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US4173683A Expired / Lapsed US ⏱️ 0.0 years remaining

Chemically treating the overcoat of a semiconductor device

Assignee: RCA Corp
•
Filing: 1978-04-06
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Granted: 1979-11-06
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Expires: 1998-04-06
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Abstract

Abstract A method of manufacturing a semiconductor device having a passivating overcoat of insulating material disposed thereover comprises treating the overcoat with a silane solution prior to encapsulating the device.

Inventors

  • 👤 Robert B. Comizzoli

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 17:03
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/10; H10W74/131; H10W74/137; H10W74/01; H10W74/111; H10W74/121; Y; Y10; Y10S; Y10S438/00; Y10S438/958; Y10T; Y10T428/00; Y10T428/31504; Y10T428/31652; Y10T428/31663

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 89 words
In a method of manufacturing a semiconductor device wherein a passivating overcoat of insulating material is disposed over said device prior to encapsulating said device with a packaging material selected from the group consisting of plastic, metal, ceramic and glass, the improvement comprising treating said overcoat with an organosilane as the step immediately prior to said encapsulating step, said organosilane containing an organic functional group remaining after said treatment, said functional group being free of one or more atoms selected from the group consisting of nitrogen, oxygen and fluorine.
Claim 2
Dependent Claim 89 words
In a method of manufacturing a semiconductor device wherein a passivating overcoat of insulating material is disposed over said device prior to encapsulating said device with a packaging material selected from the group consisting of plastic, metal, ceramic and glass, the improvement comprising treating said overcoat with an organosilane as the step immediately prior to said encapsulating step, said organosilane containing an organic functional group remaining after said treatment, said functional group being free of one or more atoms selected from the group consisting of nitrogen, oxygen and fluorine.
Claim 3
Dependent Claim 44 words
A method as recited in claim 1, wherein said organosilane is selected from the group consisting of hexamethyldisilazane [((CH 3 ) 3 Si) 2 NH], triacetyloxyvinylsilane [CH 2 ═CHSi(OCOCH 3 ) 3 ], and 3-chloropropyltrimethoxysilane [Cl(CH 2 ) 3 Si(OCH 3 ) 3 ].
Claim 4
Dependent Claim 45 words
A method as recited in claim 2, wherein said organosilane compound is dissolved in a solvent selected from the group consisting of 1,1,2-trichloro-1,2,2-trifluoroethane [Cl 2 FC 2 ClF 2 ], isopropyl alcohol [(CH 3 ) 2 CHOH], acetone [CO(CH 3 ) 2 ], and water.
Claim 5
Dependent Claim 19 words
A method as recited in claim 3, wherein said organosilane solution comprises 25% hexamethyldisilazane and 75% trichlorotrifluoroethane by volume.

References Cited (Backward Citations)

US3447975A Cited
US3496427A Cited
US3482977A Cited
US3549368A Cited
US3586554A Cited
US3788895A Cited
US3911169A Cited
US4001870A Cited
US3946427A Cited
US4017340A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-11-05 1983-05-07 1983-11-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-11-05 1987-05-07 1987-11-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-11-05 1991-05-07 1991-11-06 $7700.00 Window Closed / Lapsed

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