US4378260A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing a semiconductor device
Assignee: Fujitsu Ltd
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Filing: 1980-05-17
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Granted: 1983-03-29
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Expires: 2000-05-17
Abstract
Abstract A process for producing a semiconductor device and for minimizing the effects of implanted boron on a silicon dioxide insulator layer is presented. The process includes the using of a silicon nitride film having windows to define the regions of a semiconductor device, such as a bipolar transistor and isolation regions wherein the isolation region and the semiconductor regions are formed by thermal diffusion of boron using a self-alignment production process. A first mask of the silicon nitride film is formed by patterning its in the form of an endless stripe so that the influence of the reaction between the boron and silicon nitride upon the silicon nitride film is considerably reduced as compared with the conventional process. As a result, the problem of low production yield and low reliability of the semiconductor device is solved.
Inventors
- 👤 Takeshi Fukuda
- 👤 Yoshito Ichinose
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 12:53
CPC Classifications
H; H10; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/012; H10P; H10P32/00; H10P76/00; H10P76/40; H10P76/408; H10P95/00; H10W10/0121; H10W10/0124; H10W10/10; H10W10/13; Y; Y10; Y10S; Y10S438/00; Y10S438/942
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
90 words
A process for producing a semiconductor device having a semiconductor body, comprising the steps of: (a) forming a nitride film on the semiconductor body; (b) selectively removing said nitride film to form a first mask comprising an endless stripe of said nitride film; (c) masking the semiconductor body not covered by said first mask by a second mask comprising an oxide film; (d) selectively removing said second mask in self alignment with said first mask, to expose said semiconductor body; and (e) introducing boron impurities into said exposed semiconductor body.
Claim 2
Dependent Claim
90 words
A process for producing a semiconductor device having a semiconductor body, comprising the steps of: (a) forming a nitride film on the semiconductor body; (b) selectively removing said nitride film to form a first mask comprising an endless stripe of said nitride film; (c) masking the semiconductor body not covered by said first mask by a second mask comprising an oxide film; (d) selectively removing said second mask in self alignment with said first mask, to expose said semiconductor body; and (e) introducing boron impurities into said exposed semiconductor body.
Claim 3
Dependent Claim
28 words
A process for producing a semiconductor device according to claim 1, further comprising the step of forming an oxide film on the semiconductor body prior to step (a).
Claim 4
Dependent Claim
42 words
A process for producing a semiconductor device according to claim 2, wherein, step (c) further comprises forming said second mask by oxidation, and forming said oxide film not covered by said nitride film to a thickness sufficient to mask the boron impurities.
Claim 5
Dependent Claim
35 words
A process for producing a semiconductor device according to claim 1, 2 or 3, wherein step (b), further comprises removing said nitride film so that the width of said first mask is approximately 4 microns.
Claim 6
Dependent Claim
95 words
A process for producing a semiconductor device having a semiconductor body, comprising the steps of: (a) forming a nitride layer on the semiconductor body; (b) forming an endless stripe first mask comprising the nitride layer, by selectively removing the nitride layer from first portions of the semiconductor body; (c) forming a second mask by thermally oxidizing the first portions of the semiconductor body; (d) forming windows through the second mask in self alignment with the first mask and extending to the semiconductor body; and (e) implanting boron impurities into the semiconductor body through the windows.
Claim 7
Dependent Claim
95 words
A process for producing a semiconductor device having a semiconductor body, comprising the steps of: (a) forming a nitride layer on the semiconductor body; (b) forming an endless stripe first mask comprising the nitride layer, by selectively removing the nitride layer from first portions of the semiconductor body; (c) forming a second mask by thermally oxidizing the first portions of the semiconductor body; (d) forming windows through the second mask in self alignment with the first mask and extending to the semiconductor body; and (e) implanting boron impurities into the semiconductor body through the windows.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-03-28 | 1986-09-27 | 1987-03-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-03-28 | 1990-09-27 | 1991-03-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-03-28 | 1994-09-27 | 1995-03-29 | $7700.00 | Window Closed / Lapsed |