US4523976A
Expired / Lapsed
US
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Method for forming semiconductor devices
Assignee: Motorola Solutions Inc
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Filing: 1984-07-02
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Granted: 1985-06-18
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Expires: 2004-07-02
Abstract
Abstract A method is disclosed for forming openings in polyimide layers and for thereby forming semiconductor devices. The method allows for the forming of openings having tapered side walls and precise dimensional control. First and second layers of polyimide are sequentially formed on a surface. The first layer, in contact with the surface, is fully cured while the second layer is only partially cured. Overlying the second layer is a masking layer which can alternatively be an inorganic material or a resist material. A pattern is formed in the masking layer to expose portions of the upper polyimide layer. The pattern includes openings of predetermined size having a precise critical dimension. Using the patterned masking layer as an etch mask the upper layer of polyimide is isotropically etched in an etchent which etches the partially cured polyimide but which does not etch the fully cured underlying polyimide. The underlying polyimide layer is then anisotropically etched using the patterned masking layer as an etch mask to form openings in the cured polyimide layer having the same critical dimensions as in the masking layer pattern. The masking layer is then removed and the second polyimide layer is fully cured.
Inventors
- 👤 Yefim Bukhman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 19:25
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/68; H10P14/683; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/082
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
143 words
A method for forming an opening through a polyimide layer to expose an underlying surface wherein said opening is characterized by tapered side walls and a predetermined size, said method comprising the steps of: forming a first layer of cured polyimide on said surface; forming a second layer of partially cured polyimide overlying said first layer; forming a masking layer overlying said second layer; forming a pattern in said masking layer to expose portions of said second layer, said pattern including an opening of predetermined size; isotropically etching said second layer exposed through said pattern to expose portions of said first layer; anisotropically etching said first layer exposed through said second layer using said pattern in said masking layer an etch mask to form an opening of said predetermined size in said first layer; removing said masking layer; and curing said second layer.
Claim 2
Independent Claim
143 words
A method for forming an opening through a polyimide layer to expose an underlying surface wherein said opening is characterized by tapered side walls and a predetermined size, said method comprising the steps of: forming a first layer of cured polyimide on said surface; forming a second layer of partially cured polyimide overlying said first layer; forming a masking layer overlying said second layer; forming a pattern in said masking layer to expose portions of said second layer, said pattern including an opening of predetermined size; isotropically etching said second layer exposed through said pattern to expose portions of said first layer; anisotropically etching said first layer exposed through said second layer using said pattern in said masking layer an etch mask to form an opening of said predetermined size in said first layer; removing said masking layer; and curing said second layer.
Claim 3
Dependent Claim
18 words
The method of claim 1 wherein said step of forming a masking layer comprises depositing an inorganic insulator.
Claim 4
Dependent Claim
46 words
The method of claim 2 wherein said step of forming a pattern in said masking layer comprises the steps of: forming a resist layer overlying said inorganic insulator; patterning said resist layer; and anisotropically etching said inorganic insulator using said resist layer as an etch mask.
Claim 5
Dependent Claim
18 words
The method of claim 3 wherein said step of anisotropically etching said inorganic insulator comprises reactive ion etching.
Claim 6
Dependent Claim
29 words
The method of claim 4 wherein said inorganic insulator comprises silicon oxide and said oxide is reactive ion etched in a mixture comprising CHF 3 and CO 2 .
Claim 7
Dependent Claim
18 words
The method of claim 1 wherein said step of anisotropically etching said first layer comprises reactive ion etching.
Claim 8
Dependent Claim
14 words
The method of claim 6 wherein said rective ion etching comprises etching in oxygen.
Claim 9
Dependent Claim
20 words
The method of claim 1 wherein said step of forming a masking layer comprises: applying a layer of positive photoresist.
Claim 10
Dependent Claim
17 words
The method of claim 1 wherein said step of isotropically etching comprises etching in positive photoresist developer.
Claim 11
Independent Claim
161 words
A method for forming a semiconductor device comprising the steps of: providing a semiconductor substrate having a surface and having a device region at said surface; forming a first layer of cured polyimide overlying said device region and said surface; forming a second layer of partially cured polyimide overlying said first layer; forming a masking layer overlying said second layer; forming a pattern of openings in said masking layer including an opening of predetermined size overlying and in alignment with said device region; isotropically etching said second layer through said opening using said masking layer as an etch mask; anisotropically etching said first layer using said masking layer as an etch mask to form an opening in said first layer having said predetermined size, said opening in said first layer exposing said device region; curing said second layer of partially cured polyimide; and forming a patterned metallization overlying said second layer and extending into said opening to contact said device region.
Claim 12
Independent Claim
161 words
A method for forming a semiconductor device comprising the steps of: providing a semiconductor substrate having a surface and having a device region at said surface; forming a first layer of cured polyimide overlying said device region and said surface; forming a second layer of partially cured polyimide overlying said first layer; forming a masking layer overlying said second layer; forming a pattern of openings in said masking layer including an opening of predetermined size overlying and in alignment with said device region; isotropically etching said second layer through said opening using said masking layer as an etch mask; anisotropically etching said first layer using said masking layer as an etch mask to form an opening in said first layer having said predetermined size, said opening in said first layer exposing said device region; curing said second layer of partially cured polyimide; and forming a patterned metallization overlying said second layer and extending into said opening to contact said device region.
Claim 13
Independent Claim
80 words
A method for forming an opening through a polyimide layer to expose an underlying surface which comprises the steps of; applying polyamic acid to said surface and heating to form a first fully cured polyimide layer; applying additional polyamic acid to said cured polyimide layer and heating to form a second partially cured polimide layer overlying said first fully cured polyimide; isotropically etching through said second partially cured polyimide layer; and anisotropically etching through said first fully cured polyimide layer.
Claim 14
Independent Claim
80 words
A method for forming an opening through a polyimide layer to expose an underlying surface which comprises the steps of; applying polyamic acid to said surface and heating to form a first fully cured polyimide layer; applying additional polyamic acid to said cured polyimide layer and heating to form a second partially cured polimide layer overlying said first fully cured polyimide; isotropically etching through said second partially cured polyimide layer; and anisotropically etching through said first fully cured polyimide layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-17 | 1988-12-17 | 1989-06-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-17 | 1992-12-17 | 1993-06-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-17 | 1996-12-17 | 1997-06-18 | $7700.00 | Window Closed / Lapsed |