Detecting NOx using thin film zinc oxide semiconductor

Claim 1

A method for detecting the presence of a nitrogen oxide compound in an oxygen-containing atmosphere comprising measuring the electrical resistance of a zinc oxide thin film semiconductor exposed to said atmosphere, said zinc oxide having an electrical resistance that is sensitive to ambient nitrogen oxide compounds, said film having a predetermined resistance when exposed to a like oxygen-containing gas free of nitrogen oxide compounds, whereby the presence of nitrogen oxide compounds in the atmosphere is indicated by a substantial increase in the film resistance over said nitrogen oxide-free value.

Claim 2

A method for detecting the presence of a nitrogen oxide compound in an oxygen-containing atmosphere comprising measuring the electrical resistance of a zinc oxide thin film semiconductor exposed to said atmosphere, said zinc oxide having an electrical resistance that is sensitive to ambient nitrogen oxide compounds, said film having a predetermined resistance when exposed to a like oxygen-containing gas free of nitrogen oxide compounds, whereby the presence of nitrogen oxide compounds in the atmosphere is indicated by a substantial increase in the film resistance over said nitrogen oxide-free value.

Claim 3

A method for detecting the presence of NO x species in an oxygen-containing gaseous mixture comprising exposing to the mixture a thin film composed of an oxygen-deficient zinc oxide material having an electrical resistance that is influenced by NO x species, said film being maintained at a temperature between 250° and 325° C., measuring the electrical resistance of the film while exposed to the mixture, and utilizing the measured resistance value to determine the NO x concentration in the mixture.

Claim 4

A method for detecting the presence of NO x species in an oxygen-containing gaseous mixture comprising exposing to the mixture a thin film composed of an oxygen-deficient zinc oxide material having an electrical resistance that is influenced by NO x species, said film being maintained at a temperature between 250° and 325° C., measuring the electrical resistance of the film while exposed to the mixture, and utilizing the measured resistance value to determine the NO x concentration in the mixture.

Claim 5

A method for determining the concentration of nitric oxide or nitrogen dioxide, or both, in a gaseous mixture containing oxygen in an amount substantially greater than the nitrogen oxygen compound, said method comprising sputtering zinc oxide material from a zinc oxide target onto an inert substrate to form thereon a continuous thin film that is between about 600 to 10,000 A° thick, heating the sputtered film in air between 400° to 500° C. for a sufficient time to stabilize the oxygen content at an oxygen-to-zinc ratio less than a stoichiometric one, said oxygen-deficient zinc oxide material being adapted to conduct electrons with a measurable resistance and to interact with ambient nitrogen oxygen compound in a manner that affects the resistance, contacting the film with spaced electrodes arranged so as to allow an electrical resistance of the film to be measured across a path generally parallel to the film surface, exposing the film to said mixture while heating between about 270° to 300° C., whereupon nitrogen oxygen compound interact with said film and alter the resistance thereof, measuring the resistance of the film between said electrodes, and comparing the measured resistance to similar resistance values obtained for gases having known nitrogen oxygen compound concentrations to determine the concentration in said mixture.

Claim 6

A method for determining the concentration of nitric oxide or nitrogen dioxide, or both, in a gaseous mixture containing oxygen in an amount substantially greater than the nitrogen oxygen compound, said method comprising sputtering zinc oxide material from a zinc oxide target onto an inert substrate to form thereon a continuous thin film that is between about 600 to 10,000 A° thick, heating the sputtered film in air between 400° to 500° C. for a sufficient time to stabilize the oxygen content at an oxygen-to-zinc ratio less than a stoichiometric one, said oxygen-deficient zinc oxide material being adapted to conduct electrons with a measurable resistance and to interact with ambient nitrogen oxygen compound in a manner that affects the resistance, contacting the film with spaced electrodes arranged so as to allow an electrical resistance of the film to be measured across a path generally parallel to the film surface, exposing the film to said mixture while heating between about 270° to 300° C., whereupon nitrogen oxygen compound interact with said film and alter the resistance thereof, measuring the resistance of the film between said electrodes, and comparing the measured resistance to similar resistance values obtained for gases having known nitrogen oxygen compound concentrations to determine the concentration in said mixture.

Claim 7

The method for detecting the presence of NO x species in an oxygen-containing gaseous mixture comprising exposing a thin film composed of a sputtered and heat-treated zinc oxide material to the mixture, said zinc oxide having an electrical resistance that is increased by the presence of gaseous NO x species in contact therewith, said film being maintained at a temperature between 250° and 325° C., measuring the electrical resistance of the thin film while exposed to the mixture, and utilizing the measured resistance value to determine the NO x concentration in the mixture.

Claim 8

The method for detecting the presence of NO x species in an oxygen-containing gaseous mixture comprising exposing a thin film composed of a sputtered and heat-treated zinc oxide material to the mixture, said zinc oxide having an electrical resistance that is increased by the presence of gaseous NO x species in contact therewith, said film being maintained at a temperature between 250° and 325° C., measuring the electrical resistance of the thin film while exposed to the mixture, and utilizing the measured resistance value to determine the NO x concentration in the mixture.