US4529617A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for the amorphous growth of an element with crystallization under radiation
Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
•
Filing: 1984-04-18
•
Granted: 1985-07-16
•
Expires: 2004-04-18
Abstract
Abstract The present invention relates to a process for the amorphous growth of an element with crystallization under radiation. An element is deposited on a support contained in an enclosure under a vacuum in known manner and simultaneously one or more predetermined surfaces of the layer deposited on the support are irradiated, said irradiation being obtained by a coherent electromagnetic irradiation radiation beam having a power and wavelength suitable for desorbing said surfaces.
Inventors
- 👤 Andre Chenevas-Paule
- 👤 Robert Cuchet
- 👤 Jean-Francois Eloy
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 14:38
CPC Classifications
C; C30; C30B; C30B23/00; C30B23/02; C30B23/04; C30B23/06; C30B23/063; C30B25/00; C30B25/02; C30B25/04; C30B25/10; C30B25/105; Y; Y10; Y10S; Y10S117/00; Y10S117/903; Y10S117/904; Y10S117/913; Y10S148/00; Y10S148/093
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
116 words
A process for the amorphous growth of an element with local crystallization under coherent electromagnetic raidiation, the growth of said element being effected on a support contained in an enclosure which is under a vacuum, said enclosure containing the source of said element, which process comprises: (a) continuously depositing said element on the support in amporphous form, and (b) temporarily irradiating one or more predetermined surfaces of the layer deposited on the support during said continuous deposition, wherein said irradiation is effected by a coherent electromagnetic radiation beam, the power W of the beam being able to effect a desorption of said surface, and the wavelength λ of the coherent electromagnetic radiation being below 400 nm.
Claim 2
Dependent Claim
116 words
A process for the amorphous growth of an element with local crystallization under coherent electromagnetic raidiation, the growth of said element being effected on a support contained in an enclosure which is under a vacuum, said enclosure containing the source of said element, which process comprises: (a) continuously depositing said element on the support in amporphous form, and (b) temporarily irradiating one or more predetermined surfaces of the layer deposited on the support during said continuous deposition, wherein said irradiation is effected by a coherent electromagnetic radiation beam, the power W of the beam being able to effect a desorption of said surface, and the wavelength λ of the coherent electromagnetic radiation being below 400 nm.
Claim 3
Dependent Claim
21 words
The process according to claim 1, wherein the coherent electromagnetic radiation beam is emitted in the form of low frequency pulses.
Claim 4
Dependent Claim
19 words
The process according to claim 1, wherein the coherent electromagnetic radiation beam is a spatially scanned continuous light source.
Claim 5
Dependent Claim
18 words
The process according to claim 1, wherein doping elements are sequentially added to the source of said element.
Claim 6
Dependent Claim
15 words
The process according to claim 2, wherein the pulse emission frequency is below 5 Hz.
Claim 7
Dependent Claim
26 words
The process according to claim 5, in which the said element is silicon, wherein the temperature of the substrate is between 300° and 500 ° C.
Claim 8
Dependent Claim
12 words
The process according to claim 1, wherein the element is boron-doped silicon.
Claim 9
Dependent Claim
13 words
The process according to claim 1, wherein the said element is phosphorus-doped silicon.
Claim 10
Dependent Claim
25 words
The process according to claim 2, wherein the coherent electromagnetic radiation beam is emitted in the form of very short pulses lasting approximately 10 ns.
Claim 11
Dependent Claim
31 words
The process according to claim 1, wherein the coherent electromagnetic radiation beam is a laser beam having a wavelength λ of about 350 nm and a power W of 35 MW.
References Cited (Backward Citations)
US3343829A
Cited
US3519901A
Cited
US4317844A
Cited
US4059461A
Cited
US4187126A
Cited
US4309225A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-07-15 | 1989-01-14 | 1989-07-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-07-15 | 1993-01-14 | 1993-07-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-07-15 | 1997-01-14 | 1997-07-16 | $7700.00 | Window Closed / Lapsed |