US4060447A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for etching of metal
Assignee: Advanced Systems Inc
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Filing: 1976-03-29
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Granted: 1977-11-29
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Expires: 1996-03-29
Abstract
Abstract An improvement in an etching process in which the etched product, the surface of which is covered with a film of aqueous etching liquid containing ions of the material etched, is rinsed with an aqueous liquid and the resulting liquid, now containing said ions in dilute concentration, is passed through an ion exchanger to selectively remove the ions from the rinse liquid which thereupon can be reused or discharged, without ecological damage, from the ion exchanger. The ion exchanger when laden with such ions is regenerated by passage therethrough of at least a portion of an etcher make-up aqueous replenishing solution which contains a zero or low concentration of said ions. The resulting replenishing solution portion, now containing a small concentration of these ions, is passed to the etcher, e.g., to the etcher sump.
Inventors
- 👤 Warren A. Nelson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 21:06
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/08
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
242 words
In an etching process in which A. a material is dissolved as cations from a surface of a body in an etcher by contact with an etching solution, said etching solution containing I. an active etchant and Ii. dissolved cations of such material, B. a stream of aqueous replenishing solution containing a lesser concentration of such cation than said etching solution is passed into said etcher, and some etching solution is removed, C. said body is I. withdrawn from said etcher and Ii. rinsed with a liquid, D. whereby residual etching solution containing cations of said material is washed from said body and diluted by said liquid, E. the resulting diluted liquid containing dissolved cations of said material is passed in contact through cation exchange means which selectively retains cations of said material whereby said cation exchange means becomes laden with cations of said material, F. said cation exchange means is regenerated by I. terminating the flow of said resulting liquid and Ii. then passing a regenerating solution stream through said cation exchange means to remove cations of said material from said cation exchange means, the improvement of: G. regenerating said cation exchange means by I. passing at least a portion of said replenishing solution stream through said cation exchange means Ii. before passing said replenishing solution portion into said etcher, Iii. whereby cations of said material are removed from said cation exchange means and introduced into said replenishing solution stream portion.
Claim 2
Dependent Claim
242 words
In an etching process in which A. a material is dissolved as cations from a surface of a body in an etcher by contact with an etching solution, said etching solution containing I. an active etchant and Ii. dissolved cations of such material, B. a stream of aqueous replenishing solution containing a lesser concentration of such cation than said etching solution is passed into said etcher, and some etching solution is removed, C. said body is I. withdrawn from said etcher and Ii. rinsed with a liquid, D. whereby residual etching solution containing cations of said material is washed from said body and diluted by said liquid, E. the resulting diluted liquid containing dissolved cations of said material is passed in contact through cation exchange means which selectively retains cations of said material whereby said cation exchange means becomes laden with cations of said material, F. said cation exchange means is regenerated by I. terminating the flow of said resulting liquid and Ii. then passing a regenerating solution stream through said cation exchange means to remove cations of said material from said cation exchange means, the improvement of: G. regenerating said cation exchange means by I. passing at least a portion of said replenishing solution stream through said cation exchange means Ii. before passing said replenishing solution portion into said etcher, Iii. whereby cations of said material are removed from said cation exchange means and introduced into said replenishing solution stream portion.
Claim 3
Dependent Claim
11 words
The method of claim 1, in which said material is copper.
Claim 4
Dependent Claim
21 words
The method of claim 1, in which all of said aqueous replenishing solution stream is passed through said cation exchange means.
Claim 5
Dependent Claim
11 words
The method of claim 1, in which the liquid is water.
Claim 6
Dependent Claim
16 words
The method of claim 1, in which the cation exchange means contains a cation exchange resin.
Claim 7
Dependent Claim
51 words
The method of claim 6, in which the cation exchange resin is a strongly acidic cation exchange resin selected from the group consisting of a polystyrene matrix with a nuclear sulfonic acid active group, a sulfonated polystyrene cross-linked with divinyl benzene, and a phenolic matrix with a methylene sulfonic active group.
Claim 8
Dependent Claim
233 words
In an ammoniacal alkaline copper etching process in which A. copper metal is dissolved from a surface of a body in an etcher by contact with an aqueous etching solution containing I. ammonium and Ii. complexed cupric cations, B. a portion of the etching solution laden with complexed cupric ions is withdrawn and replaced with a stream of aqueous replenishing solution containing ammonium ions, C. said body is withdrawn from said etcher and rinsed with an aqueous solution, D. whereby residual etching solution containing complexed copper ions is washed from said body and diluted by said aqueous solution, E. the resulting aqueous solution is passed through cation exchange means whereby cupric ions are selectively retained in said cation exchange means and said cation exchange means becomes laden with cupric ions, F. said cation exchange means is regenerated by I. terminating the flow of said resulting aqueous solution and Ii. then passing a regenerating solution through said cation exchange means to remove cupric ions from said cation exchange means, the improvement of: G. regenerating said cation exchange means by I. passing at least a portion of said aqueous replenishing solution stream through said cation exchange means, Ii. before passing said replenishing solution stream portion into said etcher, Iii. whereby cupric ions are removed from said cation exchange means and introduced into said aqueous replenishing solution stream in the form of a cupric ammonium complex.
Claim 9
Dependent Claim
233 words
In an ammoniacal alkaline copper etching process in which A. copper metal is dissolved from a surface of a body in an etcher by contact with an aqueous etching solution containing I. ammonium and Ii. complexed cupric cations, B. a portion of the etching solution laden with complexed cupric ions is withdrawn and replaced with a stream of aqueous replenishing solution containing ammonium ions, C. said body is withdrawn from said etcher and rinsed with an aqueous solution, D. whereby residual etching solution containing complexed copper ions is washed from said body and diluted by said aqueous solution, E. the resulting aqueous solution is passed through cation exchange means whereby cupric ions are selectively retained in said cation exchange means and said cation exchange means becomes laden with cupric ions, F. said cation exchange means is regenerated by I. terminating the flow of said resulting aqueous solution and Ii. then passing a regenerating solution through said cation exchange means to remove cupric ions from said cation exchange means, the improvement of: G. regenerating said cation exchange means by I. passing at least a portion of said aqueous replenishing solution stream through said cation exchange means, Ii. before passing said replenishing solution stream portion into said etcher, Iii. whereby cupric ions are removed from said cation exchange means and introduced into said aqueous replenishing solution stream in the form of a cupric ammonium complex.
Claim 10
Dependent Claim
21 words
The method of claim 7, in which all of the aqueous replenishing solution stream is passed through said cation exchange means.
Claim 11
Dependent Claim
22 words
The method of claim 7, in which the resulting aqueous replenishing solution stream containing complexed cupric ions is passed into the etcher.
Claim 12
Dependent Claim
37 words
The method of claim 7, in which the aqueous replenishing solution stream contains a dissolved ammonium compound having an anion selected from the group consisting of chloride, nitrate, acetate, trichloracetate, sulfate, fluoride and bicarbonate, and mixtures thereof.
Claim 13
Dependent Claim
12 words
The method of claim 7, in which the aqueous solution is water.
Claim 14
Dependent Claim
16 words
The method of claim 7, in which the cation exchange means contains a cation exchange resin.
Claim 15
Dependent Claim
51 words
The method of claim 12, in which the cation exchange resin is a strongly acidic cation exchange resin selected from the group consisting of a polystyrene matrix with a nuclear sulfonic acid active group, a sulfonated polystyrene cross-linked with divinyl benzene, and a phenolic matrix with a methylene sulfonic active group.
Claim 16
Dependent Claim
29 words
The method of claim 7, in which the aqueous etching and replenishing solutions contain a chelating agent selected from the group consisting of triethylenetetraamine, diethylenetriamine, and ethylenediamine tetraacetic acid.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-11-28 | 1981-05-30 | 1981-11-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-11-28 | 1985-05-30 | 1985-11-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-11-28 | 1989-05-30 | 1989-11-29 | $7700.00 | Window Closed / Lapsed |