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US4215357A Expired / Lapsed US ⏱️ 0.0 years remaining

Charge transfer device stored with fixed information

Assignee: Toshiba Corp
•
Filing: 1979-03-23
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Granted: 1980-07-29
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Expires: 1999-03-23
📄 Original PDF 🌐 Google Patents

Abstract

Abstract A charge transfer device has a means for grouping a charge transfer section of a semiconductor substrate into a plurality of semiconductor regions each provided with a plurality of charge transfer electrodes and storing a fixed information, predetermined correspondingly to a combination of surface potential levels to be formed at semiconductor subregions under the electrodes on each semiconductor region, in such semiconductor region.

Inventors

  • 👤 Susumu Kohyama
  • 👤 Nobuhisa Kubota

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 00:52
CPC Classifications
H; H10; H10D; H10D44/00; H10D44/40; H10D44/45; G; G11; G11C; G11C11/00; G11C11/21; G11C11/34; G11C11/35; G11C19/00; G11C19/28; G11C19/282; H10D44/472; H10D44/474; H10D62/00; H10D62/10; H10D62/17; H10D62/213; H10D62/335

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 395 words
A charge transfer device, comprising: a charge supplying source section; a charge transfer section coupled at one end to said charge supplying source section and including a semiconductor substrate of a first conductivity type, an insulation layer provided on said semiconductor substrate and a plurality of charge transfer electrodes provided on said insulation layer, each adapted to be supplied with a gate signal; an output section coupled to the other end of said charge transfer section; said charge transfer section including a plurality of first semiconductor regions in which first fixed information is stored, and a plurality of second semiconductor regions in which second fixed information is stored, each of said first and second semiconductor regions being serially disposed upon said semiconductor substrate between said source section and said output section; each of said first semiconductor regions including a first pair of subregions and a second pair of subregions disposed adjacent to said first pair of subregions, each of said first and second pairs of subregions including a first type subregion and a second type subregion disposed adjacent to said first type subregion with each said subregion having a discrete charge transfer electrode disposed thereover; each of said second semiconductor regions including a third pair of subregions and a fourth pair of subregions disposed adjacent to said third pair of subregions, each of said third pair of subregions including a first type subregion and a second type subregion disposed adjacent to said first type subregion, each of said fourth pair of subregions including a first type subregion and a third type subregion disposed adjacent to said first type subregion, each of said first, second, and third type subregions having a discrete charge transfer electrode disposed thereover; each of said discrete charge transfer electrodes disposed over said first and third pairs of subregions adapted to be supplied with a first gating signal voltage, and each of said discrete charge transfer electrodes disposed over said second and fourth pairs of subregions adapted to be supplied with a second gating signal voltage; each of said subregions exhibiting a gate voltage-surface potential characteristic curve such that the characteristic curves for said first type subregion and for said third type subregion are approximately parallel and the characteristic curve of said second type subregion is such that it intersects with the characteristic curves of said first and said third type subregions.
Claim 2
Dependent Claim 395 words
A charge transfer device, comprising: a charge supplying source section; a charge transfer section coupled at one end to said charge supplying source section and including a semiconductor substrate of a first conductivity type, an insulation layer provided on said semiconductor substrate and a plurality of charge transfer electrodes provided on said insulation layer, each adapted to be supplied with a gate signal; an output section coupled to the other end of said charge transfer section; said charge transfer section including a plurality of first semiconductor regions in which first fixed information is stored, and a plurality of second semiconductor regions in which second fixed information is stored, each of said first and second semiconductor regions being serially disposed upon said semiconductor substrate between said source section and said output section; each of said first semiconductor regions including a first pair of subregions and a second pair of subregions disposed adjacent to said first pair of subregions, each of said first and second pairs of subregions including a first type subregion and a second type subregion disposed adjacent to said first type subregion with each said subregion having a discrete charge transfer electrode disposed thereover; each of said second semiconductor regions including a third pair of subregions and a fourth pair of subregions disposed adjacent to said third pair of subregions, each of said third pair of subregions including a first type subregion and a second type subregion disposed adjacent to said first type subregion, each of said fourth pair of subregions including a first type subregion and a third type subregion disposed adjacent to said first type subregion, each of said first, second, and third type subregions having a discrete charge transfer electrode disposed thereover; each of said discrete charge transfer electrodes disposed over said first and third pairs of subregions adapted to be supplied with a first gating signal voltage, and each of said discrete charge transfer electrodes disposed over said second and fourth pairs of subregions adapted to be supplied with a second gating signal voltage; each of said subregions exhibiting a gate voltage-surface potential characteristic curve such that the characteristic curves for said first type subregion and for said third type subregion are approximately parallel and the characteristic curve of said second type subregion is such that it intersects with the characteristic curves of said first and said third type subregions.
Claim 3
Dependent Claim 115 words
The charge transfer device as set forth in claim 1, wherein: said first type subregion includes a semiconductor surface layer which is identical to said semiconductor substrate of the first conductivity type; said second type subregion includes a semiconductor surface layer which is doped with an impurity of a first conductivity type and an impurity of a second conductivity type so as to impart a higher impurity concentration to said subregion than that of said semiconductor substrate; and said third type subregion includes a semiconductor surface layer which is doped with an impurity of a second conductivity type so as to impart a higher impurity concentration to said subregion than that of said semiconductor substrate.
Claim 4
Dependent Claim 65 words
The charge transfer device as set forth in claim 1, wherein: said semiconductor substrate is of p-type; said first type subregion includes a semiconductor surface layer which is formed by doping said P-type semiconductor substrate with N-type phosphorus and P-type boron impurities; and said third type subregion includes a semiconductor surface layer which is formed by doping said P-type semiconductor substrate with N-type phosphorus impurities.
Claim 5
Dependent Claim 90 words
The charge transfer device as set forth in claim 1, wherein: the subregions of said first semiconductor region are serially arranged along said semiconductor substrate in the direction of said source section toward said output section as follows: first type subregion, second type subregion, first type subregion, second type subregion; and the subregions of said second semiconductor region are serially arranged along said semiconductor substrate in the direction of said source section toward said output section as follows: first type subregion, second type subregion, first type subregion, third type subregion.
Claim 6
Dependent Claim 35 words
The charge device as set forth in claim 1, wherein: said insulation layer is of non-uniform thickness such that the insulation layer covering some semiconductor subregions is of different thickness from that covering other subregions.

References Cited (Backward Citations)

US3654499A Cited
US3789267A Cited
US3829885A Cited
US3918997A Cited
US4047215A Cited
US4060738A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1983-07-29 1984-01-28 1984-07-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1987-07-29 1988-01-28 1988-07-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1991-07-29 1992-01-28 1992-07-29 $7700.00 Window Closed / Lapsed

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