CN, --COOR, --COR, --NR 3 , --Br, --Cl, --F, --I, --RCOX, --RX 3 , --NO, RCO-- and R 2 NCO-- wherein X is halogen and R is alkyl; and subsequently exposing the resulting mixture to sufficient actinic or electron beam radiation to activate said phototropic compound to an acid form effective to initiate polymerization of said epoxide material.

Claim 3

The process of claim 1 wherein the epoxide material is allyl glycidyl ether-glycidyl methacrylate copolymer.

Claim 4

The process of claim 1 wherein the epoxide material is an epoxy cresol novolac.

Claim 5

The process of claim 2 wherein said phototropic compound is ethyl bis(2,4-dinitrophenyl) acetate, 2,4-dinitrotoluene, tris(2,4-dinitrophenyl) methane or 2-(2',4'-dinitrobenzyl-pyridine.

Claim 6

The process of claim 3 wherein said phototropic compound is ethyl bis(2,4-dinitrophenyl) acetate, 2,4-dinitrotoluene, tris(2,4-dinitrophenyl) methane or 2-(2',4' -dinitrobenzyl)-pyridine.

Claim 7

A process of photopolymerizing a material polymerizable to higher molecular weight by cationic polymerization which comprises: forming a mixture of (1) a monomeric or prepolymeric epoxide material selected from the group consisting of glycidyl ethers of bisphenol A, epoxy-cycloalkanes, epoxy-cycloalkenes, epoxy-alkanes, glycidyl alkyl ethers, epoxy-novolacs and allyl glycidyl ether-glycidyl methacrylate copolymer with (2) a phototropic aromatic compound containing at least one nitro radical in a position ortho to an alkyl substituent selected from compounds having the formula: ##STR8## wherein R 1 and R 2 are selected from the group consisting of hydrogen, alkyl, aryl, carbalkoxy, pyridyl, carbazolyl, N-oxidopyridyl, nitroalkyl, nitroaryl, dinitrophenyl, alkaryl, aralkyl haloalkyl and haloaryl radicals and R 3 is selected from the group consisting of hydrogen, alkyl, aryl, nitroalkyl, nitroaryl, alkaryl, aralkyl, haloalkyl, haloaryl radicals and electron-withdrawing groups selected from --NO 2 , --CN, --COOR, --COR, --NR 3 , --Br, --Cl, --F, --I, --RCOX, --RX 3 , --NO, RCO-- and R 2 NCO-- wherein X is halogen and R is alkyl; applying said mixture to a substrate; exposing said substrate imagewise to actinic or electron beam radiation to effect polymerization of said epoxide in exposed areas of the substrate, and thereafter applying a solvent for removal of unpolymerized portions of said mixture.

Claim 8

A process of photopolymerizing a material polymerizable to higher molecular weight by cationic polymerization which comprises: forming a mixture of (1) a monomeric or prepolymeric epoxide material selected from the group consisting of glycidyl ethers of bisphenol A, epoxy-cycloalkanes, epoxy-cycloalkenes, epoxy-alkanes, glycidyl alkyl ethers, epoxy-novolacs and allyl glycidyl ether-glycidyl methacrylate copolymer with (2) a phototropic aromatic compound containing at least one nitro radical in a position ortho to an alkyl substituent selected from compounds having the formula: ##STR8## wherein R 1 and R 2 are selected from the group consisting of hydrogen, alkyl, aryl, carbalkoxy, pyridyl, carbazolyl, N-oxidopyridyl, nitroalkyl, nitroaryl, dinitrophenyl, alkaryl, aralkyl haloalkyl and haloaryl radicals and R 3 is selected from the group consisting of hydrogen, alkyl, aryl, nitroalkyl, nitroaryl, alkaryl, aralkyl, haloalkyl, haloaryl radicals and electron-withdrawing groups selected from --NO 2 , --CN, --COOR, --COR, --NR 3 , --Br, --Cl, --F, --I, --RCOX, --RX 3 , --NO, RCO-- and R 2 NCO-- wherein X is halogen and R is alkyl; applying said mixture to a substrate; exposing said substrate imagewise to actinic or electron beam radiation to effect polymerization of said epoxide in exposed areas of the substrate, and thereafter applying a solvent for removal of unpolymerized portions of said mixture.

Claim 9

The process of claim 6 wherein the mixture is subjected to heat after exposure to said radiation.

Claim 10

The process of claim 6 wherein R 1 and R 2 are hydrogen and R 3 is a nitro group.

Claim 11

The process of claim 6 wherein R 1 is hydrogen, R 2 is a pyridyl radical and R 3 is a nitro group.

Claim 12

The process of claim 6 wherein R 1 and R 2 are dinitrophenyl and R 3 is a nitro group.

Claim 13

The process of claim 6 wherein R 1 and R 2 are dinitrophenyl and R 3 is a carbethoxy radical.

Claim 14

The process of claim 6 wherein the mixture contains from about 1% to about 70% by weight of the phototropic compound.