US4465768A
Expired / Lapsed
US
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Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate
Assignee: Hitachi Ltd
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Filing: 1982-07-13
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Granted: 1984-08-14
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Expires: 2002-07-13
Abstract
Abstract A radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer, or a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer. This composition can be subjected to the dry development with oxygen plasma after the exposure followed by heating.
Inventors
- 👤 Takumi Ueno
- 👤 Hiroshi Shiraishi
- 👤 Takao Iwayanagi
- 👤 Takahiro Kohashi
- 👤 Saburo Nonogaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 13:30
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; C; C07; C07C; C07C247/00; G03F7/004; G03F7/008; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/128; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
96 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer layer by exposure to a radiation and a polymer substantially having compatibility with the azide compound, exposing the coating film to a radiation having a desired pattern, heating the coating film to remove the azide compound from an unexposed region of the coating film and exposing the coating film to an oxygen-containing plasma to remove the unexposed part.
Claim 2
Independent Claim
96 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer layer by exposure to a radiation and a polymer substantially having compatibility with the azide compound, exposing the coating film to a radiation having a desired pattern, heating the coating film to remove the azide compound from an unexposed region of the coating film and exposing the coating film to an oxygen-containing plasma to remove the unexposed part.
Claim 3
Dependent Claim
28 words
A method of forming a pattern according to claim 1 wherein the amount of the azide compound is in the range of 10-80 wt.% based on the composition.
Claim 4
Dependent Claim
30 words
A method of forming a pattern according to claim 1 wherein a heating temperature of the coating film is above a sublimation temperature or boiling point of the azide compound.
Claim 5
Dependent Claim
16 words
A method of forming a pattern according to claim 1 wherein the radiation is U.V. light.
Claim 6
Dependent Claim
16 words
A method of forming a pattern according to claim 1 wherein the radiation is electron beams.
Claim 7
Dependent Claim
15 words
A method of forming a pattern according to claim 1 wherein the radiation is X-rays.
Claim 8
Dependent Claim
16 words
A method of forming a pattern according to claim 1 wherein the radiation is ion beams.
Claim 9
Independent Claim
195 words
A method of forming a pattern according to anyone of claims 1-7 wherein the azide compound is at least one compound selected from the group consisting of azide compounds of the general formula: ##STR6## wherein R x and R y each represent an element or atomic group selected from the group consisting of hydrogen, alkyl group, nitro group, halogen, amino group, monoalkylamino group, acyl group, dialkylamino group, alkoxyl group, hydroxyl group, sulfonic acid group, sulfonic acid ester group, carboxylic acid group or carboxylic acid ester group, azide compounds of the general formula: ##STR7## wherein Y represents an atomic group selected from the group consisting of CH 2 , COO, OOC, SO 3 and O 3 S, and R i represents an element or atomic group selected from the group consisting of I, CH 2 I and CH 2 CH 2 I, and azide compounds of the general formula: ##STR8## wherein X represents an element or atomic group selected from the group consisting of S 2 , CH 2 , O, S, SO 2 , CO, COO, SO 3 , CH═CH and CH═CHCO and R x and R y have the same meaning as described above.
Claim 10
Dependent Claim
44 words
A method of forming a pattern according to claim 8 wherein the azide compound is at least one compound selected from the group consisting of p-azidoiodobenzene, 2,6-diiodo-4-nitroazidobenzene, 2-chloro-4-iodoazidobenzene, 2,6-dichloro-4-iodoazidobenzene, 2-bromo-4-iodoazidobenzene, 2,6-dibromo-4-iodoazidobenzene, 2-methyl-4-iodoazidobenzene, 2-methoxy-4-iodoazidobenzene, 2-iodoethyl-4-azidobenzoate, iodomethyl-4-azidobenzoate, 4-azidophenyl iodoacetate, 4-iodomethylazidobenzene, 2,4,6-triiodophenyl-4'-azidobenzoate, 3-iodophenyl-4'-azidobenzoate, 4-azido-4'-iododiphenyl sulfide and 4-azido-4'-iodobenzophenone.
Claim 11
Independent Claim
102 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer layer by exposure to a radiation and a polymer substantially having compatibility with the azide compound and the iodine compound, exposing the coating film to a radiation having a desired pattern, heating the coating film to remove the iodine compound from the unexposed region of the coating film and exposing the coating film to an oxygen-containing plasma to remove the unexposed part.
Claim 12
Independent Claim
102 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer layer by exposure to a radiation and a polymer substantially having compatibility with the azide compound and the iodine compound, exposing the coating film to a radiation having a desired pattern, heating the coating film to remove the iodine compound from the unexposed region of the coating film and exposing the coating film to an oxygen-containing plasma to remove the unexposed part.
Claim 13
Dependent Claim
25 words
A method of forming a pattern according to claim 10 wherein the weight ratio of the polymer:iodine compound:azide compound is in the range of 1:0.1-3:0.05-2.
Claim 14
Dependent Claim
32 words
A method of forming a pattern according to claim 10 or 11 wherein a heating temperature of the coating film is above a sublimation temperature or boiling point of the iodine compound.
Claim 15
Dependent Claim
18 words
A method of forming a pattern according to claim 10 or 11 wherein the radiation is U.V. light.
Claim 16
Independent Claim
113 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer substantially having compatibility with the azide compound and the iodine compound and soluble in an aqueous alkaline solution on a base, exposing the coating film to a radiation having a desired pattern, subjecting the coating film to the development with the aqueous alkaline solution to remove the unexposed part, and exposing the coating film and the base to an oxygen-containing plasma to etch the base.
Claim 17
Independent Claim
113 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer substantially having compatibility with the azide compound and the iodine compound and soluble in an aqueous alkaline solution on a base, exposing the coating film to a radiation having a desired pattern, subjecting the coating film to the development with the aqueous alkaline solution to remove the unexposed part, and exposing the coating film and the base to an oxygen-containing plasma to etch the base.
Claim 18
Dependent Claim
47 words
A method of forming a pattern according to claim 14 wherein the polymer soluble in an aqueous alkaline solution is at least one polymer selected from the group consisting of polyvinylphenol, novolak resin, styrene/maleic anhydride copolymer, cellulose acetate hydrogenphthalate, polyvinyl hydroxybenzoate, polyvinylhydroxybenzal, polymethacrylic acid and polyacrylic acid.
Claim 19
Independent Claim
107 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer substantially having compatibility with the azide compound and soluble in an aqueous alkaline solution on a base, exposing the coating film to a radiation having a desired pattern, subjecting the coating film to the development with the aqueous alkaline solution to remove the unexposed part, and exposing the coating film and the base to an oxygen-containing plasma to etch the base.
Claim 20
Independent Claim
107 words
A method of forming a pattern characterized by comprising the steps of forming a coating film of a radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer substantially having compatibility with the azide compound and soluble in an aqueous alkaline solution on a base, exposing the coating film to a radiation having a desired pattern, subjecting the coating film to the development with the aqueous alkaline solution to remove the unexposed part, and exposing the coating film and the base to an oxygen-containing plasma to etch the base.
Claim 21
Dependent Claim
47 words
A method of forming a pattern according to claim 16 wherein the polymer soluble in an aqueous alkaline solution is at least one polymer selected from the group consisting of polyvinylphenol, novolak resin, styrene/maleic anhydride copolymer, cellulose acetate hydrogen-phthalate, polyvinyl hydroxybenzoate, polyvinylhydroxybenzal, polymethacrylic acid and polyacrylic acid.
Claim 22
Dependent Claim
44 words
A method of forming a pattern according to claim 17, wherein the azide compound is at least one compound selected from the group consisting of p-azidoiodobenzene, 2,6-diiodo-4-nitroazidobenzene, 2-chloro-4-iodoazidobenzene, 2,6-dichloro-4-iodoazidobenzene, 2-bromo-4-iodoazidobenzene, 2,6-dibromo-4-iodoazidobenzene, 2-methyl-4-iodoazidobenzene, 2-methoxy-4-iodoazidobenzene, 2-iodoethyl-4-azidobenzoate, iodomethyl-4-azidobenzoate, 4-azidophenyl iodoacetate, 4-iodomethyl-azidobenzene, 2,4,6-triiodophenyl-4'-azidobenzoate, 3-iodophenyl-4'-azidobenzoate, 4-azido-4'-iododiphenyl sulfide and 4-azido-4'-iodobenzophenone.
Claim 23
Independent Claim
19 words
A method of forming a pattern according to any one of claims 1-7 wherein the plasma is oxygen plasma.
References Cited (Backward Citations)
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US3748135A
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US3923522A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-08-14 | 1988-02-13 | 1988-08-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-08-14 | 1992-02-13 | 1992-08-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-08-14 | 1996-02-13 | 1996-08-14 | $7700.00 | Window Closed / Lapsed |