Process and apparatus for controlling the level of a molten metal surface in continuous casting moulds

Claim 2

A process for controlling the level of a molten metal level in a continuous casting mold comprising the steps: (a) providing a continuous casting mold, (b) providing a probe in the vicinity of the mold for sensing the metal level, said probe being associated with a compensating coil, said probe and compensating coil being in coupling relation with two secondary receiver coils, all said coils being spatially separated from the mold, said secondary receiver coils being arranged to provide a voltage difference therebetween, (c) generating a high frequency alternating magnetic field to induce voltages in said secondary receiver coils, (d) filling the mold with molten metal until reaching a required level in said mold, thereby creating a voltage difference in said secondary receiver coils, (e) balancing the voltage in said secondary receiver coils to reduce the voltage difference to zero, and (f) controlling the pouring of the metal into the mold to maintain the voltage difference at zero.

Claim 3

A process according to claim 1, wherein the secondary receiver coils, the compensating coil and a coil which serves to couple the probe to the secondary receiver coils are arranged and dimensioned in such a manner that a step od balancing the voltage difference is achieved when the molten metal reaches the required level.

Claim 4

Process according to claim 2, wherein the compensating coil is electrically associated with resistances adapted to aid in balancing said voltage difference to zero.

Claim 5

Process according to claim 3, wherein said balancing step includes a final balancing to reduce the difference voltage to zero when the molten metal surface is at the required level, said final balancing being accomplished by an automatic coil balancer.

Claim 6

Process according to claim 1, including the step of filtering out low-frequency interfering signals from a voltage difference signal responsive to the voltage difference in the secondary receiver coils.

Claim 7

Process according to claim 1, wherein the step of controlling the pouring of metal into the mould is accomplished by actuating a plug-valve or slide-valve in a metal pouring vessel.

Claim 8

Process according to claim 1, wherein the probe is situated in the molten metal or above the level thereof.

Claim 9

In a continuous casting system, an apparatus for controlling the level of a molten metal surface in a continuous casting mold, said apparatus including a probe located in the vicinity of the continuous casting mold for sensing the molten metal surface, a first coil connected to said probe, a compensating coil associated with said first coil, two secondary receiver coils connected in opposition and in coupling arrangement with said first coil and said compensating coil, a primary coil associated with said secondary receiver coils and a high frequency transmitter connected to said primary coil, whereby with all said coils spatially separated from the mold, said secondary receiver coils being spaced apart and solely inductively electrically connected to said first coil and said compensating coil such that a voltage difference may be induced in said secondary receiver coils by the influence of the first coil acting on said secondary receiver coils which voltage difference will be reduced substantially to zero when the molten metal surface attains a predetermined level and the voltage difference in the secondary receiver coils may thereafter be balanced to maintain substantially zero difference thereby to control the level of the molten metal surface in the mold.

Claim 10

In a continuous casting system, an apparatus for controlling the level of a molten metal surface in a continuous casting mold, said apparatus including a probe located in the vicinity of the continuous casting mold for sensing the molten metal surface, a first coil connected to said probe, a compensating coil associated with said first coil, two secondary receiver coils connected in opposition and in coupling arrangement with said first coil and said compensating coil, a primary coil associated with said secondary receiver coils and a high frequency transmitter connected to said primary coil, whereby with all said coils spatially separated from the mold, said secondary receiver coils being spaced apart and solely inductively electrically connected to said first coil and said compensating coil such that a voltage difference may be induced in said secondary receiver coils by the influence of the first coil acting on said secondary receiver coils which voltage difference will be reduced substantially to zero when the molten metal surface attains a predetermined level and the voltage difference in the secondary receiver coils may thereafter be balanced to maintain substantially zero difference thereby to control the level of the molten metal surface in the mold.

Claim 11

Apparatus according to claim 6, wherein the probe is in the form of a loop, which is locatable on a mould.

Claim 12

Apparatus according to claim 8, wherein the probe is in the form of a coil having a small number of turns which is locatable in the cover of a mould cover.

Claim 13

Apparatus according to claim 10, wherein the mould cover is made of austenitic steel.

Claim 14

Apparatus according to claim 8, wherein the probe is in the form of a loop, which is located on a distributor of the molten metal.

Claim 15

Apparatus according to claim 8, wherein the probe is in the form of a loop, which is adapted to dip into the molten metal.

Claim 16

Apparatus according to claim 9, wherein the probe consists of electrically conducting material.

Claim 17

Apparatus according to claim 14, wherein the probe consists of copper material or copper-chromium material.

Claim 18

Apparatus according to claim 13, wherein the probe consists of a refractory material.

Claim 19

Apparatus according to claim 13, wherein the probe consists of chromium steel or graphite.

Claim 20

Apparatus according to claim 8, wherein the high-frequency transmitter has a frequency range of 1 kHz to 100 kHz.

Claim 21

Apparatus according to claim 9, wherein the high-frequency transmitter has a frequency range of 1 kHz-10 kHz.

Claim 22

Apparatus according to claim 13, wherein the high-frequency transmitter has a frequency range of 10 kHz-100 kHz.