← Back to Patent Explorer
US4169337A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for polishing semi-conductor materials

Assignee: Rodel Inc
•
Filing: 1978-03-30
•
Granted: 1979-10-02
•
Expires: 1998-03-30
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Semi-conductors can be polished with greater efficiency by using as a polishing agent a blend of colloidal silica or silica gel and a water-soluble amine.

Inventors

  • 👤 Charles C. Payne

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 06:27
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02; H; H10; H10P; H10P52/00; H10P52/40; H10P52/402

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 48 words
An improved method for polishing silicon wafers and like materials which comprises polishing them with a polishing agent which comprises an aqueous colloidal silica sol or a gel which is combined with 0.1%-5% by weight of a water-soluble amine based on the SiO 2 content of the sol.
Claim 2
Dependent Claim 48 words
An improved method for polishing silicon wafers and like materials which comprises polishing them with a polishing agent which comprises an aqueous colloidal silica sol or a gel which is combined with 0.1%-5% by weight of a water-soluble amine based on the SiO 2 content of the sol.
Claim 3
Dependent Claim 37 words
The method of claim 1 where the polishing agent contains a silica sol having an average particle size diameter within the range of 4-100 millimicrons and the amine contains a primary amino group and 2-8 carbon atoms.
Claim 4
Dependent Claim 10 words
The method of claim 2 wherein the amine is aminoethylethanolamine.
Claim 5
Dependent Claim 39 words
The method of claim 1 where the polishing agent contains a silica sol having an average particle size diameter within the range of 4-100 millimicrons and the amine contains two or more primary amino groups and 2-12 carbon atoms.
Claim 6
Dependent Claim 10 words
The method of claim 4 wherein the amine is ethylenediamine.

References Cited (Backward Citations)

US3874129A Cited
US4062658A Cited
US4117093A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-10-01 1983-04-02 1983-10-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-10-01 1987-04-02 1987-10-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-10-01 1991-04-02 1991-10-02 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag