US4264382A
Expired / Lapsed
US
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Method for making a lateral PNP or NPN with a high gain utilizing reactive ion etching of buried high conductivity regions
Assignee: International Business Machines Corp
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Filing: 1979-10-12
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Granted: 1981-04-28
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Expires: 1999-10-12
Abstract
Abstract A method for making lateral PNP or NPN devices in isolated monocrystalline silicon pockets wherein silicon dioxide isolation surrounds the pocket and partially, below the surface, within the isolated monocrystalline region. The P emitter or N emitter diffusion is made over the portion of the silicon dioxide that partially extends into the monocrystalline isolated pocket. This structure reduces the vertical current injection which will give relatively high (beta) gain even at low base to emitter voltages. The lateral PNP or NPN device resulting from the method is in a monocrystalline silicon pocket wherein silicon dioxide isolation surrounds the pocket and partially, below the surface, within the isolated monocrystalline silicon region. The P emitter or N emitter diffusion is located over the portion of the silicon dioxide that partially extends into the monocrystalline isolated pocket.
Inventors
- 👤 Narasipur G. Anantha
- 👤 Harsaran S. Bhatia
- 👤 Santosh P. Caur
- 👤 Hans B. Pogge
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 02:21
CPC Classifications
H; H10; H10W; H10W10/00; H10W10/10; H10W10/17; H10D; H10D10/00; H10D10/60; H10D84/00; H10D84/01; H10D84/0112; H10D84/0114; H10D84/02; H10D84/03; H10D84/038; H10D84/60; H10D84/63; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H10W10/01; H10W10/011; H10W10/014; H10W10/0145
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
165 words
The method for making lateral PNP transistors comprising: providing a silicon semiconductor body having an N+ buried region therein; reactively ion etching regions of said body to form openings in the areas where dielectric isolation is desired to isolate regions of monocrystalline silicon; the etch rate of the said reactive ion etching is adjusted to cause a preferential etching of the said N+ region so that a portion of the said N+ region is removed and monocrystalline silicon remains above this removed portion; filling the said openings with a dielectric material wherein a portion of said monocrystalline region has a dielectric material under this region; simultaneously forming the P type emitter and collector regions with the emitter region being formed in said portion of said monocrystalline region having dielectric isolation thereunder wherein there is no vertical junction between the said P type emitter and said buried N+ region; and making electrical contacts to the emitter, base and collector regions to form said PNP lateral transistor.
Claim 2
Independent Claim
165 words
The method for making lateral PNP transistors comprising: providing a silicon semiconductor body having an N+ buried region therein; reactively ion etching regions of said body to form openings in the areas where dielectric isolation is desired to isolate regions of monocrystalline silicon; the etch rate of the said reactive ion etching is adjusted to cause a preferential etching of the said N+ region so that a portion of the said N+ region is removed and monocrystalline silicon remains above this removed portion; filling the said openings with a dielectric material wherein a portion of said monocrystalline region has a dielectric material under this region; simultaneously forming the P type emitter and collector regions with the emitter region being formed in said portion of said monocrystalline region having dielectric isolation thereunder wherein there is no vertical junction between the said P type emitter and said buried N+ region; and making electrical contacts to the emitter, base and collector regions to form said PNP lateral transistor.
Claim 3
Dependent Claim
24 words
The method of claim 1 wherein an N+ region is formed in the said semiconductor body for the base contact of said PNP transistor.
Claim 4
Dependent Claim
22 words
The method of claim 1 wherein the extension of said dielectric material under said monocrystalline region between about 1 to 3 microns.
Claim 5
Dependent Claim
16 words
The method of claim 1 wherein the reactive ion etching is accomplished in a chlorine-argon ambient.
Claim 6
Dependent Claim
47 words
The method of claim 4 wherein the said chlorine specie ambient has a pressure of between 0.20 to 1.5 microns of mercury, said chlorine specie in said ambient being between about 2 and 15 percent, and the etch rate between about 0.07 and 0.20 microns per minute.
Claim 7
Dependent Claim
13 words
The method of claim 1 wherein the said dielectric material is silicon dioxide.
Claim 8
Dependent Claim
23 words
The method of claim 1 wherein the said dielectric material is deposited in said openings by SiH 4 /N 2 O/N 2 .
Claim 9
Dependent Claim
22 words
The method of claim 1 wherein the dimensions of said emitter region are 1 by 1 to 3 by 3 microns squared.
Claim 10
Dependent Claim
18 words
The method of claim 1 wherein a vertical NPN transistor is formed simultaneously with said lateral PNP transistor.
Claim 11
Dependent Claim
38 words
The method of claim 2 wherein vertical NPN and a lateral PNP transistors are formed simultaneously in a process that includes forming the emitter of said NPN at the same time as the base contact of said PNP.
Claim 12
Independent Claim
165 words
The method for making lateral NPN transistors comprising: providing a silicon semiconductor body having a P+ buried region therein; reactively ion etching regions of said body to form openings in the areas where dielectric isolation is desired to isolate regions of monocrystalline silicon; the etch rate of the said reactive ion etching is adjusted to cause a preferential etching of the said P+ region so that a portion of the said P+ region is removed and monocrystalline silicon remains above this removed portion; filling the said openings with a dielectric material wherein a portion of said monocrystalline region has a dielectric material under this region; simultaneously forming the N type emitter and collector regions with the emitter region being formed in said portion of said monocrystalline region having dielectric isolation thereunder wherein there is no vertical junction between the said N type emitter and said buried P+ region; and making electrical contacts to the emitter, base and collector regions to form said NPN lateral transistor.
Claim 13
Independent Claim
165 words
The method for making lateral NPN transistors comprising: providing a silicon semiconductor body having a P+ buried region therein; reactively ion etching regions of said body to form openings in the areas where dielectric isolation is desired to isolate regions of monocrystalline silicon; the etch rate of the said reactive ion etching is adjusted to cause a preferential etching of the said P+ region so that a portion of the said P+ region is removed and monocrystalline silicon remains above this removed portion; filling the said openings with a dielectric material wherein a portion of said monocrystalline region has a dielectric material under this region; simultaneously forming the N type emitter and collector regions with the emitter region being formed in said portion of said monocrystalline region having dielectric isolation thereunder wherein there is no vertical junction between the said N type emitter and said buried P+ region; and making electrical contacts to the emitter, base and collector regions to form said NPN lateral transistor.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-04-27 | 1984-10-27 | 1985-04-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-04-27 | 1988-10-27 | 1989-04-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-04-27 | 1992-10-27 | 1993-04-28 | $7700.00 | Window Closed / Lapsed |