Photosensitive material for use in electrophotography

Abstract

Abstract The present invention relates to a photosensitive material for use in electrophotography comprising a photoconductive layer on which there is a transparent protective layer consisting essentially of a substance resulting from partial hydrolysis of a mixture of (a) a compound having the following general formula I, (b) a copolymer of a compound having the general formula II with a compound having the general formula III or maleic anhydride and (c) a compound having the general formula IV, (1) General formula I (R.sup.1).sub.l Si(OR.sup.2).sub.m [wherein R 1 is a C 1-4 alkyl radical, vinyl radical, γ-methacryloxypropyl radical, phenyl radical, γ-glycidoxypropyl radical, γ-chloropropyl radical, γ-mercaptopropyl radical, γ-β(aminoethyl)γ-aminopropyl radical or γ-aminopropyl radical; R 2 is a hydroxyethylalkyl ether radical or C 1-4 alkyl radical; l is 0-2; and m is 2-4.] (2) General formula II ##STR1## [wherein R 3 is hydrogen or a methyl radical; R 4 is hydrogen or a C 1-4 alkyl radical; n is 1-4; and q is 1-3.] (3) General formula III ##STR2## [wherein R 5 is hydrogen or a methyl radical; R 6 is --COOR 7 (R 7 is hydrogen or a C 1-12 alkyl radical, hydroxyalkyl radical, glycidyl radical or dimethylaminoalkyl radical), --CN, --OCOCH 3 , --CONH 2 , ##STR3## (4) General formula IV ##STR4## [wherein R 8 is a C 1-4 alkyl radical or phenyl radical; z is 2-25.]

Inventors

• 👤 Masaru Shimada
• 👤 Shoji Maruyama
• 👤 Hiroshi Tamura

Bibliographic Details