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US4253106A Expired / Lapsed US ⏱️ 0.0 years remaining

Gate injected floating gate memory device

Assignee: Intersil Corp
•
Filing: 1979-10-19
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Granted: 1981-02-24
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Expires: 1999-10-19
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Abstract

Abstract An improved gate injected, floating gate memory device is described having improved charge retention and endurance characteristics is described in which the barrier height for the injection of charge (electrons or holes) into the floating gate is reduced. This is accomplished by utilizing a layer of semi-insulating polycrystalline silicon between the control electrode and the insulating layer over the floating gate.

Inventors

  • 👤 Norman Goldsmith
  • 👤 Sheng T. Hsu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 00:28
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/60; H10D64/66; H10D64/68; H10D64/681; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/682

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 193 words
A floating gate storage device comprising: a body of semiconductor material having a pair of semiconductor regions of a first type of conductivity and spaced a given distance one from the other; an intermediate semiconductor region of an opposite type conductivity defining the space between the pair of regions; a first layer of insulating material having a given thickness disposed on the intermediate region; a floating gate member disposed over the intermediate region and insulated therefrom by the first layer of insulating material; a second layer of insulating material having a greater thickness than that of the first insulating layer disposed on both the floating gate member and those portions of the first insulating layer not covered by the floating gate member; a layer of semi-insulating polycrystalline silicon deposited on the second layer of insulating material above the intermediate region; and a control gate member, the width of which is the same as the given distance between the regions of first conductivity, disposed over the second insulating layer, above the intermediate region, and insulated from the floating gate member by the layer of semi-insulating polycrystalline silicon and the second layer of insulating material.
Claim 2
Dependent Claim 193 words
A floating gate storage device comprising: a body of semiconductor material having a pair of semiconductor regions of a first type of conductivity and spaced a given distance one from the other; an intermediate semiconductor region of an opposite type conductivity defining the space between the pair of regions; a first layer of insulating material having a given thickness disposed on the intermediate region; a floating gate member disposed over the intermediate region and insulated therefrom by the first layer of insulating material; a second layer of insulating material having a greater thickness than that of the first insulating layer disposed on both the floating gate member and those portions of the first insulating layer not covered by the floating gate member; a layer of semi-insulating polycrystalline silicon deposited on the second layer of insulating material above the intermediate region; and a control gate member, the width of which is the same as the given distance between the regions of first conductivity, disposed over the second insulating layer, above the intermediate region, and insulated from the floating gate member by the layer of semi-insulating polycrystalline silicon and the second layer of insulating material.
Claim 3
Dependent Claim 22 words
The floating gate storage device of claim 1, wherein: the body of semiconductor material is bulk silicon of the opposite type conductivity.
Claim 4
Dependent Claim 51 words
The floating gate storage device of claim 2, wherein: the semi-insulating polycrystalline silicon is a graded layer having an excess of silicon atoms and a minimum of oxygen atoms adjacent the control gate member and an excess of oxygen atoms and a minimum of silicon atoms adjacent the floating gate member.
Claim 5
Dependent Claim 72 words
The floating gate storage device of claim 3, wherein: the semi-insulating layer consists of a plurality of sublayers, each sublayer having a different level of silicon and oxygen atoms therein: the sublayer adjacent the control gate member having the highest level of silicon atoms and the lowest level of oxygen atoms; the sublayer adjacent the floating gate member having the highest level of oxygen atoms and the lowest level of silicon atoms.
Claim 6
Dependent Claim 30 words
The floating gate storage device of claim 1, wherein: the pair of spaced regions and the intermediate region are colocated in an island of silicon formed on an insulative substrate.
Claim 7
Dependent Claim 25 words
The floating gate storage device of claim 5, wherein: the insulative substrate is selected from the group consisting of sapphire, spinel, and monocrystalline beryllium oxide.
Claim 8
Dependent Claim 51 words
The floating gate storage device of claim 6, wherein: the semi-insulating polycrystalline silicon is a graded layer having an excess of silicon atoms and a minimum of oxygen atoms adjacent the control gate member and an excess of oxygen atoms and a minimum of silicon atoms adjacent the floating gate member.
Claim 9
Dependent Claim 72 words
The floating gate storage device of claim 7, wherein: the semi-insulating layer consists of a plurality of sublayers, each sublayer having a different level of silicon and oxygen atoms therein: the sublayer adjacent the control gate member having the highest level of silicon atoms and the lowest level of oxygen atoms; the sublayer adjacent the floating gate member having the highest level of oxygen atoms and the lowest level of silicon atoms.

References Cited (Backward Citations)

US3649884A Cited
US3868187A Cited
US3836992A Cited
US4115914A Cited
US4057820A Cited
US4119995A Cited
US4119995B1 Cited
US4104675A Cited
US4162504A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-02-24 1984-08-25 1985-02-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-02-24 1988-08-25 1989-02-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-02-24 1992-08-25 1993-02-24 $7700.00 Window Closed / Lapsed

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