US4015986A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of developing and stripping positive photoresist
Assignee: International Business Machines Corp
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Filing: 1975-08-22
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Granted: 1977-04-05
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Expires: 1995-08-22
Abstract
Abstract Baked novolak resin based positive photoresists are either developed after exposure or stripped, following the use of the pattern resist layer as an etch mask, in aqueous solutions of a combination of permanganate and phosphoric acid.
Inventors
- 👤 Gabor Paal
- 👤 Jurgen F. Wustenhagen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:58
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/423
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
117 words
A method of forming a patterned resist mask on a substrate comprising coating a layer of novolak resin based positive photoresist comprising an alkali-soluble phenolformaldehyde novolak resin and a 1,2-diazide naphthoquinone sensitizer, on said substrate, selectively exposing said layer to actinic radiation through a patterned mask, subsequently baking said layer at a temperature between 130° and 210° C, and then developing said layer with an aqueous solution consisting essentially of between about 0.038 and 1.5 percent by weight of a permanganate and between about 2 to 30 percent by weight of phosphoric acid such that only the exposed areas of said layer area completely removed to leave a patterned resist mask of unexposed resist on said substrate.
Claim 2
Independent Claim
117 words
A method of forming a patterned resist mask on a substrate comprising coating a layer of novolak resin based positive photoresist comprising an alkali-soluble phenolformaldehyde novolak resin and a 1,2-diazide naphthoquinone sensitizer, on said substrate, selectively exposing said layer to actinic radiation through a patterned mask, subsequently baking said layer at a temperature between 130° and 210° C, and then developing said layer with an aqueous solution consisting essentially of between about 0.038 and 1.5 percent by weight of a permanganate and between about 2 to 30 percent by weight of phosphoric acid such that only the exposed areas of said layer area completely removed to leave a patterned resist mask of unexposed resist on said substrate.
Claim 3
Dependent Claim
22 words
The process of claim 1 wherein the aqeuous solution contains about 10% by weight phosphoric acid and about 0.15% by weight permanganate.
Claim 4
Dependent Claim
70 words
The process of claim 1 including the additional steps, following the formation of the patterned resist mask, of etching the exposed portion of the substrate through the resist mask and then stripping the resist mask from the substrate with an aqueous solution consisting essentially of between about 0.038 and 1.5 percent by weight of potassium or ammonium permanganate and between about 2 to 30 percent by weight of phosphoric acid.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-04-04 | 1980-10-04 | 1981-04-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-04-04 | 1984-10-04 | 1985-04-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-04-04 | 1988-10-04 | 1989-04-05 | $7700.00 | Window Closed / Lapsed |