Monolithic integrated reference voltage source

Claim 1

A monolithic integrated reference voltage source, comprising: a substrate; a first depletion-type MOSFET formed in said substrate and having drain, source and gate electrodes, said drain electrode adapted to be connected to a supply potential, and the gate electrode adapted to be connected to a reference potential; a second enhancement-type MOSFET formed in said substrate and having drain, source and gate electrodes, said drain electrode being connected to the source electrode of the first MOSFET, the gate electrode being connected to the drain electrode of the second MOSFET, and the source electrode being connected to the reference potential; and a reference voltage output connected to the connection between the source and drain electrodes of said first and second MOSFETs, said MOSFETs having a gate oxide layer with a thickness lying in the range of between 0.060 and 0.066 microns, said substrate having a doping level below the gate of said second MOSFET within the range of 5 to 7·10 14 cm -3 , and the substrate surface below the gate of said first MOSFET having implanted donators in the range of 0.75 to 1.25·10 12 cm -2 , said MOSFETs further having conducting channels having widths W and lengths L such that the ratio of the width-to-length ratio of the first MOSFET to the width-to-length ratio of the second MOSFET lies in a range between 1.10 and 1.40.