US4430547A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cleaning device for a plasma etching system
Assignee: Mitsubishi Electric Corp
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Filing: 1981-10-06
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Granted: 1984-02-07
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Expires: 2001-10-06
Abstract
Abstract A cleaning apparatus for a plasma etching system for etching a sample which includes a chamber having an inlet and an outlet, a sample table positioned in the chamber and which further includes a first electrode, a counter electrode positioned in the chamber opposite the first electrode and a plurality of heating mechanisms positioned in the inlet and outlet of the chamber, in the counter electrode and in the sample table for desorbing a reaction product adsorbed on surfaces of the inlet and outlet of the chamber, the counter electrode and the sample table prior to plasma etching of the sample.
Inventors
- 👤 Masahiro Yoneda
- 👤 Shiro Hine
- 👤 Hiroshi Koyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 05:10
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H01; H01J; H01J37/00; H01J37/02; H01J37/16; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32449; H01J37/32715; H01J37/32724
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
102 words
A cleaning apparatus for a plasma etching system for etching a sample, comprising: a chamber having an inlet and an outlet; a sample table positioned in said chamber and which further comprises a first electrode; a counter electrode positioned in said chamber opposite said first electrode; and a plurality of heating mechanisms respectively positioned in said inlet and said outlet of said chamber, in said counter electrode and in said sample table for desorbing a reaction product adsorbed on surfaces of said inlet and outlet of said chamber, said counter electrode and said sample table prior to plasma etching of said sample.
Claim 2
Dependent Claim
102 words
A cleaning apparatus for a plasma etching system for etching a sample, comprising: a chamber having an inlet and an outlet; a sample table positioned in said chamber and which further comprises a first electrode; a counter electrode positioned in said chamber opposite said first electrode; and a plurality of heating mechanisms respectively positioned in said inlet and said outlet of said chamber, in said counter electrode and in said sample table for desorbing a reaction product adsorbed on surfaces of said inlet and outlet of said chamber, said counter electrode and said sample table prior to plasma etching of said sample.
Claim 3
Dependent Claim
29 words
The apparatus according to claim 1, further comprising a cooling table wherein at least one of said heating mechanisms is embedded in said sample table below said cooling table.
Claim 4
Dependent Claim
15 words
The apparatus according to claim 1 wherein said heating mechanisms further comprise electric resistance heaters.
Claim 5
Dependent Claim
18 words
The apparatus according to claim 1, wherein said heating mechanisms are embedded in wall portions of said chamber.
Claim 6
Dependent Claim
23 words
The apparatus according to claim 1 further comprising means for feeding oxygen gas to said chamber during heating operation of said heating mechanisms.
Claim 7
Dependent Claim
27 words
The apparatus according to claim 1 further comprising means operatively associated with said sample table for cooling said sample table after heating operation of said heating mechanisms.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-02-06 | 1987-08-08 | 1988-02-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-02-06 | 1991-08-08 | 1992-02-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-02-06 | 1995-08-08 | 1996-02-07 | $7700.00 | Window Closed / Lapsed |