US4237208A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Silane electron beam resists
Assignee: RCA Corp
•
Filing: 1979-02-15
•
Granted: 1980-12-02
•
Expires: 1999-02-15
Abstract
Abstract Recording media comprising a film of a polymer having a repeating unit of the formula ##STR1## wherein R is an alkyl or acyl group and n is an integer are suitable for recording information with electron beams.
Inventors
- 👤 Nitin V. Desai
- 👤 Eugene S. Poliniak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 12:22
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
41 words
A medium for electron beam recording which comprises a film of a polymer having a repeating unit of the formula ##STR3## wherein R is an alkyl or acyl group and n is an integer, an electrically conductive layer and a support.
Claim 2
Independent Claim
41 words
A medium for electron beam recording which comprises a film of a polymer having a repeating unit of the formula ##STR3## wherein R is an alkyl or acyl group and n is an integer, an electrically conductive layer and a support.
Claim 3
Dependent Claim
12 words
A medium according to claim 1 wherein the polymer is poly(vinyl triethoxy)silane.
Claim 4
Dependent Claim
12 words
A medium according to claim 1 wherein the polymer is poly(vinyl triacetoxy)silane.
Claim 5
Dependent Claim
16 words
A medium according to claim 1 wherein the polymer has a molecular weight of about 1000-2000.
Claim 6
Dependent Claim
16 words
A medium according to claim 1 wherein said electrically conductive layer is adjacent to the support.
Claim 7
Dependent Claim
92 words
In the method of recording information whereby a resist material which becomes more insoluble in a developer solvent when impinged upon by a beam of electrons is selectively exposed to an electron beam and the resist material is developed with a developer solvent so as to remove the more soluble portions thereof, the improvement which comprises employing as the resist material a film of a polymer having a repeating unit of the formula ##STR4## wherein R is alkyl or acyl and n is an integer, an electrically conductive layer and a support.
Claim 8
Dependent Claim
92 words
In the method of recording information whereby a resist material which becomes more insoluble in a developer solvent when impinged upon by a beam of electrons is selectively exposed to an electron beam and the resist material is developed with a developer solvent so as to remove the more soluble portions thereof, the improvement which comprises employing as the resist material a film of a polymer having a repeating unit of the formula ##STR4## wherein R is alkyl or acyl and n is an integer, an electrically conductive layer and a support.
Claim 9
Dependent Claim
16 words
The method according to claim 6 wherein said electrically conductive layer is adjacent to the support.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-12-02 | 1984-06-02 | 1984-12-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-12-02 | 1988-06-02 | 1988-12-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-12-02 | 1992-06-02 | 1992-12-02 | $7700.00 | Window Closed / Lapsed |