US4112305A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of projecting a beam of charged particles
Assignee: RIKEN
•
Filing: 1976-10-15
•
Granted: 1978-09-05
•
Expires: 1996-10-15
Abstract
Abstract Disclosed is a method of projecting on selected areas of a target a variety of charged particles each having a different shape of cross-section. The charged particle projecting method according to this invention is suitable for production of micro-circuits.
Inventors
- 👤 Eiichi Goto
- 👤 Takashi Soma
- 👤 Masanori Idesawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 07:32
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/3002; H01J37/3007
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
162 words
A method of projecting a beam of charged particles to a target through two apertured masks which comprises focusing a beam of charged particles on the first of said masks, passing said beam through the aperture of said first mask to establish a beam cross-section corresponding to the contour of said first mask aperture, deflecting said beam, after passing through the first of said masks and before passing through the second of said masks, in a transverse direction and by a given distance with respect to said second aperture, focusing the deflected beam on the second of said masks, passing only a portion of said beam through the aperture of said second mask to modify the cross-section of said beam in accordance with the contour of said second mask aperture and the direction and distance of said deflection to thereby establish by the combined interception action of said masks a predetermined beam cross-section at the incidence of the beam on the target.
Claim 2
Independent Claim
162 words
A method of projecting a beam of charged particles to a target through two apertured masks which comprises focusing a beam of charged particles on the first of said masks, passing said beam through the aperture of said first mask to establish a beam cross-section corresponding to the contour of said first mask aperture, deflecting said beam, after passing through the first of said masks and before passing through the second of said masks, in a transverse direction and by a given distance with respect to said second aperture, focusing the deflected beam on the second of said masks, passing only a portion of said beam through the aperture of said second mask to modify the cross-section of said beam in accordance with the contour of said second mask aperture and the direction and distance of said deflection to thereby establish by the combined interception action of said masks a predetermined beam cross-section at the incidence of the beam on the target.
Claim 3
Dependent Claim
37 words
A method according to claim 1 wherein said masks have apertures each of polygonal contour, and the beam is deflected in a direction generally parallel to one side of the polygonal aperture of one of said masks.
Claim 4
Dependent Claim
17 words
A method according to claim 1 wherein said beam of charged particles is a beam of electrons.
Claim 5
Dependent Claim
17 words
A method according to claim 1 wherein said beam of charged particles is a beam of ions.
Claim 6
Dependent Claim
200 words
In an apparatus for projecting a beam of charged particles to a target through two apertured masks, the improvement which comprises first lens means operable to focus a beam of charged particles upon the first of said masks and to pass said beam through the aperture of said first mask to establish a beam cross-section corresponding to the contour of said first mask aperture, deflector means positioned to deflect said beam, after passing through the first of said masks and before passing through the second of said masks, said deflector means deflecting said beam with respect to said second aperture in a transverse direction and by a given distance to pass through a predetermined region of a transverse two-dimensional plane, second lens means operable to focus the deflected beam upon the second of said masks and to pass only a portion of said beam through the aperture of said second mask to modify the cross-section of said beam in accordance with the contour of said second mask aperture and the distance and direction of said deflection to thereby establish by the combined interception action of said masks a predetermined beam cross-section at the incidence of the beam on the target.
Claim 7
Dependent Claim
200 words
In an apparatus for projecting a beam of charged particles to a target through two apertured masks, the improvement which comprises first lens means operable to focus a beam of charged particles upon the first of said masks and to pass said beam through the aperture of said first mask to establish a beam cross-section corresponding to the contour of said first mask aperture, deflector means positioned to deflect said beam, after passing through the first of said masks and before passing through the second of said masks, said deflector means deflecting said beam with respect to said second aperture in a transverse direction and by a given distance to pass through a predetermined region of a transverse two-dimensional plane, second lens means operable to focus the deflected beam upon the second of said masks and to pass only a portion of said beam through the aperture of said second mask to modify the cross-section of said beam in accordance with the contour of said second mask aperture and the distance and direction of said deflection to thereby establish by the combined interception action of said masks a predetermined beam cross-section at the incidence of the beam on the target.
Claim 8
Dependent Claim
16 words
The improvement according to claim 5 wherein said masks have apertures each of a polygonal contour.
Claim 9
Dependent Claim
16 words
The improvement according to claim 6 wherein said masks have apertures each of a square contour.
Claim 10
Dependent Claim
16 words
The improvement according to claim 6 wherein said masks have apertures each of a pentagonal contour.
Claim 11
Dependent Claim
18 words
The improvement according to claim 6 wherein said target is a substrate in which electric circuits are built.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-09-04 | 1982-03-06 | 1982-09-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-09-04 | 1986-03-06 | 1986-09-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-09-04 | 1990-03-06 | 1990-09-05 | $7700.00 | Window Closed / Lapsed |