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US4222815A Expired / Lapsed US ⏱️ 0.0 years remaining

Isotropic etching of silicon strain gages

Assignee: Elsag International BV
•
Filing: 1979-06-04
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Granted: 1980-09-16
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Expires: 1999-06-04
📄 Original PDF 🌐 Google Patents

Abstract

Abstract A method of etching a silicon diffused resistance pressure transducer assembly (13) of a transducer (10) mounted on a glass base (14) providing a thin flexible area on the transducer in the region of the diffused resistors (15) and a thick rigid area in the region where the transducer is mounted to the glass base (14). To accomplish this, the transducer (10) is first bonded to the glass base (14) which is tubular, thus providing a circular area on the backside (16) of the transducer (10) open to ambient. This open area is then filled with an isotropic etchant which etches silicon material but which has little effect on glass material. Thus, the region of the diffused resistors (15) is etched out to provide a thin flexible area while leaving a thick area where the transducer (10) is mounted to the glass base (14).

Inventors

  • 👤 Roger L. Krechmery

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 06:12
CPC Classifications
G; G01; G01L; G01L1/00; G01L1/20; G01L1/22; G01L1/2287; G01L1/2293; Y; Y10; Y10S; Y10S438/00; Y10S438/977; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49082; Y10T29/49103

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 117 words
A method of etching a silicon diffused resistance pressure transducer comprising the steps of: providing a tubular support base of glass material; mounting a silicon diffused resistance pressure transducer on one end of said tubular support base with the diffused resistors on the side opposite the side mounted to said tubular support base; maintaining a volume of active isotropic etchant solution on the mounted side of said silicon diffused resistance pressure transducer for a predetermined time; and removing said isotropic etchant solution from said silicon diffused resistance pressure transducer after said predetermined time to prevent further etching and to provide a silicon diffused resistance pressure transducer having a desired thickness in the area of the diffused resistors.
Claim 2
Independent Claim 117 words
A method of etching a silicon diffused resistance pressure transducer comprising the steps of: providing a tubular support base of glass material; mounting a silicon diffused resistance pressure transducer on one end of said tubular support base with the diffused resistors on the side opposite the side mounted to said tubular support base; maintaining a volume of active isotropic etchant solution on the mounted side of said silicon diffused resistance pressure transducer for a predetermined time; and removing said isotropic etchant solution from said silicon diffused resistance pressure transducer after said predetermined time to prevent further etching and to provide a silicon diffused resistance pressure transducer having a desired thickness in the area of the diffused resistors.
Claim 3
Dependent Claim 21 words
A method as set forth in claim 1 wherein said isotropic etchant solution is a solution of hydrofluoric and nitric acids.
Claim 4
Dependent Claim 37 words
A method as set forth in claim 2 wherein said solution includes 40 percent by volume of a 49 percent pure hydrofluoric acid solution and 60 percent by volume of a 70 percent pure nitric acid solution.
Claim 5
Dependent Claim 46 words
A method as set forth in claim 1 wherein the end of said tubular support base opposite said silicon diffused resistance pressure transducer is metallized prior to filling said tubular support base with an isotropic etchant to prevent the etching of that surface of said base.
Claim 6
Dependent Claim 17 words
A method as set forth in claim 4 wherein said metallizing is done with a chrome-silver-gold alloy.

References Cited (Backward Citations)

US3677848A Cited
US3701705A Cited
US3743842A Cited
US4025942A Cited
US4019388A Cited
US4170512A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1983-09-16 1984-03-17 1984-09-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1987-09-16 1988-03-17 1988-09-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1991-09-16 1992-03-17 1992-09-16 $7700.00 Window Closed / Lapsed

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