US4176281A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for adjusting a semiconductor disk relative to a radiation mask in x-ray photolithography
Assignee: Siemens AG
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Filing: 1978-04-20
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Granted: 1979-11-27
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Expires: 1998-04-20
Abstract
Abstract In the illustrative disclosure, alignment of x-ray masks, with elements in the submicron range for x-ray lithographic replication, is carried out with the use of through-bores in the set of masks and in the substrates. A single point x-ray source may be used to produce widely offset parallel beams defining the bore alignment axes, or the bores may be formed with oblique axes converging at a point, so as to be usable with diverging x-ray beams from a point x-ray source.
Inventors
- 👤 Peter Tischer
- 👤 Eckart Hundt
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 17:03
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
179 words
A method for the adjustment of a semiconductor disk relative to a radiation mask in x-ray photolithography, in which the semiconductor disk and the radiation mask are provided with adjusting marks corresponding with one another, and whereby the adjustment results with the aid of x-radiation and with one or several detectors sensitive to x-rays, characterized in that bores are utilized as adjusting marks for the semiconductor disk and the radiation mask, said bores completely penetrating the semiconductor disk and the photolacquer layer situated on the semiconductor disk and the radiation mask, respectively, the axes of said bores extending perpendicularly in relation to the surface of the semiconductor disk and of the radiation mask, characterized in that the adjustment proceeds with the aid of a pair of perpendicular x-ray beams whose paths extend in parallel to one another and perpendicular to the surface of the semiconductor disk and of the radiation mask, and characterized in that a point-shaped x-ray source is utilized for the adjustment and that two parallel x-ray beams are produced with the aid of two diffraction crystals.
Claim 2
Independent Claim
179 words
A method for the adjustment of a semiconductor disk relative to a radiation mask in x-ray photolithography, in which the semiconductor disk and the radiation mask are provided with adjusting marks corresponding with one another, and whereby the adjustment results with the aid of x-radiation and with one or several detectors sensitive to x-rays, characterized in that bores are utilized as adjusting marks for the semiconductor disk and the radiation mask, said bores completely penetrating the semiconductor disk and the photolacquer layer situated on the semiconductor disk and the radiation mask, respectively, the axes of said bores extending perpendicularly in relation to the surface of the semiconductor disk and of the radiation mask, characterized in that the adjustment proceeds with the aid of a pair of perpendicular x-ray beams whose paths extend in parallel to one another and perpendicular to the surface of the semiconductor disk and of the radiation mask, and characterized in that a point-shaped x-ray source is utilized for the adjustment and that two parallel x-ray beams are produced with the aid of two diffraction crystals.
Claim 3
Dependent Claim
33 words
A method in accordance with claim 1, characterized in that the bores utilized as adjusting marks are bored into the semiconductor disk and into the radiation mask with the aid of a laser.
Claim 4
Dependent Claim
33 words
A method in accordance with claim 2, characterized in that simultaneously several bores are produced in the semiconductor disk and in the radiation mask with the aid of an arrangement of several lasers.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-11-26 | 1983-05-28 | 1983-11-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-11-26 | 1987-05-28 | 1987-11-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-11-26 | 1991-05-28 | 1991-11-27 | $7700.00 | Window Closed / Lapsed |