US4265729A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Magnetically enhanced sputtering device
Assignee: Hauzer Industries BV
•
Filing: 1979-03-09
•
Granted: 1981-05-05
•
Expires: 1999-03-09
Abstract
Abstract A magnetically enhanced sputtering device including magnet means for establishing a magnetic field where the lines of force thereof extend over and may pass through the cathode sputtering surface at one predetermined area thereof. Preferably, the majority of the lines of force passing through said predetermined area of the sputtering surface are inclined at angles of 45° or less with respect to the surface. The magnet means may be disposed on the side of the cathode opposite the sputtering surface where the flux therein extends substantially parallel to the sputtering surface. Means for shaping the magnetic field at least along the direction of the lines of force may also be provided where the field shaping means may render the lines of force more parallel to the sputtering surface to thereby enhance uniformity of erosion of the sputtering surface at least in the direction of the lines of force and/or the field shaping may cause the lines of force to be substantially perpendicular to an edge of the sputtering surface to thereby substantially limit erosion of the sputtering surface beyond the edge. The magnet means may cause a closed loop configuration of the lines of force where the closed loop configuration has at least some non-linear portions. Preferably flexible magnetic means may be employed for enhancing the uniformity of the magnetic field along the non-linear portions.
Inventors
- 👤 Charles F. Morrison, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 00:16
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3488; H01J37/3494; H01J37/3402; H01J37/3405; H01J37/3408; H01J37/3411; H01J37/345; H01J37/3458
Claims Analysis
Total Claims: 88
Claim 1
Independent Claim
124 words
A magnetically enhanced sputtering device comprising: a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing a discharge current therebetween; and permanent magnet means for establishing a closed loop magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said permanent magnet means further establishing a closed plasma loop path over said planar sputtering surface thereby providing a Hall effect current which circulates around the closed plasma loop path, said permanent magnet means including means for causing the magnitude of the circulating current to be at least approximately five times as great as that of said discharge current.
Claim 2
Dependent Claim
124 words
A magnetically enhanced sputtering device comprising: a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing a discharge current therebetween; and permanent magnet means for establishing a closed loop magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said permanent magnet means further establishing a closed plasma loop path over said planar sputtering surface thereby providing a Hall effect current which circulates around the closed plasma loop path, said permanent magnet means including means for causing the magnitude of the circulating current to be at least approximately five times as great as that of said discharge current.
Claim 3
Dependent Claim
24 words
A sputtering device as in claim 1 including means for shaping said magnetic field at least along the direction of said lines of force.
Claim 4
Dependent Claim
48 words
A sputtering device as in claim 2 where said field shaping means includes field deflecting means for rendering said lines of force more parallel to said sputtering surface to thereby enhance uniformity of erosion of the sputtering surface at least in the direction of the lines of force.
Claim 5
Dependent Claim
47 words
A sputtering device as in claims 2 or 3 where said field shaping means includes erosion limiting means for causing the lines of force to be substantially perpendicular to an edge of the sputtering surface to thereby substantially limit erosion of the sputtering surface beyond said edge.
Claim 6
Dependent Claim
125 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a sputtering surface having a central portion; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where the lines of force thereof extend over and pass through said sputtering surface at said central portion thereof, said magnet means including means for causing the majority of the lines of force to pass through said central portion of the sputtering surface at angles of 45° or less with respect to said sputtering surface, said last-mentioned means being disposed on the side of said cathode opposite said sputtering surface where the flux therein extends substantially parallel to said sputtering surface.
Claim 7
Dependent Claim
125 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a sputtering surface having a central portion; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where the lines of force thereof extend over and pass through said sputtering surface at said central portion thereof, said magnet means including means for causing the majority of the lines of force to pass through said central portion of the sputtering surface at angles of 45° or less with respect to said sputtering surface, said last-mentioned means being disposed on the side of said cathode opposite said sputtering surface where the flux therein extends substantially parallel to said sputtering surface.
Claim 8
Dependent Claim
31 words
A sputtering device as in claim 5 where substantially all of said magnetic lines of force pass through said central portions of the sputtering surface at angles of 45° or less.
Claim 9
Dependent Claim
24 words
A sputtering device as in claim 5 including means for shaping said magnetic field at least along the direction of said lines of force.
Claim 10
Dependent Claim
48 words
A sputtering device as in claim 7 where said field shaping means includes field deflecting means for rendering said lines of force more parallel to said sputtering surface to thereby enhance uniformity of erosion of the sputtering surface at least in the direction of the lines of force.
Claim 11
Dependent Claim
47 words
A sputtering device as in claims 7 or 8 where said field shaping means includes erosion limiting means for causing the lines of force to be substantially perpendicular to an edge of the sputtering surface to thereby substantially limit erosion of the sputtering surface beyond said edge.
Claim 12
Dependent Claim
35 words
A magnetically enhanced sputtering device as in claim 5 including magnetic shifting means disposed on the side of said cathode opposite said sputtering surface for shifting said magnetic lines of force over said sputtering surface.
Claim 13
Dependent Claim
88 words
A sputtering device as in claim 10 where at least a portion of said cathode is symmetrically disposed about a center line perpendicular to said sputtering surface and where the said lines of force of said magnet means pass through the sputtering surface in the vicinity of said center line and where said magnetic shifting means includes an electromagnet having a pair of legs the ends of which are respectively disposed on opposite sides of said center line on the side of said cathode opposite said sputtering surface.
Claim 14
Dependent Claim
108 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an electrode spaced from said cathode for establishing an electric field therebetween; magnet means for establishing a magnetic field where at least some of the lines of force of the field extend over said sputtering surface; and magnetic field shaping means for rendering said lines of force more parallel to said planar sputtering surface than what they would be in the absence of said field shaping means to thereby enhance uniformity of erosion of said sputtering surface at least in the direction of said lines of force.
Claim 15
Dependent Claim
108 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an electrode spaced from said cathode for establishing an electric field therebetween; magnet means for establishing a magnetic field where at least some of the lines of force of the field extend over said sputtering surface; and magnetic field shaping means for rendering said lines of force more parallel to said planar sputtering surface than what they would be in the absence of said field shaping means to thereby enhance uniformity of erosion of said sputtering surface at least in the direction of said lines of force.
Claim 16
Dependent Claim
73 words
A sputtering device as in claim 12 where said field shaping means deflects said lines of force toward said sputtering surface so that each is parallel to said sputtering surface along at least a portion thereof, said portion being longer that what it would be in the absence of said field deflecting means to thereby enhance uniformity of erosion of said sputtering surface at least in the direction of said lines of force.
Claim 17
Dependent Claim
44 words
A sputtering device as in claims 12 or 13 including means for causing a substantial number of said lines of force to be approximately perpendicular to an edge of said sputtering surface and thereby substantially prevent erosion of the sputtering surface beyond said edge.
Claim 18
Dependent Claim
31 words
A sputtering device as in claim 14 where said lines of force over said sputtering surface pass through at least one predetermined portion of the sputtering surface other than said edge.
Claim 19
Dependent Claim
59 words
A sputtering device as in claim 15 where said field shaping means includes further means for rendering said lines of force more parallel to said sputtering surface so that uniformity of erosion of the sputtering surface is enhanced in the direction of said lines of force toward both said one portion of the sputtering surface and said edge thereof.
Claim 20
Dependent Claim
18 words
A sputtering device as in claim 16 where said one portion of the sputtering surface is centrally located.
Claim 21
Dependent Claim
125 words
A magnetically enhanced sputering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; first magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface; and field shaping means for shaping said magnetic field, said field shaping means comprising a second magnet means in a magnetic circuit path which includes said first magnet means and said lines of force over the planar sputtering surface and where the flux in said second magnet means is inclined at an angle with respect to the flux in the first magnet means.
Claim 22
Dependent Claim
125 words
A magnetically enhanced sputering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; first magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface; and field shaping means for shaping said magnetic field, said field shaping means comprising a second magnet means in a magnetic circuit path which includes said first magnet means and said lines of force over the planar sputtering surface and where the flux in said second magnet means is inclined at an angle with respect to the flux in the first magnet means.
Claim 23
Dependent Claim
24 words
A sputtering device as in claim 18 where said second magnet means is disposed adjacent one of the ends of said first magnet means.
Claim 24
Dependent Claim
39 words
A sputtering device as in claim 19 where said second magnet means includes means for causing said lines of force to be substantially perpendicular to an edge of said sputtering surface to substantially prevent erosion thereof beyond said edge.
Claim 25
Dependent Claim
54 words
A sputtering device as in claim 19 where the sputtering surface layer is at least about one inch thick and where said second magnet means includes means for causing the strength of said magnet field above the sputtering surface to be sufficient to entrap electrons thereover to thereby effect efficient sputtering of said layer.
Claim 26
Dependent Claim
72 words
A sputtering device as in claim 18 where said second magnet means is disposed between the ends of said first magnet means so that the flux in the first magnet means is at least partially interrupted by said second magnet means, said second magnet means including means for rendering said lines of force more parallel to said sputtering surface than what they would be in the absence of said second magnet means.
Claim 27
Dependent Claim
163 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and first magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said sputtering surface, said first magnet means being disposed on the side of said cathode opposite said sputtering surface and extending along a line substantially parallel to the planar sputtering surface where the flux in said first magnet means extends from a first pole thereof to a second pole thereof; and second magnet means for shaping said magnetic field, said second magnet being substantially aligned with respect to said first magnet means along said line parallel to the planar sputtering surface where the flux in said second magnet means is inclined at an angle with respect to the flux in said first magnet means.
Claim 28
Dependent Claim
163 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and first magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said sputtering surface, said first magnet means being disposed on the side of said cathode opposite said sputtering surface and extending along a line substantially parallel to the planar sputtering surface where the flux in said first magnet means extends from a first pole thereof to a second pole thereof; and second magnet means for shaping said magnetic field, said second magnet being substantially aligned with respect to said first magnet means along said line parallel to the planar sputtering surface where the flux in said second magnet means is inclined at an angle with respect to the flux in said first magnet means.
Claim 29
Dependent Claim
25 words
A sputtering device as in claim 23 where said flux in the first magnet means extends along said line substantially parallel to said sputtering surface.
Claim 30
Dependent Claim
24 words
A sputtering device as in claim 24 where said second magnet means is disposed adjacent one of said poles of the first magnet means.
Claim 31
Dependent Claim
27 words
A sputtering device as in claim 25 where the flux in said second magnet means is perpendicular with respect to the flux in said first magnet means.
Claim 32
Dependent Claim
51 words
A sputtering device as in claims 25 or 26 where the flux in said second magnet means extends from a first pole to a second pole thereof and where said one pole of the first magnet means is adjacent at least the pole of like polarity of said second magnet means.
Claim 33
Dependent Claim
25 words
A sputtering device as in claim 27 where said one pole of the first magnet means is adjacent both poles of said second magnet means.
Claim 34
Dependent Claim
26 words
A sputtering device as in claims 25 or 26 including a further magnet means disposed adjacent the other of said poles of the first magnet means.
Claim 35
Dependent Claim
18 words
A sputtering device as in claim 29 where said second magnet means has a substantially closed loop configuration.
Claim 36
Dependent Claim
20 words
A sputtering device as in claim 30 where said further magnet means is disposed within the said second magnet means.
Claim 37
Dependent Claim
24 words
A sputtering device as in claim 30 where said first magnet means has a substantially closed loop configuration disposed within said second magnet means.
Claim 38
Dependent Claim
21 words
A sputtering device as in claim 32 where said further magnet means is disposed within said first and second magnet means.
Claim 39
Dependent Claim
27 words
A sputtering device as in claim 29 where the flux direction in said further magnet means is parallel and opposite to that in said second magnet means.
Claim 40
Dependent Claim
20 words
A sputtering device as in claim 34 where the thickness of the sputtering surface layer is at least 1 inch.
Claim 41
Dependent Claim
49 words
A sputtering device as in claim 34 where the flux in the further magnet means extends from a first pole to a second pole thereof and where said other pole of the first magnet means is adjacent at least the pole of like polarity of said further magnet means.
Claim 42
Dependent Claim
25 words
A sputtering device as in claim 36 where said one pole of the first magnet means is adjacent both poles of said further magnet means.
Claim 43
Dependent Claim
27 words
A sputtering device as in claim 23 where the flux in said second magnet means is perpendicular with respect to the flux in said first magnet means.
Claim 44
Dependent Claim
42 words
A sputtering device as in claim 23 or 24 where said second magnet means is disposed between said poles of the first magnet means so that the second magnet means interrupts at least some of the flux in said first magnet means.
Claim 45
Dependent Claim
21 words
A sputtering device as in claim 39 where said second magnet means completely interrupts the flux in said first magnet means.
Claim 46
Dependent Claim
25 words
A sputtering device as in claim 39 where the flux direction in said second magnet is substantially perpendicular to that in said first magnet means.
Claim 47
Dependent Claim
28 words
A sputtering device as in claim 39 where the flux direction in said second magnet means is substantially parallel to and opposite that in said first magnet means.
Claim 48
Dependent Claim
39 words
A sputtering device as in claim 39 including a further magnet means disposed between said poles of the first magnet means so that the further magnet means interrupts at least some of the flux in said first magnet means.
Claim 49
Dependent Claim
21 words
A sputtering device as in claim 43 where said further magnet means completely interrupts the flux in said first magnet means.
Claim 50
Dependent Claim
46 words
A sputtering device as in claim 43 where the flux directions in said further magnet means and said second magnet means are substantially parallel and opposite to one another and where said flux directions are substantially perpendicular to the flux direction in said first magnet means.
Claim 51
Dependent Claim
135 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnetic means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said magnetic means including first magnet means disposed on the side of said cathode opposite said planar sputtering surface and extending along a line substantially parallel to the sputtering surface where the flux in said first magnet means extends from a first pole thereof to a second pole thereof, said first magnet means having a varying cross sectional area between said poles to effect shaping of said field over the planar sputtering surface.
Claim 52
Dependent Claim
135 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnetic means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said magnetic means including first magnet means disposed on the side of said cathode opposite said planar sputtering surface and extending along a line substantially parallel to the sputtering surface where the flux in said first magnet means extends from a first pole thereof to a second pole thereof, said first magnet means having a varying cross sectional area between said poles to effect shaping of said field over the planar sputtering surface.
Claim 53
Dependent Claim
57 words
A sputtering device as in claim 46 where said varying cross sectional area is effected by at least one slot disposed between said poles which at least partially interrupts the flux in said first magnet means, said lines of force being more parallel to said surface than what they would be in the absence of said slot.
Claim 54
Dependent Claim
18 words
A sputtering device as in claim 47 where said slot completely interrupts the flux in the magnet means.
Claim 55
Dependent Claim
16 words
A sputtering device as in claims 47 or 48 where said slot contains magnetically permeable material.
Claim 56
Dependent Claim
17 words
A sputtering device as in claims 47 or 48 where said slot contains an electrically insulating material.
Claim 57
Dependent Claim
142 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a sputtering surface having a peripheral portion; an anode spaced from said cathode for establishing an electric field therebetween; magnetic means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said sputtering surface to effect electron entrapment over the sputtering surface; and erosion preventing means disposed adjacent said cathode for preventing sputtering of at least some of said peripheral portion of the sputtering surface, said erosion preventing means including a predetermined surface inclined at an angle toward the surface of the cathode and so adapted that at least a majority of said lines of force pass through and are substantially perpendicular to the predetermined surface so that erosion thereat is substantially prevented.
Claim 58
Dependent Claim
142 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a sputtering surface having a peripheral portion; an anode spaced from said cathode for establishing an electric field therebetween; magnetic means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said sputtering surface to effect electron entrapment over the sputtering surface; and erosion preventing means disposed adjacent said cathode for preventing sputtering of at least some of said peripheral portion of the sputtering surface, said erosion preventing means including a predetermined surface inclined at an angle toward the surface of the cathode and so adapted that at least a majority of said lines of force pass through and are substantially perpendicular to the predetermined surface so that erosion thereat is substantially prevented.
Claim 59
Dependent Claim
64 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where at least some of the lines of force of the field extend over said sputtering surface, said magnet means comprising a flexible material.
Claim 60
Dependent Claim
64 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where at least some of the lines of force of the field extend over said sputtering surface, said magnet means comprising a flexible material.
Claim 61
Dependent Claim
39 words
A sputtering device as in claim 52 where said magnet means includes a first plurality of layers of magnetized tape where at least one of the layers at least partially overlaps at least one of the layers adjacent thereto.
Claim 62
Dependent Claim
31 words
A sputtering device as in claim 53 where at least a portion of said one layer of magnetized tape and the layer adjacent thereto are non-linear along the respective lengths thereof.
Claim 63
Dependent Claim
23 words
A sputtering device as in claim 54 where said one layer and the layer adjacent thereto are substantially perpendicular to said sputtering surface.
Claim 64
Dependent Claim
23 words
A sputtering device as in claim 54 where said one layer and the layer adjacent thereto are substantially parallel to said sputtering surface.
Claim 65
Dependent Claim
26 words
A sputtering device as in claim 53 where said first layers of magnetized tape are disposed on the side of said cathode opposite said sputtering surface.
Claim 66
Dependent Claim
22 words
A sputtering device as in claims 53 or 57 where said layers of magnetized tape are arranged in a closed loop configuration.
Claim 67
Dependent Claim
25 words
A sputtering device as in claim 58 where said closed loop configuration is effected by a single strip of said tape wound as a spiral.
Claim 68
Dependent Claim
34 words
A sputtering device as in claim 59 where at least a portion of said sputtering surface is symmetrically disposed about a center line perpendicular to a plane containing said portion of the sputtering surface.
Claim 69
Dependent Claim
18 words
A sputtering device as in claim 58 where said layers are concentrically disposed with respect to each other.
Claim 70
Dependent Claim
34 words
A sputtering device as in claim 58 where at least a portion of said sputtering surface is symmetrically disposed about a center line perpendicular to a plane containing said portion of the sputtering surface.
Claim 71
Dependent Claim
120 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said magnet means including a first plurality of layers of magnetized tape concentrically disposed on the side of said cathode opposite said planar sputtering surface where each layer is adjacent to and at least partially overlaps at least one of the layers adjacent it so that a substantially solid, flat coil is formed by said plurality of layers.
Claim 72
Dependent Claim
120 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said magnet means including a first plurality of layers of magnetized tape concentrically disposed on the side of said cathode opposite said planar sputtering surface where each layer is adjacent to and at least partially overlaps at least one of the layers adjacent it so that a substantially solid, flat coil is formed by said plurality of layers.
Claim 73
Dependent Claim
17 words
A sputtering device as in claim 63 where the coil is substantially parallel to said sputtering surface.
Claim 74
Dependent Claim
23 words
A sputtering device as in claims 63 or 64 where at least some of the layers are substantially perpendicular to said sputtering surface.
Claim 75
Dependent Claim
23 words
A sputtering device as in claims 63 or 64 where at least some of the layers are substantially parallel to said sputtering surface.
Claim 76
Dependent Claim
32 words
A sputtering device as in claims 63 or 64 where at least some of the layers are disposed at an angle of 40°-60° with respect to a perpendicular to said sputtering surface.
Claim 77
Dependent Claim
12 words
A sputtering device as in claim 67 where said angle is 50°-55°.
Claim 78
Dependent Claim
27 words
A sputtering device as in claims 63 or 64 where each layer closely contacts the layers adjacent it at least in the non-linear portions of said coil.
Claim 79
Dependent Claim
22 words
A sputtering device as in claim 63 where each layer of the coil is in physical contact with the layer adjacent it.
Claim 80
Dependent Claim
126 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said magnet means including a wound strip of at least one magnetized tape having a coil-like configuration disposed on the side of said cathode opposite said planar sputtering surface where each turn of the coil is adjacent to and at least partially overlaps at least one of the turns adjacent it so that a substantially solid, flat coil is formed by said wound strip.
Claim 81
Dependent Claim
126 words
A magnetically enhanced sputtering device comprising a cathode, at least a portion of which is provided with a planar sputtering surface; an anode spaced from said cathode for establishing an electric field therebetween; and magnet means for establishing a magnetic field where at least some of the lines of force of the field extend parallel to and over said planar sputtering surface, said magnet means including a wound strip of at least one magnetized tape having a coil-like configuration disposed on the side of said cathode opposite said planar sputtering surface where each turn of the coil is adjacent to and at least partially overlaps at least one of the turns adjacent it so that a substantially solid, flat coil is formed by said wound strip.
Claim 82
Dependent Claim
17 words
A sputtering device as in claim 71 where the coil is substantially parallel to said sputtering surface.
Claim 83
Dependent Claim
27 words
A sputtering device as in claims 71 or 72 where each turn closely contacts the turns adjacent it at least in the non-linear portions of the coil.
Claim 84
Dependent Claim
21 words
A sputtering device as in claim 72 where at least some of the turns are substantially perpendicular to said sputtering surface.
Claim 85
Dependent Claim
21 words
A sputtering device as in claim 72 where at least some of the turns are substantially parallel to said sputtering surface.
Claim 86
Dependent Claim
30 words
A sputtering device as in claim 72 where at least some of the turns are disposed at an angle of 40°-60° with respect to a perpendicular to said sputtering surface.
Claim 87
Dependent Claim
12 words
A sputtering device as in claim 76 where said angle is 50°-55°.
Claim 88
Dependent Claim
22 words
A sputtering device as in claim 71 where each turn of the coil is in physical contact with the turn adjacent it.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-05-04 | 1984-11-03 | 1985-05-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-05-04 | 1988-11-03 | 1989-05-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-05-04 | 1992-11-03 | 1993-05-05 | $7700.00 | Window Closed / Lapsed |